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CN-224227179-U - PVD equipment

CN224227179UCN 224227179 UCN224227179 UCN 224227179UCN-224227179-U

Abstract

The application discloses PVD equipment which comprises a PVD chamber, an ion gauge, a movable blocking mechanism, a cold pump and a control module, wherein the ion gauge is arranged on one side of the PVD chamber and connected to the side wall of the PVD chamber through a connecting pipeline and used for monitoring vacuum pressure in the PVD chamber in real time, the movable blocking mechanism is arranged on the connecting pipeline and used for opening or blocking the connecting pipeline through mechanical action, the cold pump is connected with the bottom of the PVD chamber through an air suction pipeline, a gate valve is arranged on the air suction pipeline and used for controlling the on-off of the cold pump and the PVD chamber, and the control module is connected with the movable blocking mechanism and the gate valve and used for synchronously controlling the opening and the closing of the movable blocking mechanism and the gate valve. The equipment can automatically turn off the connecting pipeline, block the air flow impact, automatically execute the protection process by the control module, avoid manual intervention and improve the protection reliability.

Inventors

  • LI FAN

Assignees

  • 广州增芯科技有限公司

Dates

Publication Date
20260512
Application Date
20250418

Claims (10)

  1. 1. A PVD apparatus, comprising: A PVD chamber; The ion gauge is arranged on one side of the PVD chamber, is connected to the side wall of the PVD chamber through a connecting pipeline and is used for monitoring the vacuum pressure in the PVD chamber in real time; the movable blocking mechanism is arranged on the connecting pipeline and used for opening or blocking the connecting pipeline through mechanical action; the cold pump is connected with the bottom of the PVD chamber through an air extraction pipeline, and a gate valve is arranged on the air extraction pipeline to control the on-off of the cold pump and the PVD chamber; And the control module is connected with the movable blocking mechanism and the gate valve and used for synchronously controlling the opening and closing of the movable blocking mechanism and the gate valve.
  2. 2. The PVD apparatus of claim 1 wherein the movable blocking mechanism is a pneumatic valve having a spool movement direction parallel to the axis of the connecting line.
  3. 3. The PVD apparatus of claim 2 wherein the control module comprises a pneumatic control module and a controller, one end of the pneumatic control module is connected to the pneumatic valve and the drive end of the gate valve respectively through rigid tubing, and the other end of the pneumatic control module is connected to the controller.
  4. 4. The PVD equipment of claim 3, wherein the gas circuit control module comprises a solenoid valve and a three-way valve, the driving ends of the pneumatic valve and the gate valve are respectively connected to two branch ports of the three-way valve through the rigid pipeline, the main port of the three-way valve is connected with the output end of the solenoid valve, the input end of the solenoid valve is connected with a compressed dry air source, and the control end of the solenoid valve is connected with the controller, wherein the compressed dry air is distributed by the solenoid valve and the three-way valve to drive the pneumatic valve and the gate valve.
  5. 5. The PVD apparatus of claim 1, further comprising a sensor disposed within the PVD chamber at a location corresponding to at least one of the moveable blocking mechanism and the gate valve, the sensor for monitoring gas flow velocity or pressure in real time.
  6. 6. The PVD apparatus of claim 5, wherein the sensor is a differential pressure sensor electrically connected to the control module and configured with a detection threshold of 10 3 Pa for monitoring pressure differences inside and outside the PVD chamber.
  7. 7. The PVD apparatus of claim 1, further comprising an alarm device electrically connected to the control module for generating an alarm prompt.
  8. 8. The PVD apparatus of claim 1, wherein the PVD chamber is a magnetron sputtering chamber comprising a magnet on top of the magnetron sputtering chamber and a target below the magnet, the magnet for generating a closed magnetic field.
  9. 9. The PVD apparatus of claim 1, wherein a bottom of the PVD chamber is provided with a pedestal for carrying a wafer and an electrostatic chuck for holding the wafer by electrostatic attraction.
  10. 10. The PVD apparatus of claim 1 wherein the PVD chamber is provided with a power supply for applying a voltage to energize the plasma.

Description

PVD equipment Technical Field The application relates to the technical field, in particular to PVD equipment. Background With the continuous development of semiconductor, flat panel display, optical element and precision mechanical parts manufacturing process, physical Vapor Deposition (PVD) technology is used as a key thin film preparation method, and is modified and functional on the surface of materials. In various vacuum chambers of PVD equipment, the ion gauge is used as a core component for monitoring the vacuum degree in the chamber, the stability of the working state of the ion gauge is directly related to the running reliability of the equipment and the quality control of a deposited film, and the normal running of the ion gauge directly influences the stability and the deposition quality of a PVD process, so that the ion gauge is a key monitoring link in the running process of the PVD equipment. In the current industrial production, the ion gauge can accurately monitor the vacuum pressure in the PVD chamber and transmit data to the control system in real time when the PVD equipment is in a normal running state. However, when equipment is periodically maintained or experiences sudden failures resulting in abnormal downtime, the large pressure differential between the interior of the PVD chamber (high vacuum) and the exterior of the PVD chamber (normal atmospheric pressure) can cause atmospheric air flow to flush into the PVD chamber at high speeds, which can cause severe impact to the delicate electrode structures, hot cathode wires, etc. sensitive elements inside the ion gauge, resulting in impaired or even complete failure of the ion gauge function. Therefore, a solution to the problems in the related art is required. Disclosure of utility model The present application is directed to a PVD apparatus to solve the problems of the related art. In order to solve the problems, the embodiment of the application provides PVD equipment which comprises a PVD chamber, an ion gauge, a movable blocking mechanism, a cold pump and a control module, wherein the ion gauge is arranged on one side of the PVD chamber and connected to the side wall of the PVD chamber through a connecting pipeline and used for monitoring vacuum pressure in the PVD chamber in real time, the movable blocking mechanism is arranged on the connecting pipeline and used for opening or blocking the connecting pipeline through mechanical action, the cold pump is connected with the bottom of the PVD chamber through an air exhaust pipeline, a door valve is arranged on the air exhaust pipeline and used for controlling the on-off of the cold pump and the PVD chamber, and the control module is connected with the movable blocking mechanism and the door valve and used for synchronously controlling the opening and closing of the movable blocking mechanism and the door valve. In some possible embodiments, the movable blocking mechanism is a pneumatic valve, and a valve core movement direction of the pneumatic valve is parallel to an axis of the connecting pipeline. In some possible embodiments, the control module comprises a gas circuit control module and a controller, one end of the gas circuit control module is connected to the driving ends of the pneumatic valve and the gate valve respectively through a rigid pipeline, and the other end of the gas circuit control module is connected with the controller. In some possible embodiments, the air path control module comprises an electromagnetic valve and a three-way valve, wherein the driving ends of the pneumatic valve and the gate valve are respectively connected to two branch ports of the three-way valve through the rigid pipeline, the main port of the three-way valve is connected with the output end of the electromagnetic valve, the input end of the electromagnetic valve is connected with a compressed dry air source, and the control end of the electromagnetic valve is connected with the controller, wherein the compressed dry air is distributed through the electromagnetic valve and the three-way valve to drive the pneumatic valve and the gate valve. In some possible embodiments, the PVD apparatus further comprises a sensor disposed within the PVD chamber at a location corresponding to at least one of the moveable blocking mechanism and the gate valve, the sensor for monitoring the gas flow rate or pressure in real time. In some possible embodiments, the sensor is a differential pressure sensor, the differential pressure sensor is electrically connected with the control module, and the differential pressure sensor is configured with a detection threshold of 10 3 pa for monitoring the pressure difference inside and outside the PVD chamber. In some possible embodiments, the PVD apparatus further comprises an alarm device electrically connected to the control module for generating an alarm prompt. In some possible embodiments, the PVD chamber is a magnetron sputtering chamber comprising a magnet on top of