CN-224216520-U - Particle detector on photomask plate for lithography machine

CN224216520UCN 224216520 UCN224216520 UCN 224216520UCN-224216520-U

Abstract

A particle detector for a photomask plate of a lithography machine is used for detecting two side surfaces of one photomask plate and cleaning tiny particles on the two side surfaces. The detector comprises a frame, a transport assembly arranged on the frame, at least one cleaning assembly arranged on one side of the transport assembly, and at least two illumination detector assemblies oppositely arranged on the frame. The detector transports the photomask plate through the transport assembly and sequentially through the cleaning assembly and the illumination detector assembly. The laser emitted by the laser emitter is focused through the first convex lens and the second convex lens, tiny particles with the size of 10um can be illuminated at the minimum, signals of light rays are fed back to the light ray receiver to be converted into different frequency spectrums, a computer is used for analysis and calculation, diffuse reflection frequency spectrums and position information of different particle sizes are obtained, and finally the photomask plate is cleaned through the cleaning component according to the particle information obtained by the computer.

Inventors

LIU CHUQUN
WEN XIAOJIAN
JIN XINGSHENG
Song Zhanxiong

Assignees

浙江赛瑾半导体科技有限公司

Dates

Publication Date: 20260508
Application Date: 20250513

Claims (8)

1. The particle detector for the photomask plate of the lithography machine is used for detecting two side surfaces of the photomask plate and cleaning tiny particles on the two side surfaces, and is characterized by comprising a frame, a transportation component arranged on the frame, at least one cleaning component arranged on one side of the transportation component, at least two illumination detector components oppositely arranged on the frame, two illumination detector components, a laser emitter arranged in the shell, a vibrating mirror arranged on one side of the laser emitter, at least two first convex lenses arranged on one side of the vibrating mirror, a first reflecting mirror arranged on one side of the first convex lens, a second convex lens arranged on one side of the first reflecting mirror, a second reflecting mirror arranged on one side of the second convex lens, at least two first reflecting mirrors arranged on one side of the second convex lens, a first reflecting mirror arranged on one side of the first reflecting mirror, a first opening, a third reflecting mirror arranged on one side of the first reflecting mirror arranged on the first reflecting mirror, a third reflecting mirror arranged on the first opening, a third reflecting mirror arranged on the first opening, the first reflecting mirror arranged on the first reflecting mirror, the first opening, and the first reflecting mirror arranged on the first opening, and the first opening, respectively, and the detector, the light receiver is characterized in that the laser transmitter emits laser to form a main light beam, when the main light beam irradiates the photomask plate, part of the main light beam is reflected to form a main reflection line, when the main light beam irradiates tiny particles on the photomask plate, the main light beam is reflected to form a diffuse reflection line, the incident angle of the main light beam irradiated on the photomask plate is 60 degrees, the included angle between the diffuse reflection line and the photomask plate is 15 degrees, and the angle deviating from the main reflection line is 15 degrees.
2. The apparatus of claim 1, wherein the transport assembly comprises a screw moving member disposed on the frame, a rail disposed opposite one side of the screw moving member, and at least three carriers disposed on the screw moving member.
3. The apparatus of claim 2, wherein the length direction of the slide rail is parallel to the alignment direction of the illumination detector assembly and the cleaning assembly.
4. The apparatus for detecting particles on a photomask plate for a lithography machine according to claim 2, wherein the center of the stage is provided with a receiving opening penetrating through the stage body, and four corner positions of the receiving opening are respectively provided with a supporting block in a protruding manner.
5. The apparatus of claim 2, wherein the cleaning assembly comprises at least two supports disposed opposite to each other on the frame, and at least two air blowing blocks disposed on the two supports, respectively.
6. The apparatus of claim 5, wherein the output direction of the two air blowing blocks is oriented in the transporting direction of the stage and is inclined to the transporting direction of the mask.
7. The apparatus of claim 1, wherein one of the illumination detector assemblies is disposed at an output end of one of the lift members.
8. The apparatus of claim 1, wherein the galvanometer is disposed at an output of a servo motor.

Description

Particle detector on photomask plate for lithography machine Technical Field The utility model relates to the technical field of semiconductor manufacturing, in particular to a particle detector on a photomask plate for a photoetching machine. Background The photomask plate used by the photoetching machine plays a role in transferring patterns in the photoetching process, the surface cleanliness requirement is very high, and the cleanliness of hundred or higher levels is usually required, so that the manufacturing quality and the production efficiency of chips are directly influenced by the cleanliness of the surface of the photomask plate. With the continuous maturity of semiconductor manufacturing technology, some detection cleaning apparatuses have also appeared, for example, chinese patent No. cn201910790506.X discloses a mask detection device and a mask cleaning method, which includes a detection chamber for accommodating and detecting whether particles exist on a mask surface, and a purge portion disposed at an end of the detection chamber for performing gas purge on the mask entering and/or exiting the detection chamber to remove the particles on the mask surface. The device can save cleaning time and improve the cleaning efficiency of the photomask plate. However, it can only detect or clean one side of the photomask plate, and cannot simultaneously consider two sides of the photomask plate, so that the detection and cleaning efficiency is still to be improved, and the particle size which can be detected by the detection cavity in the device is 50um, and the detection degree is not high. Disclosure of utility model In view of the above, the present utility model provides a particle detector on a photomask plate for a lithography machine to solve the above-mentioned problems. A particle detector for a photomask plate of a lithography machine is used for detecting two side surfaces of one photomask plate and cleaning tiny particles on the two side surfaces. The particle detector on the photomask plate for the photoetching machine comprises a frame, a conveying assembly arranged on the frame, at least one cleaning assembly arranged on one side of the conveying assembly, and at least two illumination detector assemblies oppositely arranged on the frame. The arrangement direction of the two illumination detector components is perpendicular to the transportation direction of the photomask plate, and the two illumination detector components are respectively positioned at two sides of the transportation direction. The illumination detector assembly comprises a shell, a laser transmitter arranged in the shell, a vibrating mirror arranged on one side of the laser transmitter, at least two first convex lenses arranged on one side of the vibrating mirror, a first reflecting mirror arranged on the first convex lenses, a second convex lens arranged on one side of the first reflecting mirror, a second reflecting mirror arranged on one side of the second convex lens, at least two third convex lenses arranged on one side of the first convex lens, a third reflecting mirror arranged on one side of the vibrating mirror and a light receiver arranged on one side of the third reflecting mirror. An opening is formed in the direction of the shell, facing the other illumination detector component, of the laser transmitter, the laser route of the laser transmitter is that of the laser transmitter, the vibrating mirror, the first convex lens, the first reflecting mirror, the second convex lens, the second reflecting mirror, the opening, the photomask plate, the opening, the first reflecting mirror, the third convex lens, the vibrating mirror, the third reflecting mirror and the light receiver. The laser transmitter emits laser to form a main beam, and when the main beam irradiates the photomask plate, part of the main beam is reflected to form a main reflection line, and when the main beam irradiates tiny particles on the photomask plate, the main beam is reflected to form a diffuse reflection line. The incidence angle of the main beam irradiated on the photomask plate is 60 degrees, the included angle between the diffuse reflection line and the photomask plate is 15 degrees, and the angle deviating from the main reflection line is 15 degrees. Further, the transport assembly includes a lead screw moving member disposed on the frame, a slide rail disposed opposite to one side of the lead screw moving member, and at least three carriers disposed on the lead screw moving member. Further, the length direction of the sliding rail is parallel to the arrangement direction of the illumination detector assembly and the cleaning assembly. Further, a containing opening penetrating through the table body is formed in the center of the carrying table, and supporting blocks are respectively arranged at four corner positions of the containing opening in a protruding mode. Further, the cleaning assembly comprises at least two brackets opposit