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CN-224222190-U - Cleaning device for semiconductor production and processing

CN224222190UCN 224222190 UCN224222190 UCN 224222190UCN-224222190-U

Abstract

The utility model relates to the technical field of semiconductor processing and cleaning and discloses a cleaning device for semiconductor production and processing, which comprises a cleaning mechanism, wherein a drainage pipeline is fixedly arranged on one side of the cleaning mechanism, a filtering mechanism is fixedly arranged on one side of the drainage pipeline, a post-filtering storage tank is fixedly arranged on one side of the filtering mechanism, an adjusting mechanism is fixedly arranged on one side of the cleaning mechanism, a clamping mechanism is arranged between the inner sides of the adjusting mechanism, the clamping mechanism comprises a plurality of sections of lifting rods, connecting rods are fixedly arranged between every two sections of lifting rods, C-shaped screws are fixedly arranged on one side of each section of lifting rod in front of and behind, and thread oval sleeves are sleeved on the thread of each section of the body of each C-shaped screw rod.

Inventors

  • LIU JUNQIAO
  • ZHU JINWEI

Assignees

  • 深圳市创然电子有限公司

Dates

Publication Date
20260512
Application Date
20250513

Claims (7)

  1. 1. The cleaning device for the semiconductor production and processing is characterized by comprising a cleaning mechanism (1), wherein a drainage pipeline (2) is fixedly arranged on one side of the cleaning mechanism (1) downwards, a filtering mechanism (3) is fixedly arranged on one side of the drainage pipeline (2), a post-filtering storage box (4) is fixedly arranged on one side of the filtering mechanism (3), an adjusting mechanism (7) is fixedly arranged on one side of the cleaning mechanism (1), and a clamping mechanism (8) is arranged between the inner sides of the adjusting mechanism (7); The clamping mechanism (8) comprises a plurality of sections of lifting rods (801), connecting rods (802) are fixedly arranged between every two sections of lifting rods (801), C-shaped screws (803) are fixedly arranged on one side of each section of lifting rods (801) front and back, and a plurality of rod bodies of the C-shaped screws (803) are sleeved with thread oval sleeves (804); The adjusting mechanism (7) comprises two supporting and conveying plates (701), one of the two supporting and conveying plates (701) penetrates through the cleaning mechanism (1) and extends to the outer side, the other supporting and conveying plate is fixedly arranged on one side of the inner wall of the cleaning mechanism (1), and the two supporting and conveying plates (701) are flush in height; Threaded rods (703) are rotatably arranged on the top sides of the two support transmission plates (701), a motor (702) is fixedly arranged on the top side of one support transmission plate (701), and a separation disc (704) is fixedly arranged at the upper ends of the rod bodies of the two threaded rods (703); clamping rings (705) are fixedly arranged in the middle of the upper ends of the two separation discs (704), synchronous belts (706) are arranged between the two clamping rings (705), and one of the two threaded rods (703) is connected to the output end of the motor (702).
  2. 2. The cleaning device for semiconductor production and processing of claim 1, wherein the filtering mechanism (3) comprises a filtering pipeline (301) and a connecting ring (302), and a particle filter screen (303), a metal filter screen (304) and a grease filter screen (305) are respectively and transversely fixedly arranged on the bottom side of the connecting ring (302).
  3. 3. The cleaning device for semiconductor manufacturing and processing according to claim 2, wherein the particle filter screen (303), the metal filter screen (304) and the grease filter screen (305) are slightly shorter than the filter pipeline (301) in front-back length, one end of the filter pipeline (301) is connected to the drainage pipeline (2), and the other end is connected to the post-filter storage tank (4).
  4. 4. The cleaning device for semiconductor manufacturing process according to claim 1, wherein the cleaning mechanism (1) comprises a cleaning frame (101), and a drain port (102) is formed in a lower portion of one side of the cleaning frame (101).
  5. 5. The cleaning device for semiconductor manufacturing process according to claim 4, wherein the inclined plate (103) is fixedly arranged on the inner bottom surface of the cleaning frame (101), and the inclined plate (103) extends from the side far from the water outlet (102) from high to low to near the water outlet (102).
  6. 6. A cleaning apparatus for semiconductor manufacturing process according to claim 1, wherein the drain pipe (2) is inclined from one end connected to the cleaning mechanism (1) to one side of the post-filtration storage tank (4) and connected to the filtering mechanism (3).
  7. 7. The cleaning device for semiconductor production and processing according to claim 1, wherein a transmission water pipe (6) is fixedly arranged between the cleaning mechanism (1) and the rear side of the filtered storage box (4), and a transparent plate (5) is fixedly arranged on one side of the filtered storage box (4) away from the cleaning mechanism (1).

Description

Cleaning device for semiconductor production and processing Technical Field The utility model relates to the technical field of semiconductor processing and cleaning, in particular to a cleaning device for semiconductor production and processing. Background The semiconductor is a material with conductivity between the conductor and the insulator at normal temperature, the resistivity of the semiconductor is extremely sensitive to external conditions such as temperature, illumination, doping and the like, the semiconductor technology is a basic stone of the information society, and the development of the semiconductor drives the spanning from consumer electronics to quantum computing, so the semiconductor has an irreplaceable effect in the fields such as electronics, communication, energy sources, medical treatment and the like; In the existing semiconductor processing cleaning, a semiconductor is directly placed into a cleaning solution through a clamping mechanism and the surface of the semiconductor is cleaned through ultrasonic waves, but the tension and the wetting degree between the semiconductor and the cleaning solution are difficult to accurately adjust in the mode, and therefore the effect of cleaning the semiconductor is low. Disclosure of utility model The utility model aims to solve the problems and provide a cleaning device for semiconductor production and processing, which is convenient for the clamping mechanism to achieve height adjustment in the cleaning mechanism after clamping and fixing semiconductors by the adjusting mechanism, so that different semiconductors can adapt to surface tension of different surface depths to achieve proper wettability of semiconductor materials, and the cleaning effect is improved. The utility model realizes the above purpose through the following technical scheme: The cleaning device for the semiconductor production and processing comprises a cleaning mechanism, wherein a drainage pipeline is fixedly arranged on one side of the cleaning mechanism downwards, a filtering mechanism is fixedly arranged on one side of the drainage pipeline, a post-filtering storage box is fixedly arranged on one side of the filtering mechanism, an adjusting mechanism is fixedly arranged on one side of the cleaning mechanism, and a clamping mechanism is arranged between the inner sides of the adjusting mechanism; the clamping mechanism comprises a plurality of sections of lifting rods, connecting rods are fixedly arranged between every two sections of lifting rods, C-shaped screws are fixedly arranged on one sides of the sections of lifting rods, and a plurality of C-shaped screw rod bodies are sleeved with thread oval sleeves. Further, the adjusting mechanism comprises two supporting and conveying plates, one of the two supporting and conveying plates penetrates through the cleaning mechanism and extends to the outer side, the other supporting and conveying plate is fixedly arranged on one side of the inner wall of the cleaning mechanism, and the two supporting and conveying plates are flush in height. Further, two the support transmission board top side is all rotated and is provided with the threaded rod, one of them support transmission board top side is fixed to be provided with the motor, two the threaded rod shaft upper end is all fixed to be provided with the separation dish. Further, clamping rings are fixedly arranged in the middle of the upper ends of the separation discs, synchronous belts are arranged between the clamping rings, and one of the threaded rods is connected to the output end of the motor. Further, the filtering mechanism comprises a filtering pipeline and a connecting ring, and a particle filter screen, a metal filter screen and a grease filter screen are transversely and fixedly arranged on the bottom side of the connecting ring respectively. Further, the length is slightly less than the filter pipeline around granule filter screen, metalwork filter screen and the grease filter screen, filter pipeline one end is connected to drainage pipeline, and the other end is connected to the storage tank after straining. Further, the cleaning mechanism comprises a cleaning frame, and a water outlet is formed in one side of the cleaning frame in a penetrating manner. Further, the inner bottom surface of the cleaning frame is fixedly provided with a sloping plate, and the sloping plate extends from high to low to close to the water outlet from one side far away from the water outlet. Further, the drainage pipe is inclined from one end connected to the cleaning mechanism to one side of the post-filtration storage tank and connected to the filtering mechanism. Further, a transmission water pipe is fixedly arranged between the cleaning mechanism and the rear side of the filtered storage box, and a transparent plate is fixedly arranged on one side, far away from the cleaning mechanism, of the filtered storage box. In summary, the semiconductor cleaning device has the ben