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CN-224216247-U - Electrostatic chuck leakage rate testing device

CN224216247UCN 224216247 UCN224216247 UCN 224216247UCN-224216247-U

Abstract

The utility model discloses an electrostatic chuck leakage rate testing device which comprises a base, a supporting table, a guide frame and a vacuum cavity. The support platform is arranged on the upper surface of the base and used for supporting the electrostatic chuck, a first sealing ring is arranged on the upper surface of the support platform and used for forming sealing with the electrostatic chuck, the guide frame is arranged on the upper surface of the base and located on the outer side of the support platform, the air cylinder is arranged on the top end of the guide frame, the telescopic end of the air cylinder faces the support platform, the vacuum cavity is arranged between the air cylinder and the support platform, the telescopic end of the air cylinder is fixedly connected to the upper end of the vacuum cavity so as to drive the vacuum cavity to move up and down, and a second sealing ring is arranged at the lower end of the vacuum cavity and used for forming sealing with the electrostatic chuck when the telescopic end of the air cylinder drives the vacuum cavity to move down. The cylinder drives the cavity to be quickly closed with the chuck, replaces a bolt fixing mode, avoids a complicated connection and installation process, ensures that the sealing ring is uniformly stressed, and is beneficial to improving the efficiency and reducing the leakage risk.

Inventors

  • Pu Hongxu

Assignees

  • 上海玄亨科技股份有限公司

Dates

Publication Date
20260508
Application Date
20250523

Claims (10)

  1. 1. An electrostatic chuck leak rate testing device, comprising: A base; The support is arranged on the upper surface of the base and used for supporting the electrostatic chuck, and a first sealing ring is arranged on the upper surface of the support and used for forming a seal with the electrostatic chuck; The guide frame is arranged on the upper surface of the base and is positioned at the outer side of the supporting table; The cylinder is arranged at the top end of the guide frame, the telescopic end of the cylinder is arranged towards the supporting table, and The vacuum cavity is arranged between the air cylinder and the supporting table, and the telescopic end of the air cylinder is fixedly connected to the upper end of the vacuum cavity so as to drive the vacuum cavity to move up and down; The lower end of the vacuum cavity is provided with a second sealing ring which is used for forming a seal between the vacuum cavity and the electrostatic chuck when the telescopic end of the air cylinder drives the vacuum cavity to move downwards.
  2. 2. The apparatus according to claim 1, wherein a guide structure is fixedly provided at an outer side of the vacuum chamber, the guide structure being slidably provided to the guide frame in a height direction.
  3. 3. The electrostatic chuck leak rate testing apparatus of claim 2, wherein the guide frame includes a column extending upward along an upper surface of the base and a top plate provided at a top end of the column, the top plate for carrying the cylinder; the guide structure is configured as a sleeve slidably disposed to the periphery of the post.
  4. 4. The electrostatic chuck leak rate testing apparatus according to claim 1, wherein a silicon wafer is provided inside the vacuum chamber, the silicon wafer is electrically connected to an inner wall of the vacuum chamber, and a glass observation window for observing the silicon wafer is installed at a side of the vacuum chamber.
  5. 5. The electrostatic chuck leakage rate testing device according to claim 4, wherein a limit pin is arranged on the inner side of the bottom wall of the vacuum cavity, a limit groove matched with the limit pin is formed in the side surface of the silicon wafer, and the limit pin is located in the limit groove to limit the silicon wafer.
  6. 6. The electrostatic chuck leakage rate testing device according to claim 1, wherein a vacuum generator, a gas flowmeter and a barometer are arranged on the side face of the vacuum cavity, an air inlet of the vacuum generator is used for being connected with a compressed air source, and an air extraction opening of the vacuum generator is communicated to the interior of the vacuum cavity; An exhaust port of the vacuum generator is connected to the gas flowmeter, and a pneumatic silencer is arranged between the exhaust port of the vacuum generator and the gas flowmeter; The barometer is communicated with an extraction opening of the vacuum generator and/or the inside of the vacuum cavity and is used for monitoring the internal pressure of the vacuum cavity.
  7. 7. The device for testing the leakage rate of the electrostatic chuck according to claim 1, wherein a positioning pin is arranged at the upper end of the supporting table, and a plurality of flange holes matched with the positioning pin are formed in the edge of the electrostatic chuck.
  8. 8. The device for testing the air leakage rate of the electrostatic chuck according to claim 1, wherein a through hole is formed in the lower surface of the supporting table and is used for communicating with an air bottle; The lower surface of the electrostatic chuck is provided with an air inlet hole and a plurality of PIN holes, and silica gel plugs are arranged in the PIN holes to realize sealing.
  9. 9. The electrostatic chuck leak rate testing apparatus of claim 1, wherein two electrode contact pins are disposed within the gantry, the electrode contact pins being electrically connected to a high voltage electrostatic generator; the lower surface of the electrostatic chuck is provided with two electrode holes matched with the electrode contact pins, and the electrostatic chuck is electrically connected with the electrode contact pins through the electrode holes.
  10. 10. The device for testing the leakage rate of the electrostatic chuck according to claim 1, wherein a plurality of adjusting pads are arranged at the lower end of the base, and the adjusting pads are connected to the base through threads and used for adjusting the levelness of the base.

Description

Electrostatic chuck leakage rate testing device Technical Field The utility model relates to the technical field of semiconductor test equipment, in particular to an electrostatic chuck leakage rate test device. Background The electrostatic chuck is a precise clamp for fixing a workpiece by utilizing electrostatic adsorption force, and is mainly applied to the fields of semiconductor manufacturing, optical processing, high vacuum process and the like. Unlike conventional vacuum chuck or mechanical clamping, it can realize non-contact fixation by electric field effect, and is especially suitable for high clean environment and high precision processing scene. The detection of the gas leakage rate of the electrostatic chuck is a key link for ensuring the stable operation of equipment and the processing quality of products. By accurately detecting the gas leakage rate of the electrostatic chuck, the sealing defect of the chuck can be found in time, unstable process environment caused by gas leakage is avoided, and further the processing precision and yield of products such as wafers are affected. Currently, in the detection means for the gas leakage rate of the electrostatic chuck, it is common to connect the cavity of the testing device with the chuck by means of bolting. However, this conventional connection has a number of serious drawbacks. Firstly, the bolt fastening process needs multi-step manual operation, an operator needs to sequentially screw a plurality of bolts, the process is extremely time-consuming, the efficiency of detection work is greatly reduced, and the requirement of rapid detection is difficult to meet in the modern manufacturing environment pursuing efficient production. Secondly, the multi-step manual operation makes the strength and sequence of each bolt fastening difficult to be completely consistent, and the bolt pretightening force is uneven. The uneven pretightening force is extremely easy to cause local deformation of the sealing ring, and once the sealing ring is locally deformed, the originally compact sealing structure is damaged, so that leakage risk is caused, the accuracy of a gas leakage rate detection result is seriously influenced, even misjudgment on the actual leakage condition of the electrostatic chuck can be possibly caused, and misguidance is brought to subsequent equipment maintenance and production decision. Disclosure of utility model The utility model aims to provide an electrostatic chuck leakage rate testing device which is used for solving the problems of long time consumption, poor repeatability, leakage risk caused by local deformation of a sealing ring and the like caused by the defects of multi-step manual operation, uneven bolt pretightening force and the like in bolt fastening in the existing detection means. Through adopting cylinder drive vacuum cavity and chuck quick closure, replace traditional bolt-up mode, avoided complicated bolted connection installation, guaranteed the atress of sealing washer simultaneously even, be favorable to raise the efficiency and reduce leakage risk. In order to achieve the above object, the present utility model is realized by the following technical scheme: the utility model provides a device for testing the leakage rate of an electrostatic chuck, which comprises: A base; The support is arranged on the upper surface of the base and used for supporting the electrostatic chuck, and a first sealing ring is arranged on the upper surface of the support and used for forming a seal with the electrostatic chuck; The guide frame is arranged on the upper surface of the base and is positioned at the outer side of the supporting table; The cylinder is arranged at the top end of the guide frame, the telescopic end of the cylinder is arranged towards the supporting table, and The vacuum cavity is arranged between the air cylinder and the supporting table, and the telescopic end of the air cylinder is fixedly connected to the upper end of the vacuum cavity so as to drive the vacuum cavity to move up and down; The lower end of the vacuum cavity is provided with a second sealing ring which is used for forming a seal between the vacuum cavity and the electrostatic chuck when the telescopic end of the air cylinder drives the vacuum cavity to move downwards. Optionally, a guide structure is fixedly arranged on the outer side of the vacuum cavity, and the guide structure is slidably arranged to the guide frame along the height direction. Optionally, the guide frame comprises a stand column extending upwards along the upper surface of the base and a top plate arranged at the top end of the stand column, and the top plate is used for bearing the air cylinder; the guide structure is configured as a sleeve slidably disposed to the periphery of the post. Optionally, a silicon wafer is arranged in the vacuum cavity, the silicon wafer is electrically connected to the inner wall of the vacuum cavity, and a glass observation window for observing