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CN-224218562-U - Wafer processing expands piece in-process static eliminator

CN224218562UCN 224218562 UCN224218562 UCN 224218562UCN-224218562-U

Abstract

The utility model relates to the technical field of wafer expanding and discloses a wafer processing expanding process static eliminating device, which comprises a roll of crystal expanding blue film, wherein one side of the crystal expanding blue film is provided with a clamping component used for clamping and positioning two sides of the crystal expanding blue film, one side of the crystal expanding blue film is provided with a static eliminating component used for eliminating static on the surface of the crystal expanding blue film, one side of the clamping component is provided with a guiding component used for assisting the static eliminating component to move, the outer side of the guiding component is provided with a displacement mechanism used for driving the static eliminating component to move, one side of the clamping component is provided with a supporting component used for supporting the guiding component, the static eliminating component and the clamping component, the device realizes omnibearing static elimination of the surface of the crystal expanding blue film through cooperation among the supporting component, the guiding component, the displacement mechanism, the static eliminating component and the clamping component, and the supporting component provides stable support for the whole device, so that other components can work efficiently on accurate positions.

Inventors

  • MA ZHENGFANG
  • YU YANG

Assignees

  • 江苏众晶半导体有限公司

Dates

Publication Date
20260508
Application Date
20250529

Claims (8)

  1. 1. The wafer processing and wafer expanding process static eliminating device is characterized by comprising a roll of crystal expanding blue film (6), wherein one side of the crystal expanding blue film (6) is provided with a clamping component (5) used for clamping and positioning two sides of the crystal expanding blue film (6), a static eliminating component (4) used for eliminating static on the surface of the crystal expanding blue film (6) is arranged at the upper part of one side of the crystal expanding blue film (6), one side of the clamping component (5) is provided with a guide component (2) used for assisting the static eliminating component (4) to move, the outer side of the guide component (2) is provided with a displacement mechanism (3) used for driving the static eliminating component (4) to move, and one side of the clamping component (5) is provided with a supporting component (1) used for supporting the guide component (2), the static eliminating component (4) and the clamping component (5).
  2. 2. The wafer processing and expanding process static electricity eliminating device according to claim 1, wherein the supporting assembly (1) comprises a main supporting block (101), and a stepping motor (102) and a conductive slip ring (103) are fixedly sleeved at two ends near the inner center of the main supporting block (101).
  3. 3. The wafer processing and expanding process static eliminating device according to claim 2, wherein the guide assembly (2) comprises a first support ring (201) and a second support ring (202), the first support ring (201) is fixedly sleeved outside the output end of the stepping motor (102), the second support ring (202) is fixedly sleeved outside the rotating end of the conductive slip ring (103), the upper ends of the first support ring (201) and the second support ring (202) are fixedly connected with arc racks (203), arc limiting grooves (204) are formed in the centers of two sides, away from each other, of the arc racks (203), and arc guide grooves (205) are formed in the centers of the upper ends of the arc racks (203) close to the two sides.
  4. 4. The wafer processing and expanding process static eliminating device is characterized in that the displacement mechanism (3) comprises two supporting plates (301), the two supporting plates (301) are respectively arranged on two sides of an arc-shaped rack (203), a plurality of supporting columns (302) are fixedly connected to the upper part of the center of one side, which is close to each other, of the arc-shaped rack (203), pulleys (303) are respectively sleeved at one end, which is close to each other, of the outer side of the supporting columns (302), which is close to each other, of the supporting columns (302), through bearings, the pulleys (303) are respectively sleeved inside two arc-shaped limiting grooves (204) in a sliding mode, a transmission shaft (304) is sleeved at the lower part of the inner center of the two supporting plates (301) through bearings in a rotating mode, a spur gear (305) is fixedly sleeved at the center of the outer side of the transmission shaft (304), and the spur gear (305) and the arc-shaped rack (203) are in gear meshing transmission.
  5. 5. The wafer processing and expanding process static eliminating device is characterized in that a plurality of threaded holes (306) are formed in the center of the upper ends of the two supporting plates (301) in an equal-distance arrangement mode, a butt plate (307) is arranged at the upper ends of the two supporting plates (301), a plurality of fastening bolts (308) are sleeved on the inner portions of the butt plate (307) at equal-distance arrangement threads on two sides, the assembling ends of the fastening bolts (308) are respectively sleeved on the inner portions of the threaded holes (306) in a threaded mode, a protective cover (309) used for protecting the spur gear (305) is fixedly sleeved at the lower ends of the two supporting plates (301), a servo motor (3010) is fixedly connected to the position, close to the lower portion, of one side of the spur gear (305), of the supporting plate (301) at the center of the lower end of the butt plate (307) is fixedly connected with an arc guide rail (3011), and the two arc guide rails (3011) are respectively and slidably sleeved inside the two arc guide grooves (205).
  6. 6. The wafer processing expands piece process static elimination equipment of 5, wherein static elimination subassembly (4) include support riser (401), support riser (401) fixed connection is in the backup pad (301) one side center department of keeping away from servo motor (3010) one side department, support riser (401) keep away from backup pad (301) one side center and lean on upper and lower both ends department all fixedly connected with spacer bush (402), two the inside fixed cover of spacer bush (402) is equipped with electric telescopic handle (403), electric telescopic handle (403) output fixedly connected with cutting ferrule (404) of department of leaning on, cutting ferrule (404) inside joint has ion fan (405).
  7. 7. The wafer processing and expanding process static eliminating device is characterized in that the clamping assembly (5) comprises two supporting strips (501), the two supporting strips (501) are fixedly connected to the positions, close to the upper end and the lower end, of one side center of the main supporting block (101), horizontal guide grooves (502) are formed in the positions, close to the lower end, of the inner center of the supporting strip (501) and the positions, close to the upper end, of the inner center of the supporting strip (501), of the upper end, two side supporting blocks (503) are fixedly connected to the two ends of the supporting strip (501), positive and negative tooth screw rods (504) are rotatably sleeved in the two side supporting blocks (503) through bearings, and one end of each positive and negative tooth screw rod (504) is fixedly connected with an adjusting knob (505).
  8. 8. The wafer processing and expanding process static eliminating device is characterized in that sliding blocks (506) are sleeved at two ends of the outer side of the positive and negative screw rod (504) in a threaded mode, horizontal guide rails (507) are fixedly connected to the upper end and the lower end of the two sliding blocks (506), the four horizontal guide rails (507) are respectively sleeved inside the two horizontal guide grooves (502) in a sliding mode, clamping plates (508) are fixedly connected to the center of one side, far away from the main supporting block (101), of the two sliding blocks (506), damping bearings (509) are fixedly sleeved at the inner centers of the two clamping plates (508), inserting rods (5010) are clamped at the inner rings of the two damping bearings (509), the inserting rods (5010) are detachably connected with the two damping bearings (509), and crystal expanding blue films (6) are wound on the outer sides of the damping bearings (509).

Description

Wafer processing expands piece in-process static eliminator Technical Field The utility model relates to the technical field of wafer expanding, in particular to a wafer processing and expanding process static eliminating device. Background The device is mainly used for eliminating static electricity on the surface of a crystal-expanded blue film in the wafer processing and expanding process, static electricity is easy to accumulate on the surface of the blue film in the crystal-expanded blue film carrying and processing process, particles possibly pollute or damage the wafer after crystal expansion, therefore effective static electricity eliminating measures are required to be taken, the device generally adopts ion wind, static electricity discharging and other technologies, negative and positive ion flow neutralization static electricity is generated, adverse effect on the surface of the wafer caused by the static electricity is avoided, the normal operation of the static electricity eliminating device is facilitated, the stability of the wafer processing process is ensured, the production efficiency is improved, and the quality and the yield of a final product are ensured. However, in the prior art, in the conventional wafer processing and expanding process, a fixed ion blower is generally adopted for the crystal expanding blue film static eliminating device, the fixed ion blower is mainly used for removing static electricity and dust accumulated on the surface of the crystal expanding blue film, however, the fixed ion blower has certain limitation, the situation that the surface of the crystal expanding blue film which is pulled out cannot be covered on the whole surface is mainly achieved, due to the mobility and position change of the crystal expanding blue film in the processing process, the fixed ion blower cannot always keep effective coverage on the whole surface, so that partial areas cannot be fully neutralized, static electricity accumulation is generated, particle pollution is easily caused by the static electricity accumulation, damage to the surface of a wafer is possibly caused, the stability of a subsequent process is possibly influenced, in addition, the static electricity cannot be eliminated timely, abnormality can be caused in the equipment failure or the processing process, and production efficiency and yield are seriously influenced. Disclosure of utility model The utility model aims to provide a wafer processing and expanding process static eliminating device, which solves the problems that in the prior art, in the traditional wafer processing and expanding process, a fixed-mounted ion fan is generally adopted, the fixed-mounted ion fan is mainly used for removing static electricity and dust accumulated on the surface of a crystal expanding blue film, however, the fixed-mounted ion fan has certain limitations, mainly appears that the surface of the crystal expanding blue film cannot be fully covered and pulled out, and the fixed ion fan cannot always keep effective coverage on the whole surface due to the mobility and position change of the crystal expanding blue film in the processing process, so that partial areas possibly cannot be fully neutralized to further generate static electricity accumulation, the static electricity accumulation not only easily causes particle pollution, can cause damage to the surface of the wafer, but also can influence the stability of a subsequent process, and in addition, the static electricity cannot be timely eliminated, can cause equipment faults or abnormal conditions in the processing process, and seriously influence the production efficiency and the yield. The utility model provides a wafer processing and wafer expanding process static eliminating device which comprises a roll of crystal expanding blue film, wherein one side of the crystal expanding blue film is provided with a clamping component used for clamping and positioning two sides of the crystal expanding blue film, a static eliminating component used for eliminating static on the surface of the crystal expanding blue film is arranged at the upper part of one side of the crystal expanding blue film, one side of the clamping component is provided with a guide component used for assisting the static eliminating component to move, the outer side of the guide component is provided with a displacement mechanism used for driving the static eliminating component to move, and one side of the clamping component is provided with a supporting component used for supporting the guide component, the static eliminating component and the clamping component. As the optimization of the technical scheme, the supporting component comprises a main supporting block, and a stepping motor and a conductive slip ring are respectively fixedly sleeved at two ends of the inner center of the main supporting block. As the preference of above-mentioned technical scheme, the direction subassembly includes first suppor