CN-224221321-U - Substrate oxidation device for photosensitive material plate

CN224221321UCN 224221321 UCN224221321 UCN 224221321UCN-224221321-U

Abstract

The utility model relates to the technical field of photosensitive material plate production equipment, in particular to a substrate oxidation device of a photosensitive material plate, which comprises an oxidation tank, wherein the oxidation tank is provided with a left inlet end and a right outlet end, a reducing roller and a conveying roller are arranged in the oxidation tank, a substrate enters into oxidizing liquid in the oxidation tank from the inlet end, oxidation of the surface of the substrate is completed in the oxidation tank, the oxidized substrate comes out from the outlet end, the substrate enters from the inlet end, passes through the reducing roller and comes out from the outlet end to form an oxidation route, a defoaming roller is arranged in the oxidation tank, a rubber material layer is arranged around the defoaming roller, the defoaming roller is connected with a defoaming motor, and the rubber material layer contacts the oxidation route. Has the advantages of fewer pinholes on the oxide film and good oxide film quality.

Inventors

ZHANG CHAOYANG
ZHANG KAIXUAN

Assignees

河南汇达印通科技股份有限公司

Dates

Publication Date: 20260512
Application Date: 20250530

Claims (4)

1. The substrate oxidation device of the photosensitive material plate comprises an oxidation tank, wherein the oxidation tank is provided with a left inlet end and a right outlet end, a conveying roller is arranged on the oxidation tank, a reducing roller is arranged in the oxidation tank, a substrate enters into oxidizing liquid in the oxidation tank from the inlet end, oxidation of the surface of the substrate is completed in the oxidation tank, the oxidized substrate comes out from the outlet end, and an oxidation route is formed from the inlet end, through the effect of the reducing roller and the outlet end, and the substrate oxidation device is characterized in that a defoaming roller is arranged in the oxidation tank, a rubber material layer is arranged around the defoaming roller, the defoaming roller is connected with a defoaming motor, and the rubber material layer contacts the oxidation route.
2. The apparatus for oxidizing a substrate of a photosensitive material sheet according to claim 1, wherein said defoaming roller is plural, and plural defoaming rollers are provided in front and rear of the oxidizing line, respectively.
3. The apparatus for oxidizing a substrate of a sheet of photosensitive material of claim 1, wherein said plurality of defoaming rollers comprises a forward rotating defoaming roller and a backward rotating defoaming roller, wherein a portion of said forward rotating defoaming roller in contact with said oxidizing line is a forward rotating defoaming roller, and wherein a portion of said backward rotating defoaming roller in contact with said oxidizing line is a backward rotating defoaming roller.
4. The apparatus for oxidizing a substrate of a photosensitive material sheet according to claim 2, wherein said defoaming roller comprises an upper defoaming roller installed above the oxidizing path and a lower defoaming roller installed below the oxidizing path.

Description

Substrate oxidation device for photosensitive material plate Technical Field The utility model relates to the technical field of photosensitive material plate production equipment, in particular to a photosensitive material plate substrate oxidation device. Background The photosensitive material plate comprises a substrate and a layer of photosensitive liquid medicine on the substrate, wherein the substrate firstly forms a layer of oxide film on the surface of the substrate, then coats a layer of photosensitive liquid medicine on the oxide film of the substrate to obtain the photosensitive material plate, and the equipment for forming the oxide film on the substrate is an oxidation device of the substrate of the photosensitive material plate. The oxidation device for the substrate of the photosensitive material plate comprises an oxidation tank, wherein the oxidation tank is provided with a left inlet end and a right outlet end, a conveying roller is arranged on the oxidation tank, a reducing roller is arranged in the oxidation tank, the substrate enters the oxidation tank from the inlet end, oxidation of the surface of the substrate is completed in the oxidation tank, the oxidized substrate comes out from the outlet end, and an oxidation route is formed by the action of the reducing roller and the substrate from the inlet end to the outlet end, bubbles are often formed on the substrate in the oxidation process of the substrate, pinholes (small holes without oxidation) are formed on the oxide layer of the substrate due to the existence of the bubbles, the product quality is influenced, and in the prior art, the oxidation tank is not provided with a device for eliminating the bubbles, so that the product quality cannot be ensured. Disclosure of Invention The utility model aims to overcome the defects and provide a substrate oxidation device with fewer pinholes on an oxidation film and a photosensitive material plate with good oxidation film quality. The technical scheme is that the substrate oxidation device of the photosensitive material plate comprises an oxidation tank, wherein the oxidation tank is provided with a left inlet end and a right outlet end, a conveying roller is arranged on the oxidation tank, a reducing roller is arranged in the oxidation tank, the substrate enters oxidizing liquid in the oxidation tank from the inlet end, oxidation of the surface of the substrate is completed in the oxidation tank, the oxidized substrate comes out from the outlet end, and the substrate enters from the inlet end, passes through the reducing roller and comes out from the outlet end to form an oxidation route, and is characterized in that a defoaming roller is arranged in the oxidation tank, a rubber material layer is arranged around the defoaming roller, the defoaming roller is connected with a defoaming motor, and the rubber material layer contacts the oxidation route. Further, the defoaming rollers are multiple, and the defoaming rollers are respectively arranged in front of and behind the oxidation route. Further, the defoaming rollers are multiple, the defoaming rollers comprise a front rotating defoaming roller and a rear rotating defoaming roller, the contact part of the front rotating defoaming roller and the oxidation route is the front rotating defoaming roller, and the contact part of the rear rotating defoaming roller and the oxidation route is the rear rotating defoaming roller. The substrate oxidation device has the advantages of fewer pinholes on the oxidation film and good oxidation film quality. Drawings Fig. 1 is a schematic side view of the present utility model. Wherein, 1, an oxidation tank 11, an inlet end 12, an outlet end 13, a reducing roller 14, a conveying roller 2, an oxidation route 3, an oxidation route 4, a defoaming roller 41, a rubber material layer 42, a front rotation defoaming roller 43, a rear rotation defoaming roller 44, an upper defoaming roller 45 and a lower defoaming roller. Detailed Description In describing the preferred embodiments of the present utility model, it should be noted that, unless otherwise explicitly indicated and limited thereto, the terms "disposed," "mounted," and "connected" should be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected, mechanically connected, directly connected, indirectly connected through an intermediate connection, or communicating between the two elements. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances. In order that the utility model may be better understood, a further description of the utility model will be provided with reference to the accompanying drawings. As shown in figure 1, the substrate oxidation device of the photosensitive material plate comprises an oxidation tank 1, wherein the oxidation tank is provided with a left inlet end 11 and a righ