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CN-224216991-U - Mask plate supporting device suitable for high-precision lithography

CN224216991UCN 224216991 UCN224216991 UCN 224216991UCN-224216991-U

Abstract

The utility model relates to the technical field of stencil supporting devices, and provides a stencil supporting device suitable for high-precision lithography, which comprises a base and a supporting seat; the upper side of base is provided with the supporting seat, limit structure has evenly been seted up on the top of supporting seat. According to the utility model, the limiting structure is arranged, the clamping block slides in the chute through the limiting block, the clamping block is not easy to generate position deviation in the chute, and the clamping electric push rod is conveniently started to push the clamping block to move in the chute, so that the clamping block limits the mask plate and the rubber pad has a buffering protection effect, and the purpose of conveniently clamping and limiting the mask plate is achieved.

Inventors

  • YU LAN
  • YANG KE
  • JIN XUYA

Assignees

  • 河南微纳半导体科技有限公司

Dates

Publication Date
20260508
Application Date
20250421

Claims (7)

  1. 1. A mask plate supporting device suitable for high-precision lithography comprises a base (1) and a supporting seat (2); the method is characterized in that: A supporting seat (2) is arranged above the base (1), and a limiting structure (3) is uniformly arranged at the top end of the supporting seat (2); The limiting structure (3) comprises sliding grooves (301) uniformly formed in the top end of the supporting seat (2), clamping blocks (302) are arranged in the sliding grooves (301), clamping electric push rods (303) are arranged on one sides of the clamping blocks (302), limiting blocks (304) are fixed on two sides of the bottom of the clamping blocks (302), and rubber pads (305) are arranged on one sides of the top of the clamping blocks (302); the top end of the base (1) is uniformly provided with an adjusting structure (4).
  2. 2. The mask support device for high-precision lithography according to claim 1, wherein the sliding grooves (301) are distributed at equal intervals on the top end of the support base (2), and the limiting blocks (304) are symmetrically distributed on the bottom of the clamping block (302).
  3. 3. The mask support device for high-precision lithography according to claim 1, wherein the limiting blocks (304) are disposed inside the sliding grooves (301), and the clamping blocks (302) and the sliding grooves (301) are in sliding connection through the limiting blocks (304).
  4. 4. The mask support device for high-precision lithography according to claim 1, wherein the side of the clamping electric push rod (303) far away from the clamping block (302) is fixedly connected with one side of the inside of the chute (301).
  5. 5. The mask support device suitable for high-precision lithography according to claim 1, wherein the adjusting structure (4) comprises lifting electric push rods (401) uniformly arranged at the top end of the base (1), the top ends of the lifting electric push rods (401) are arranged on lifting seats (402), a motor (403) is arranged on one side of each lifting seat (402), a screw rod (404) is arranged on one side of each motor (403), a movable seat (405) is arranged in each lifting seat (402), a movable groove (406) is formed in the top end of each movable seat (405), and a movable electric push rod (407) is arranged on one side of the top of each movable groove (406).
  6. 6. The mask support device for high-precision lithography according to claim 5, wherein the lifting electric push rods (401) are symmetrically distributed at the top end of the base (1), and the screw rods (404) are in threaded connection with the movable seat (405).
  7. 7. The mask support device for high-precision lithography according to claim 5, wherein the bottom of the support base (2) is disposed inside the moving groove (406), the support base (2) and the moving base (405) are slidably connected through the moving groove (406), and one side of the moving electric push rod (407) is connected with one side of the support base (2).

Description

Mask plate supporting device suitable for high-precision lithography Technical Field The utility model relates to the technical field of stencil supporting devices, in particular to a stencil supporting device suitable for high-precision photoetching. Background With the development of the times, in order to precisely process parts and the like, the parts and the like are indispensable to the use of a photoetching machine, and when the photoetching machine is operated and used, masks of different processes are required to be frequently replaced to meet the actual use requirements, and in the use process, the masks are required to be subjected to limit installation and use, so that the parts and the like are indispensable to the use of a mask supporting device; The traditional mask plate supporting device is difficult to clamp and limit the mask plate rapidly in the using process, and is inconvenient to adjust the position, the height and the like of the mask plate supporting device, so that the mask plate supporting device is difficult to meet the actual use requirements. Disclosure of utility model The utility model aims to provide a mask plate supporting device suitable for high-precision lithography, which is used for solving the defects that the existing mask plate supporting device suitable for high-precision lithography is inconvenient to clamp and limit and adjust the position height. In order to solve the technical problems, the utility model provides a mask plate supporting device suitable for high-precision photoetching, which comprises a base and a supporting seat; A supporting seat is arranged above the base, and a limiting structure is uniformly arranged at the top end of the supporting seat; The limiting structure comprises sliding grooves uniformly formed in the top end of the supporting seat, clamping blocks are arranged in the sliding grooves, clamping electric push rods are arranged on one sides of the clamping blocks, limiting blocks are fixed on two sides of the bottom of the clamping blocks, and rubber pads are arranged on one sides of the top of the clamping blocks; and the top end of the base is uniformly provided with an adjusting structure. Preferably, the sliding grooves are distributed at equal intervals at the top end of the supporting seat, and the limiting blocks are symmetrically distributed at the bottom of the clamping block. Preferably, the limiting blocks are arranged in the sliding grooves, and the clamping blocks are in sliding connection with the sliding grooves through the limiting blocks. Preferably, one side of the clamping electric push rod far away from the clamping block is fixedly connected with one side of the inside of the sliding groove. Preferably, the adjusting structure comprises lifting electric push rods uniformly arranged at the top end of the base, the top ends of the lifting electric push rods are arranged on the lifting seat, a motor is arranged on one side of the lifting seat, a screw rod is arranged on one side of the motor, a movable seat is arranged in the lifting seat, a movable groove is formed in the top end of the movable seat, and the movable electric push rods are arranged on one side of the top of the movable groove. Preferably, the lifting electric push rods are symmetrically distributed at the top end of the base, and the screw rods are in threaded connection with the movable seat. Preferably, the bottom of the supporting seat is arranged in the moving groove, the supporting seat and the moving seat form sliding connection through the moving groove, and one side of the moving electric push rod is connected with one side of the supporting seat. The mask plate supporting device suitable for high-precision photoetching provided by the utility model has the advantages that: Through being provided with limit structure, the grip block slides in the inside of spout through the stopper to make the grip block be difficult for producing the position offset in the inside of spout, and be convenient for make it promote the grip block and remove in the inside of spout through starting the electric putter of centre gripping, and then make the grip block carry out spacingly and make the rubber pad play buffering protection effect to the mask, thereby reached the purpose of being convenient for carry out the centre gripping spacing to the mask; Through being provided with adjusting structure, the bottom of supporting seat sets up in the inside of removing the groove and then starts to remove electric putter and make the supporting seat remove in the inside of removing the groove, and remove seat and lead screw and be threaded connection, and then start motor makes the lead screw rotate for remove the seat and remove the regulation, thereby in order to be convenient for carry out the altitude mixture control to remove the seat thereby start two sets of lift electric putter and make it promote and remove the seat, thereby reached the purpose of being conve