CN-224216993-U - Optical alignment assembly for exposure machine

Abstract

An optical alignment assembly for an exposure machine comprises two optical alignment devices and a double-sided reflecting mirror. The double-sided reflecting mirror is vertically arranged at a to-be-aligned position of a workbench and is provided with a first vertical reflecting surface and a second vertical reflecting surface opposite to the first vertical reflecting surface, and the first vertical reflecting surface and the second vertical reflecting surface are respectively optically coupled with one half of lenses. The double-sided reflecting mirror is provided with at least one preset pattern and is used for imaging to an image capturing component, and accordingly the image capturing component is used as a positioning reference of the light to be aligned.

Inventors

• LV LIHONG
• YOU KEQIANG
• Yu xingzheng

Assignees

• 宝虹科技股份有限公司

Dates

Publication Date

20260508

Application Date

20250603

Claims (5)

1. 1. An optical alignment assembly for an exposure machine, comprising: Two optical alignment devices respectively located at two ends of a workbench, the optical alignment devices are horizontally symmetrically arranged relative to a to-be-aligned position and each comprising: a half lens for receiving a light from a light source to be aligned and guiding the light to a first orientation and a second orientation, and An image capturing component optically coupled to the semi-transparent mirror and receiving the light from the semi-transparent mirror from the second orientation, and A double-sided reflector vertically arranged on the position to be aligned of the working stage and provided with a first vertical reflecting surface and a second vertical reflecting surface opposite to the first vertical reflecting surface, wherein the first vertical reflecting surface and the second vertical reflecting surface are respectively optically coupled with the semi-transparent mirror, the double-sided reflector is provided with at least one preset pattern, and the double-sided reflector receives the light to be aligned travelling along the first direction from the semi-transparent mirror; The image capturing component is used for capturing an image of the light to be aligned, wherein the image is used for displaying a reflected light of the light to be aligned reflected from the double-sided reflecting mirror and the preset pattern, and accordingly the reflected light is used as a positioning reference of the light to be aligned.
2. 2. The optical alignment assembly of claim 1, wherein the two sides of the double-sided mirror each comprise a predetermined pattern, the predetermined patterns overlapping along a normal direction of the double-sided mirror.
3. 3. The optical alignment assembly of claim 2, wherein the predetermined pattern comprises a ring, circle, square, or cross.
4. 4. The optical alignment assembly of claim 1, wherein the light source is ultraviolet light, deep ultraviolet light or extreme ultraviolet light.
5. 5. The optical alignment assembly of claim 1, wherein the light to be aligned forms an angle with a reflecting surface of the half mirror, and the angle is between 25 ° and 65 °.

Description

Optical alignment assembly for exposure machine Technical Field The present utility model relates to an optical alignment assembly, and more particularly to an optical alignment assembly for an exposure machine. Background The exposure machine is a critical ring in the semiconductor lithography process technology, and optical alignment is required before exposure and development, and the main function is to ensure that the pattern on the photomask is accurately aligned with the substrate during the exposure process, so as to form a desired structure and minimize errors. The optical components of an exposure machine typically include a high precision optical system, an alignment camera, and a control system. The optical alignment component of Xi Zhibao optical machine is to set a flat reflector on the working stage in a lying mode to receive the light to be aligned, and match with a tilting reflector optically coupled with the flat reflector, the flat reflector is engraved with a pattern, when the light to be aligned is reflected by the flat reflector to the tilting reflector, the tilting reflector reflects the light and pattern into the image capturing element for imaging, if the stage is positioned correctly, the pattern imaging will occur in a reasonable range, and a typical configuration can be seen in the Chinese patent publication No. CN 103246170B. Disclosure of utility model The main purpose of the present utility model is to solve the problem of the excessive volume of the alignment mirror in the conventional exposure machine. To achieve the above objective, the present utility model discloses an optical alignment assembly for an exposure machine, which comprises two optical alignment devices and a double-sided mirror. The two optical alignment devices are respectively positioned at two ends of a workbench, are horizontally and symmetrically arranged relative to a to-be-aligned position, respectively comprise a half lens, receive a to-be-aligned light ray, guide the to-be-aligned light ray to a first azimuth and a second azimuth, and an image capturing component which is optically coupled with the half lens and receives the to-be-aligned light ray from the half lens from the second azimuth. The double-sided reflecting mirror is vertically arranged at the position to be aligned of the workbench and is provided with a first vertical reflecting surface and a second vertical reflecting surface opposite to the first vertical reflecting surface, and the first vertical reflecting surface and the second vertical reflecting surface are respectively optically coupled with the semi-transparent mirror. The double-sided reflecting mirror is provided with at least one preset pattern, and receives the light to be aligned, which travels along the first direction, from the semi-transparent mirror. The image capturing component is used for capturing an image of the light to be aligned, wherein the image is used for displaying a reflected light of the light to be aligned reflected from the double-sided reflecting mirror and the preset pattern, and accordingly the reflected light is used as a positioning reference of the light to be aligned. In one embodiment, the two sides of the double-sided mirror respectively comprise a preset pattern, and the preset patterns are overlapped along a normal direction of the double-sided mirror. In one embodiment, the predetermined pattern comprises a ring, circle, square, or cross mark. In one embodiment, the light source is ultraviolet light, deep ultraviolet light or extreme ultraviolet light. In one embodiment, the light to be aligned forms an angle with a reflecting surface of the half mirror, and the angle of the angle ranges between 25 ° and 65 °. Drawings FIG. 1 is a schematic view of an exposure apparatus according to an embodiment of the present utility model; FIG. 2A is a schematic diagram of a preset pattern according to an embodiment of the utility model; FIG. 2B is a schematic diagram of a predetermined pattern according to another embodiment of the present utility model; FIG. 2C is a schematic diagram of a predetermined pattern according to another embodiment of the present utility model; fig. 2D is a schematic diagram of a preset pattern according to another embodiment of the utility model. [ Symbolic description ] 10 Light source 11 To be aligned light 20 Mirror group 20A first reflecting magnifier 20B second reflecting magnifier 30 Lens group 30A first lens 30B second lens 40 Optical alignment assembly 41 Double-sided mirror 411 First vertical reflecting surface 412A second vertical reflecting surface 413 Preset pattern 413A annular shape 413B round shape 413C square 413D cross sign 42 Optical alignment device 421 Semi-transparent mirror 422 Image capturing component 50 Working carrier 60 First light beam 70 Second light beam Theta is the included angle D spacing Detailed Description The terminology used herein is for the purpose of describing particular embodiments