CN-224221842-U - Photoresist spin coating device with pre-baking function

Abstract

The application discloses a photoresist spin-coating device with a pre-baking function. The vacuum spin coating device comprises a vacuum spin coating box provided with a sealing door, wherein two ends of the vacuum spin coating box are respectively connected with a coating unit and a vacuumizing system, a bottom plate is fixedly connected to the bottom in the vacuum spin coating box, the top of the vacuum spin coating box is connected with a pre-drying mechanical arm, and an electrostatic adsorption supporting table for installing a wafer is connected to the bottom plate. The photoresist spin coating device with the pre-drying function solves the technical problem that the existing device cannot realize the integrated control of vacuum coating and pre-drying.

Inventors

• SHA XIANG
• YANG GUOQUAN
• TAN CHANGLE
• LI NING
• TANG XINYI
• WANG SINUO
• Diao Dongqi
• ZENG FANGLEI
• ZHANG HAO

Assignees

• 常州大学

Dates

Publication Date

20260512

Application Date

20250512

Claims (6)

1. 1. The photoresist spin coating device with the pre-baking function is characterized by comprising a vacuum spin coating box (1) provided with a sealing door, wherein two ends of the vacuum spin coating box (1) are respectively connected with a coating unit and a vacuumizing system, a bottom plate (11) is fixedly connected to the inner bottom of the vacuum spin coating box (1), a pre-baking mechanical arm (3) is connected to the top of the vacuum spin coating box, and an electrostatic adsorption supporting table (43) for installing a wafer (9) is connected to the bottom plate (11); The device is characterized in that the execution end of the pre-drying mechanical arm (3) is fixedly connected with a lampshade (31) with an optical filter (33) at the outermost end, a plurality of heating light sources (32) are electrically connected in the lampshade (31), the heating light sources (32) are located between the bottom wall of the lampshade (31) and the optical filter (33), the pre-drying mechanical arm (3) is used for driving the lampshade (31) to move to the position right above the wafer (9), and the heating light sources (32) transmit radiant energy with preset wavelength to the wafer (9) through the optical filter (33).
2. 2. The photoresist spin coating device with the pre-baking function according to claim 1, wherein the coating unit comprises a gluing mechanical arm (2) arranged on a bottom plate (11), the execution end of the gluing mechanical arm (2) is fixedly connected with a connecting plate (21), the connecting plate (21) is fixedly connected with a coating assembly (5) for gluing, and the upper end of the coating assembly (5) is communicated with a rubber conveying pipeline (71).
3. 3. A photoresist spin coating apparatus with a pre-baking function according to claim 2, wherein the upper end of the coating assembly (5) is a buffer chamber (52) communicated with the rubber delivery pipeline (71), and the lower end is a nozzle (51) in threaded connection with the buffer chamber (52).
4. 4. A photoresist spin coating apparatus with a pre-baking function according to claim 2, wherein the coating unit further comprises a metering pump (6) installed at an outer wall of one side of the vacuum spin coating tank (1) and a storage chamber (7) storing photoresist, the photoresist delivery pipe (71) is communicated with a top end of the storage chamber (7), and both ends of the metering pump (6) are communicated with the photoresist delivery pipe (71).
5. 5. The photoresist spin coating device with the pre-baking function according to claim 1, wherein a motor (41) is fixedly connected to the bottom of the bottom plate (11), an annular fixing device (42) is fixedly connected to the output end of the motor (41), a bearing is arranged between the output end of the motor (41) and the bottom plate (11), the top of the fixing device (42) is fixedly connected with the bottom of the electrostatic adsorption supporting table (43), a shielding cylinder (4) is detachably connected to the peripheral wall of the electrostatic adsorption supporting table (43) along the circumferential direction, the wafer (9) is mounted on the electrostatic adsorption supporting table (43), and the fixing device (42) and the electrostatic adsorption supporting table (43) are concentrically arranged with each other.
6. 6. The photoresist spin coating device with the pre-baking function according to claim 1, wherein the vacuumizing system comprises a vacuumizing tube (81) communicated with the vacuum spin coating box (1), and one end of the vacuumizing tube (81) is connected with a vacuumizing end of a vacuumizing pump (8).

Description

Photoresist spin coating device with pre-baking function Technical Field The application relates to the technical field of photoresist, in particular to a photoresist spin-coating device with a pre-baking function. Background In the field of semiconductor micro-nano processing and manufacturing, a photoresist coating process is a key link for determining the performance of a device. The coating quality of photoresist directly affects pattern transfer accuracy and device reliability, and its uniformity requires that the critical standard be met in the prior process. The traditional coating process mainly adopts a rotary coating technology, but has the obvious defects that an open operating environment is easily polluted by dust particles in air, so that a photoresist film has pinhole defects, the photoresist film is required to be transferred to an independent oven for prebaking after being coated, the process continuity is poor, secondary pollution is easy to introduce, the glue solution is unevenly distributed due to centrifugal force generated by high-speed rotation, the integral film thickness deviation is formed, and the pattern transfer accuracy is influenced. In the prior art, the defects of the traditional process are overcome through structural improvement, for example, environmental exposure time is reduced by adopting an alternate operation mode of a pre-drying unit and a glue spraying unit, but the pollution of dust particles in the air cannot be completely eradicated by open operation, or the gluing quality is improved through a vacuum environment, but the process consistency is poor and secondary pollution is easy to introduce due to an independent pre-drying process. More importantly, the existing device cannot realize the integrated control of glue spreading and pre-baking, and especially lacks a dynamic regulation and control means for glue flow in the high-speed rotation process. The technical bottlenecks restrict the application of high-end photoresist, and development of a novel spin coating device integrating vacuum environment control, dynamic pre-baking and dynamic balance electrostatic adsorption supporting tables is needed, pollutant interference is eliminated through vacuum sealing operation, disordered volatilization of a solvent is inhibited by combining dynamic energy regulation and control, stable rotation control of the dynamic balance electrostatic adsorption supporting tables is utilized, centrifugal flow of glue solution is effectively inhibited, and therefore high-precision glue coating is achieved. Disclosure of Invention Based on the above problems in the prior art, an object of the present application is to provide a photoresist spin coating device with a pre-baking function, so as to solve the problems set forth in the above background art. The photoresist spin coating device with the pre-baking function comprises a vacuum spin coating box provided with a sealing door, wherein two ends of the vacuum spin coating box are respectively connected with a coating unit and a vacuumizing system, a bottom plate is fixedly connected to the bottom of the vacuum spin coating box, the top of the vacuum spin coating box is connected with the pre-baking mechanical arm, and an electrostatic adsorption supporting table for installing wafers is connected to the bottom plate; The device is characterized in that the execution end of the pre-drying mechanical arm is fixedly connected with a lampshade with an optical filter at the outermost end, a plurality of heating light sources are electrically connected in the lampshade, the heating light sources are located between the bottom wall of the lampshade and the optical filter, the pre-drying mechanical arm is used for driving the lampshade to move to the position right above a wafer, and the heating light sources transmit radiation energy with preset wavelength to the wafer through the optical filter. Further, the coating unit comprises a gluing mechanical arm arranged on the bottom plate, the execution end of the gluing mechanical arm is fixedly connected with a connecting plate, a coating assembly used for gluing is fixedly connected to the connecting plate, and the upper end of the coating assembly is communicated with a glue conveying pipeline. Further, the upper end of the coating assembly is a buffer chamber communicated with the rubber conveying pipeline, and the lower end of the coating assembly is a nozzle in threaded connection with the buffer chamber. Further, the coating unit further comprises a metering pump and a storage chamber, wherein the metering pump is arranged on the outer wall of one side of the vacuum spin coating box, the storage chamber is used for storing photoresist, the glue conveying pipeline is communicated with the top end of the storage chamber, and two ends of the metering pump are communicated with the glue conveying pipeline. Further, the bottom fixedly connected with motor of bottom plate, the output fixed