CN-224212744-U - Adjustable magnetic plate applied to evaporation alignment mechanism
Abstract
The utility model discloses an adjustable magnetic plate applied to an evaporation alignment mechanism, the evaporation alignment mechanism is provided with a magnetic plate, the magnetic plate is provided with permanent magnets, each permanent magnet is of a columnar structure, wires for generating magnetic force are wound outside the permanent magnets, the magnetic plate is provided with a plurality of magnetic force monitoring sensors, the magnetic force monitoring sensors are connected with and output induction signals to a controller, and the magnetic force of the magnetic plate of the evaporation alignment mechanism can be automatically adjusted by winding direct current wires and the combination of the magnetic force detection sensors on the permanent magnets of the component parts of the magnetic plate of the evaporation alignment mechanism, so that the technical problem that the magnetic force and the magnetic force uniformity of the magnetic plate of the evaporation alignment mechanism can not be monitored and adjusted in the production process is solved.
Inventors
- REN LELE
- WU YUJING
Assignees
- 安徽熙泰智能科技有限公司
Dates
- Publication Date
- 20260508
- Application Date
- 20250307
Claims (7)
- 1. Be applied to adjustable magnetic plate of evaporation coating counterpoint mechanism, evaporation coating counterpoint mechanism is equipped with the magnetic plate, be provided with permanent magnet on the magnetic plate, its characterized in that: each permanent magnet is of a columnar structure, a wire for generating magnetic force is wound outside the permanent magnet, a plurality of magnetic force monitoring sensors are arranged on the magnetic plate, and the magnetic force monitoring sensors are connected with and output induction signals to the controller.
- 2. The adjustable magnetic plate for vapor deposition alignment mechanism of claim 1, wherein the magnetic plate is of a plate-shaped structure, mounting holes are formed in the magnetic plate, and the permanent magnets are fixed in the mounting holes.
- 3. The adjustable magnetic plate for the vapor deposition alignment mechanism of claim 2, wherein the mounting holes are cylindrical counter bores and are all positioned on the same surface of the magnetic plate, and the length of the permanent magnet is smaller than that of the mounting holes or the same as that of the mounting holes.
- 4. The adjustable magnetic plate for vapor deposition alignment mechanism according to claim 1, 2 or 3, wherein the five magnetic force monitoring sensors are respectively positioned at four corners and the middle position of the magnetic plate.
- 5. The adjustable magnetic plate for vapor deposition alignment mechanism of claim 4, wherein the magnetic force monitoring sensor is embedded in the magnetic plate.
- 6. The adjustable magnetic plate for vapor deposition alignment mechanism according to claim 1 or 5, wherein the output end of the controller is connected with a display and/or an alarm device.
- 7. The adjustable magnetic plate for vapor deposition alignment mechanism according to claim 6, wherein two ends of each wire are respectively connected with a power supply, and the power supply is provided with an input adjusting mechanism for controlling the current output to each wire.
Description
Adjustable magnetic plate applied to evaporation alignment mechanism Technical Field The utility model relates to the technical field of displays, in particular to a novel silicon-based evaporation coating and feeding device. Background In the mi cro led industry, an alignment device is generally adopted to ensure the accuracy of film plating, and a magnetic plate is generally contained in an alignment device to ensure the adhesion of a mask plate and a substrate, so that the mask plate and the substrate are better adhered through the adsorption of magnetic force; For example, publication No. CN108396285B, publication No. 2021-01-26, patent name of mask plate, display substrate, its manufacturing method, and display device, the disclosed mask plate comprises a mask plate body made of semiconductor material, the mask plate body comprises multiple first openings, a magnetic semiconductor material layer on the mask plate body, the magnetic semiconductor material layer comprises multiple second openings, and orthographic projection of the second openings on the mask plate body is overlapped with the first openings. However, the magnetic force and uniformity of the similar magnetic plate can affect the bonding effect of the mask plate and the substrate, and if the magnetic force is not within the technical specification or the magnetic force is unevenly distributed, the yield of the product can be affected to different degrees. Disclosure of Invention The utility model aims to solve the technical problem that the magnetic force and the magnetic force uniformity of a magnetic plate of an evaporation alignment mechanism cannot be monitored and adjusted in the production process, and realizes the adjustable magnetic plate applied to the evaporation alignment mechanism In order to achieve the purpose, the technical scheme is that the adjustable magnetic plate applied to the vapor deposition alignment mechanism is provided with a magnetic plate, the magnetic plate is provided with permanent magnets, each permanent magnet is of a columnar structure, wires for generating magnetic force are wound outside the permanent magnets, the magnetic plate is provided with a plurality of magnetic force monitoring sensors, and the magnetic force monitoring sensors are connected with a controller and output induction signals. The magnetic plate is of a plate-shaped structure, the magnetic plate is provided with a mounting hole, and the permanent magnet is fixed in the mounting hole. The mounting holes are cylindrical counter bores and are all positioned on the same side of the magnetic plate, and the length of the permanent magnet is slightly smaller than that of the mounting holes or the same as that of the mounting holes. The magnetic force monitoring sensors are five and are respectively positioned at four corners and the middle position of the magnetic plate. The magnetic force monitoring sensor is embedded in the magnetic plate. The output end of the controller is connected with a display and/or an alarm device. The two ends of each wire are respectively connected with a power supply, and the power supply is provided with an input regulating mechanism for controlling the current output to each wire. According to the utility model, through winding the direct current lead on the permanent magnet which is a component part of the vapor deposition alignment mechanism magnetic plate and combining the magnetic force detection sensor, the automatic magnetic force adjustment of the vapor deposition alignment mechanism magnetic plate is realized, so that the technical problem that the magnetic force and the magnetic force uniformity of the vapor deposition alignment mechanism magnetic plate cannot be monitored and adjusted in the production process is solved. Drawings FIG. 1 is a schematic diagram of an adjustable magnetic plate structure applied to an evaporation alignment mechanism; The marks in the figures are 1, a magnetic force monitoring sensor, 2, a permanent magnet, 3, a controller, 4 and a magnetic plate. Detailed Description The following detailed description of the embodiments of the utility model, such as the shape and construction of the components, the mutual positions and connection relationships between the components, the roles and working principles of the components, the manufacturing process and the operating and using method, etc., is provided to assist those skilled in the art in a more complete, accurate and thorough understanding of the inventive concept and technical solution of the present utility model. The adjustable magnetic plate applied to the vapor deposition alignment mechanism is an improvement on the existing magnetic plate 4, the whole magnetic plate 4 is of a plate-shaped structure, rectangular or normal plates are generally prepared according to the requirements of application equipment, permanent magnets are uniformly embedded in the existing magnetic plate 4, the application can actively finely adj