CN-224222103-U - Automatic production line for removing glue from monocrystalline silicon slice crystal support

CN224222103UCN 224222103 UCN224222103 UCN 224222103UCN-224222103-U

Abstract

The utility model belongs to the technical field of production related to crystal silicon slicing, and discloses an automatic production line for removing glue from a crystal support of a monocrystalline silicon slice. Comprises a viscose board separating device, a crystal support heating mechanism, crystal support glue removing equipment, a crystal support cleaning and cooling device and a detection mechanism which are sequentially arranged; the crystal support heating mechanism is used for heating the crystal support, the crystal support glue removing equipment is used for removing glue from the heated crystal support, the crystal support cleaning and cooling device is used for cleaning and air-drying the crystal support after glue removal, and the detection mechanism is used for detecting whether the crystal support after glue removal is qualified or not. The adhesive plates are separated preferentially, the working time is saved due to the integral process change, the efficacy is shortened, and the degumming effect is good.

Inventors

DENG JIE
JU XIUYONG
GAO SHOUQING
CAO CHUNFENG
GAO DONGDONG
YANG XU
WU PENG

Assignees

连智(大连)智能科技有限公司

Dates

Publication Date: 20260512
Application Date: 20250225

Claims (10)

1. The monocrystalline silicon slice crystal support photoresist removing automatic production line is characterized by comprising a viscose plate separating device (1), a crystal support heating mechanism (3), crystal support photoresist removing equipment (4), a crystal support cleaning and cooling device (5) and a detection mechanism (6) which are sequentially arranged in sequence, wherein the crystal support heating mechanism (3), the crystal support photoresist removing equipment (4) and the crystal support cleaning and cooling device (5) are arranged above a conveying mechanism (2) for conveying and rotating workpieces, the viscose plate separating device (1) is used for separating viscose plates on a crystal support, the crystal support heating mechanism (3) is used for heating the crystal support, the crystal support photoresist removing equipment (4) is used for removing photoresist from the heated crystal support, the crystal support cleaning and cooling device (5) is used for cleaning and air-drying the photoresist removed crystal support, and the detection mechanism (6) is used for detecting whether residual photoresist exists or not.
2. The monocrystalline silicon slice crystal support photoresist removing automatic production line according to claim 1 is characterized in that the adhesive plate separating device (1) comprises a main body frame (101), a crystal support positioning mechanism (102), a plate picking mechanism (103), a reciprocating transplanting mechanism (104), a plate picking mechanism (105), a plate separating mechanism (106) and a crystal support transplanting platform (107), wherein the crystal support positioning mechanism (102) is arranged on a frame body at one end of the main body frame (101), the reciprocating transplanting mechanism (104) is arranged on a base of the main body frame (101), the plate picking mechanism (103) is arranged at the adjacent position of the reciprocating transplanting mechanism (104), the plate separating mechanism (106) and the plate picking mechanism (105) are arranged on the main body frame (101), the crystal support transplanting platform (107) is arranged at the rear of the reciprocating transplanting mechanism (104), the plate separating mechanism (106) is arranged above the reciprocating transplanting mechanism (104), the plate picking mechanism (105) is arranged on a frame body at the side of the main body frame (101), and the plate picking mechanism (105) is arranged at the front position of the separating mechanism (106).
3. The monocrystalline silicon slice crystal support photoresist removing automatic production line according to claim 1 is characterized in that the conveying mechanism (2) comprises a truss beam (201), a conveying gripper (202) and a conveying rotary gripper (205) are arranged on the truss beam (201), the conveying gripper (202) and the conveying rotary gripper (205) are connected with the truss beam (201) through conveying traveling guide components, the conveying gripper (202) comprises an X-axis traveling component and a Z-axis traveling component, the Z-axis traveling component is arranged on the X-axis traveling component, a conveying clamping jaw (203) is arranged at the bottom of the Z-axis traveling component, the conveying rotary gripper (205) comprises an X-axis traveling component and a Z-axis traveling component, the Z-axis traveling component is arranged on the X-axis traveling component, a conveying rotary component (204) is arranged at the bottom of the Z-axis traveling component, and the bottom of the conveying rotary component (204) is connected with the conveying clamping jaw (203).
4. The monocrystalline silicon slice crystal support photoresist removing automatic production line according to claim 1 is characterized in that the crystal support heating mechanism (3) comprises a heating base (301) and a preliminary positioning component (302), the preliminary positioning component (302) is arranged at the front end in the heating base (301), a heating water tank (303) is arranged at the rear end of the preliminary positioning component (302), the heating water tank (303) is fixed on the heating base (301) through a heating water tank fixing frame (304), a waterproof baffle (305) for waterproofing is further arranged on the upper portion of the heating base (301), the preliminary positioning component (302) comprises a preliminary positioning frame (30201), two preliminary positioning cylinders (30202) are respectively arranged at two ends of the preliminary positioning frame (30201), the front ends of cylinder rods of the preliminary positioning cylinders (30202) are oppositely arranged, the front ends of the guide limiting pieces (30204) are connected through connecting pieces, and the front end faces of the guide limiting pieces (30204) are of U-shaped structures.
5. The monocrystalline silicon slice crystal support photoresist removing automatic production line according to claim 1 is characterized in that crystal support photoresist removing equipment (4) comprises a bottom integral frame (401), a primary scraper mechanism (402) is arranged at one end of the bottom integral frame (401), a lifting turnover mechanism (403), a photoresist scraping mechanism (406) and a polishing mechanism (407) are sequentially arranged on the bottom integral frame (401), a conveying roller way (404) for conveying workpieces is further arranged on the bottom integral frame (401), the conveying roller way (404) is inserted and arranged in the lifting turnover mechanism (403), the conveying roller way (404) is arranged below the photoresist scraping mechanism (406) and the polishing mechanism (407), lifting positioning mechanisms (405) are arranged below the photoresist scraping mechanism (406) and the polishing mechanism (407), the lifting positioning mechanisms (405) are arranged on the bottom integral frame (401) and are arranged in the middle of the conveying roller way (404), and the primary scraper mechanism (402) is arranged at the front end of the conveying roller way (404).
6. The monocrystalline silicon slice crystal support photoresist removing automatic production line according to claim 1, wherein the crystal support cleaning and cooling device (5) comprises a cleaning and cooling fixing frame (501), and a vibration cleaning tank (502) and a flushing and air drying mechanism (503) are sequentially arranged on the cleaning and cooling fixing frame (501).
7. The monocrystalline silicon wafer support photoresist removing automatic production line according to claim 1, wherein the detecting mechanism (6) is used for detecting whether residual photoresist exists, the detecting mechanism (6) comprises a detecting conveying roller way (601), a detecting fixing frame body (602) is arranged on the upper portion of the detecting conveying roller way (601), an industrial camera (603) is arranged on the detecting fixing frame body (602), and a light source (604) is arranged at the adjacent position of the industrial camera (603).
8. The automatic production line for removing the photoresist from the monocrystalline silicon slice crystal support is characterized in that the conveying and walking guide assembly is racks, the two racks are arranged on the truss beam (201), and the conveying mechanism (2) is arranged on the top of a frame body of the crystal support heating mechanism (3), the crystal support photoresist removing device (4) and the crystal support cleaning and cooling device (5) through fixing frames.
9. The automatic production line for removing photoresist from monocrystalline silicon slice crystal support according to claim 6, wherein the rinsing and air-drying mechanism comprises a rinsing conveying roller way (50301) for conveying the crystal support, a box body (50302) is arranged on the rinsing conveying roller way (50301), a rinsing component and an air-drying component are sequentially arranged in the box body (50302) in sequence and are respectively used for rinsing the crystal support and the air-drying crystal support, a driving motor (50306) for driving the rinsing conveying roller way (50301) to convey is arranged on one side of the rinsing conveying roller way (50301), the output end of the driving motor (50306) is connected with the rinsing conveying roller way (50301), a lifting component for opening a box door is arranged at the front end of the box body (50302), a baffle is arranged between the rinsing component and the air-drying component, the baffle is arranged in the box body, a channel for the crystal support to pass through is arranged on the baffle, and the channel shape is profiled.
10. An automated production line for removing photoresist from a monocrystalline silicon wafer holder as defined in claim 7, wherein the detection roller (601) is disposed at the end of the washing roller (50301).

Description

Automatic production line for removing glue from monocrystalline silicon slice crystal support Technical Field The utility model belongs to the technical field of production related to crystal silicon slicing, and relates to an automatic production line for removing glue from a crystal support of a monocrystalline silicon slice. Background The photovoltaic power generation is an emerging industry of green and environment-friendly energy, and is widely focused in the field of global energy, and the unique advantage of the photovoltaic power generation provides powerful support for improving the durability and safety of power generation. A slicing workshop of photovoltaic is to use a slicing machine to process silicon rods into silicon wafers, greatly improve the wafer output rate of monocrystalline silicon crystal materials, and the main process flow is to carry out adhesive curing on the crystal rods, the adhesive plates and the crystal holders in an adhesive curing production line, then the wafer is conveyed to a slicing machine for slicing, the sliced wafer is conveyed to a degumming cleaning device, and the wafer support is degummed and then flows back to a viscose curing production line. The automatic production line is used for improving the working efficiency, reducing the material loss, reducing the operation cost of enterprises, precisely controlling the glue quantity and reducing the emission of harmful substances. The existing mainstream technology still has the defects of low efficiency, pollution and the like because of manual glue shoveling after crystal support in water boiling. The improvement of production efficiency and quality is seriously hampered. From the aspect of efficiency, the crystal support needs a long heating waiting process, and the manual shoveling relies on manual work of workers, so that the crystal support is low in speed and easy to drop in efficiency due to fatigue, and the crystal support is difficult to match with the fast-paced requirement of mass production. In the aspect of environmental pollution, steam containing chemical substances generated by water boiling can pollute the atmosphere, and if the shoveling rubber wastewater is directly discharged without effective treatment, the water body can be seriously polluted, and the difficulty and the cost of sewage treatment are increased. The instability of manual operation causes the cleanliness of the crystal support to be different, and the quality of the subsequent process and the final product is affected. Moreover, the safety risks such as scalding and burning are not neglected in the process of contacting the high-temperature equipment with harmful substances, and safety liability accidents are easy to cause. And the existing technology is that after the adhesive plate and the crystal support are boiled together, the whole working procedure is time-consuming and labor-consuming, the time-consuming is long, the degumming effect is poor, and the working condition treatment difficulty is high. Disclosure of Invention The utility model aims to overcome the defects in the background technology, and provides an automatic production line for removing the adhesive from the monocrystalline silicon wafer support, which is used for preferentially separating the adhesive plate, so that the working time is saved, the efficacy is shortened, and the degumming effect is good due to the integral process change. The technical scheme includes that the monocrystalline silicon slice crystal support photoresist removing automatic production line comprises a viscose plate separating device, a crystal support heating mechanism, crystal support photoresist removing equipment, a crystal support cleaning and cooling device and a detection mechanism which are sequentially arranged, wherein a carrying mechanism for carrying and rotating workpieces is arranged above the crystal support heating mechanism, the crystal support photoresist removing equipment and the crystal support cleaning and cooling device, the viscose plate separating device is used for separating viscose plates on a crystal support, the crystal support heating mechanism is used for heating the crystal support, the crystal support photoresist removing equipment is used for removing photoresist from the heated crystal support, the crystal support cleaning and cooling device is used for cleaning and air-drying the photoresist removed crystal support, and the detection mechanism is used for detecting whether the photoresist removed crystal support is qualified or not. The production process route of the production line comprises the steps of viscose board separation, crystal support heating, crystal support glue removal, crystal support cleaning and cooling, and crystal support residual glue detection; The crystal support is conveyed to the viscose board separating device through the roller way, and viscose boards adhered on the crystal support are separated. The crystal support