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CN-224227180-U - Vacuum partition door device of bipolar splayed magnetron sputtering machine

CN224227180UCN 224227180 UCN224227180 UCN 224227180UCN-224227180-U

Abstract

The utility model provides a vacuum partition door device of a bipolar splayed magnetron sputtering machine, which is characterized in that a plurality of vacuum partition door modules are obliquely arranged in a first main cavity module and a second main cavity module at intervals, one end of each vacuum partition door module is connected with a frame structure of the main cavity module, the other end of each vacuum partition door module is connected with the input end of a processing cavity module, the vacuum partition door modules are obliquely distributed at an angle of 30-45 degrees, so that the occupation of horizontal space is reduced, the stress direction of a sealing flashboard is matched with the gravity direction through an oblique angle, the load of a driving mechanism is reduced, the service life is prolonged, the vacuum partition door modules adopt the design of oblique driving and sealing rings, the efficient isolation of the vacuum environment among the cavities is realized, the cross contamination of process gas is avoided, and the uniformity of a film coating is improved.

Inventors

  • Request for anonymity

Assignees

  • 苏州佑伦真空设备科技有限公司

Dates

Publication Date
20260512
Application Date
20250430

Claims (8)

  1. 1. The utility model provides a vacuum partition door device of bipolar eight characters magnetron sputtering board, includes first main cavity module (2) and second main cavity module (3), its characterized in that: a transfer buffer cavity module (4) in a central area is formed between the first main cavity module (2) and the second main cavity module (3), and a plurality of processing cavity modules (5) are radially distributed on the periphery of the transfer buffer cavity module; A plurality of vacuum partition door modules (8) are obliquely arranged in the first main cavity module (2) and the second main cavity module (3) at intervals, one end of each vacuum partition door module (8) is connected with a frame structure (7) of the main cavity module, and the other end of each vacuum partition door module is connected with the input end of the processing cavity module (5); The vacuum partition door module (8) comprises a driving mechanism (82), a sealing flashboard (83) and a sealing assembly, wherein the sealing flashboard (83) is abutted with a sealing block in a channel between the first main cavity module (2) and the second main cavity module (3), the driving mechanism (82) drives the sealing flashboard (83) to move along the inclined direction so as to open and close the channel between the processing cavity module (5) and the corresponding first main cavity module (2) and second main cavity module (3), and the sealing assembly is arranged on a contact surface of the sealing flashboard (83) and used for isolating the environment between the cavities during closing.
  2. 2. The vacuum isolation door device of the bipolar splayed magnetron sputtering machine table according to claim 1, wherein a sealing block is arranged in a channel between the processing chamber module (5) and the corresponding first main chamber module (2) and second main chamber module (3), the contact surface of the sealing block is an inclined surface matched with the inclination angle of the vacuum isolation door module (8), and the roughness Ra of the inclined surface is less than or equal to 0.8 mu m.
  3. 3. The vacuum isolation door device of the bipolar splayed magnetron sputtering machine table according to claim 1, wherein the inclination angle of the vacuum isolation door module (8) is 30-45 degrees, and the vacuum isolation door device has the functions of reducing occupied area and uniformly stressed.
  4. 4. The vacuum isolation door device of the bipolar splayed magnetron sputtering machine table according to claim 1, wherein each vacuum isolation door module (8) is fixed below the main cavity module through a mounting seat (81), and the driving mechanism (82) is an air cylinder or a hydraulic cylinder, and a driving shaft of the driving mechanism is rigidly connected with the sealing flashboard (83).
  5. 5. The vacuum isolation door device of the bipolar splayed magnetron sputtering machine station of claim 1, wherein a double-layer sealing ring (84) is arranged on the contact surface of the sealing flashboard (83).
  6. 6. The vacuum partition door device of the bipolar splayed magnetron sputtering machine table according to claim 5, wherein the outer layer of the double-layer sealing ring (84) is made of high-temperature resistant fluororubber, the inner layer of the double-layer sealing ring is made of metal elastic sheets, and the double-layer sealing ring (84) is embedded at the edge of the sealing flashboard (83) through a clamping groove.
  7. 7. The vacuum partition door device of the bipolar splayed magnetron sputtering machine table according to claim 1, wherein the processing chamber module (5) comprises a processing chamber body (51) and a movable conveying rack (52), the processing chamber body (51) is fixedly arranged above the movable conveying rack (52), the processing chamber body (51) is detachably connected with the first main chamber module (2) and the second main chamber module (3) through fixing pieces, and after the fixing pieces are loosened, the movable conveying rack (52) is moved to drive the processing chamber body (51) to move, and the processing chamber module (5) is replaced according to processing requirements.
  8. 8. The vacuum isolation door device of the bipolar splayed magnetron sputtering machine table according to claim 1, wherein the processing chamber module (5) comprises at least one of a magnetron sputtering chamber, a plasma cleaning chamber and an ion plating chamber, and each chamber realizes process sequence arrangement through a programmable logic controller.

Description

Vacuum partition door device of bipolar splayed magnetron sputtering machine Technical Field The utility model relates to the technical field of vacuum equipment, in particular to a vacuum partition door device of a bipolar splayed magnetron sputtering machine. Background With the development of scientific technology, the vacuum coating technology has been rapidly developed. The film technology can change the surface property of the workpiece, improve the wear resistance, oxidation resistance, corrosion resistance and other properties of the workpiece, thereby prolonging the service life of the workpiece. The thin film technology can also realize the preparation of optical, electrical and semiconductor thin film devices, and has high economic value. The magnetron sputtering technology can be used for preparing various superhard films, corrosion-resistant friction films, superconducting films, magnetic films, optical films and films with special functions, and has very wide application in the field of industrial film preparation. The patent closest to the prior art, application publication number CN118374778A, a sputter coating system, discloses a sputter coating system, which comprises a vacuum transfer cavity, at least one sputter coating device, a sample transfer arm mechanism and a vacuum driving mechanism. The sputtering coating device comprises a vacuum coating cavity, a substrate bearing mechanism and a cathode target. The vacuum coating cavity is communicated with the vacuum transfer cavity. The substrate bearing mechanism is positioned at the top of the vacuum coating cavity and is used for bearing the substrate. The cathode target is connected with the vacuum coating cavity in a vacuum sealing way and is arranged opposite to the substrate bearing mechanism. The sample transfer arm mechanism is at least partially disposed within the vacuum transfer chamber. The vacuum driving mechanism is connected with the sample transferring arm mechanism and is used for driving the sample transferring arm mechanism to transfer the substrate between at least one sputtering coating device. The existing sputtering coating technology adopts a sample transferring arm mechanism to transfer substrates, the vacuum requirements among all the chambers are different, the vacuum between the chambers can still be influenced only by adopting valves among all the chambers, and a long time is required for pumping the required vacuum again. In view of the above, the utility model provides a vacuum partition door device for a bipolar splayed magnetron sputtering machine, which effectively partitions and occupies a small area. Disclosure of utility model In view of the above, the utility model provides a vacuum partition door device for a bipolar splayed magnetron sputtering machine, which effectively partitions and occupies a small area. The utility model provides a vacuum partition door device of bipolar eight characters magnetron sputtering board, includes first main cavity module 2 and second main cavity module 3, its characterized in that: a transit buffer cavity module 4 in a central area is formed between the first main cavity module 2 and the second main cavity module 3, and a plurality of processing cavity modules 5 are radially distributed on the periphery of the transit buffer cavity module; A plurality of vacuum partition door modules 8 are obliquely arranged in the first main cavity module 2 and the second main cavity module 3 at intervals, one end of each vacuum partition door module 8 is connected with a frame structure 7 of the main cavity module, and the other end is connected with the input end of the processing cavity module 5; The vacuum partition door module 8 comprises a driving mechanism 82, a sealing flashboard 83 and a sealing assembly, the sealing flashboard 83 is abutted with sealing blocks in channels between the first main cavity module 2 and the second main cavity module 3, the driving mechanism 82 drives the sealing flashboard 83 to move along an inclined direction so as to open and close the channels between the processing cavity module 5 and the corresponding first main cavity module 2 and second main cavity module 3, and the sealing assembly is arranged on a contact surface of the sealing flashboard 83 and used for isolating the environment between the cavities when being closed. In some embodiments, a sealing block is arranged in a channel between the processing chamber module 5 and the corresponding first main chamber module 2 and the second main chamber module 3, the contact surface of the sealing block is an inclined surface matched with the inclination angle of the vacuum isolation door module 8, and the inclined surface roughness Ra is less than or equal to 0.8 mu m. In some embodiments, the inclination angle of the vacuum isolation door module 8 is 30 ° -45 °, which plays a role in reducing occupation area and uniform stress. In some embodiments, each vacuum break door module 8 is fixed unde