CN-224227198-U - Chemical vapor deposition device capable of correcting position of carbon raw material in deposition chamber

CN224227198UCN 224227198 UCN224227198 UCN 224227198UCN-224227198-U

Abstract

The utility model discloses a chemical vapor deposition device capable of correcting the position of a carbon raw material in a deposition chamber, which belongs to the technical field of chemical vapor deposition and comprises a mass flowmeter, a control system, a mobile sample injector and a reaction crucible positioned in the deposition chamber, wherein the mobile sample injector is arranged on the outer wall of the deposition chamber, the action end of the mobile sample injector is connected with the reaction crucible, the reaction crucible is used for placing the carbon raw material, the mobile sample injector is connected with the control system, the control system is connected with the mass flowmeter, and the mass flowmeter is arranged at an air inlet outside the deposition chamber and is used for monitoring the speed of carrier gas and carbon source gas which are introduced into the deposition chamber. According to the utility model, the position of the carbon raw material in the deposition chamber, namely the positions of the carbon raw material and the heating area, can be changed by controlling the mobile sample injector, so that the diffusion time of the carbon source gas is matched with the time required by pyrolysis deposition, and high-efficiency deposition is realized.

Inventors

YANG QUANHONG
ZHANG YIBO
ZHANG JUN
WANG QI
TAO YING
LI JINGHONG
LIANG JIACHEN
CHU YUE

Assignees

玖贰伍碳源科技（天津）有限公司

Dates

Publication Date: 20260512
Application Date: 20250327

Claims (10)

1. The utility model provides a but chemical vapor deposition device of correction carbon raw materials in deposition chamber position, its characterized in that includes mass flowmeter, control system, removes the injector and is located the reaction crucible in the deposition chamber, remove the injector and install on the outer wall of deposition chamber, its action end connection reaction crucible, the reaction crucible is used for placing the carbon raw materials, remove the injector and connect control system, control system connects mass flowmeter, mass flowmeter installs in the outdoor air inlet department of deposition for the speed of the carrier gas and the carbon source gas of monitoring in the deposition chamber, according to the monitoring speed, control system control removes the injector action, removes the injector and drives the reaction crucible and remove, changes the position of reaction crucible and deposition chamber's air inlet.
2. The chemical vapor deposition apparatus according to claim 1, wherein a guide rail is provided in the deposition chamber, a slider is mounted on the reaction crucible, the slider is mounted in the guide rail, and the moving injector drives the reaction crucible to move along the guide rail.
3. The chemical vapor deposition apparatus according to claim 1, wherein the moving end of the moving injector is connected to the reaction crucible through an injection rod.
4. The chemical vapor deposition apparatus of claim 1, wherein the deposition chamber is a cylindrical chamber.
5. The chemical vapor deposition apparatus according to claim 3, wherein the sample introduction rod is made of a high temperature resistant material such as stainless steel, graphite or aluminum oxide.
6. The chemical vapor deposition apparatus according to claim 1, wherein the reaction crucible is made of a high temperature resistant material of stainless steel, graphite or alumina.
7. The chemical vapor deposition apparatus according to claim 1, wherein the deposition chamber is a deposition chamber of a fluidized bed, a tube furnace, a rotary kiln, a pusher kiln, a roller kiln, a conveyor kiln, an air cushion kiln, or a step furnace.
8. The chemical vapor deposition apparatus according to claim 1, wherein the distance l=v Total (S) × (3 to 10 min) of the gas inlet from the reaction crucible, V Total (S) is the sum of the velocity V Load carrier of the carrier gas and the velocity V Carbon (C) of the carbon source gas, and the unit is cm/min.
9. The chemical vapor deposition apparatus of claim 1, wherein the mobile injector is a ball screw.
10. The chemical vapor deposition apparatus of claim 1, wherein the mobile injector is a screw injector controller.

Description

Chemical vapor deposition device capable of correcting position of carbon raw material in deposition chamber Technical Field The utility model relates to the technical field of chemical vapor deposition, in particular to a chemical vapor deposition device capable of correcting the position of a carbon raw material in a deposition chamber. Background Renewable energy sources represented by wind energy and solar energy are rapidly developed in recent years, and the energy storage industry matched with the renewable energy sources has huge market demands. Among a plurality of alternative energy storage systems, the sodium ion battery is the electrochemical energy storage system with the most application prospect currently accepted by academia and industry due to higher energy conversion efficiency, abundant sodium ore resources and low manufacturing cost. The hard carbon material is a cathode material of sodium ion batteries which are commercialized at present and have the most development prospect in the future, and is different from a lithium ion battery system in which a charge-discharge curve is expressed as a slope behavior which is dominated by ion adsorption, the pore structure of the hard carbon provides conditions for reversible and stable clustering of sodium ions, so that the charge-discharge curve has a remarkable low potential platform, and a higher output voltage is provided as a cathode in a full battery system. The porous carbon with high specific surface area is used as a precursor, and the hard carbon prepared by the chemical vapor deposition method often has higher sodium storage capacity due to rich pore structures. However, the chemical vapor deposition method for producing the hard carbon cathode at present has the problem that the diffusion time of the carbon source gas is not matched with the time required by pyrolysis deposition, and the deposition efficiency is not high. Disclosure of utility model The utility model aims at overcoming the technical defects in the prior art and provides a chemical vapor deposition device capable of correcting the position of a carbon raw material in a deposition chamber. The technical scheme adopted for realizing the purpose of the utility model is as follows: the utility model provides a can correct chemical vapor deposition device of carbon raw materials in deposition chamber position, includes mass flowmeter, control system, removes the injector and is located the reaction crucible in the deposition chamber, remove the injector and install on the outer wall of deposition chamber, its action end connection reaction crucible, the reaction crucible is used for placing the carbon raw materials, remove the injector and connect control system, control system connects mass flowmeter, mass flowmeter installs in the outdoor air inlet department of deposition chamber for the rate of the carrier gas and the carbon source gas of monitoring letting in the deposition chamber, according to the monitoring rate, control system control removes the injector action, removes the injector and drives the reaction crucible and remove, changes the position of reaction crucible and deposition chamber's air inlet. In the technical scheme, a guide rail is arranged in the deposition chamber, a sliding block is arranged on the reaction crucible and is arranged in the guide rail, and the movable sample injector drives the reaction crucible to move along the guide rail. In the technical scheme, the action end of the movable sample injector is connected with the reaction crucible through the sample injection rod. In the above technical solution, the deposition chamber is a cylindrical chamber. In the technical scheme, the sample injection rod is made of high-temperature resistant materials such as stainless steel, graphite or aluminum oxide. In the technical scheme, the reaction crucible is made of high-temperature resistant materials such as stainless steel, graphite or aluminum oxide. In the technical scheme, the deposition chamber is a deposition chamber of a fluidized bed, a tube furnace, a rotary kiln, a pusher kiln, a roller kiln, a conveyor kiln, an air cushion kiln or a step heating furnace. In the above technical scheme, the distance l=v Total (S) × (3-10 min) between the gas inlet and the reaction crucible, where V Total (S) is the sum of the speed V Load carrier of the carrier gas and the speed V Carbon (C) of the carbon source gas, and the unit is cm/min. In the above technical scheme, the mobile sample injector is a ball screw. In the above technical scheme, the mobile sample injector is a spiral sample injection controller. Compared with the prior art, the utility model has the beneficial effects that: According to the chemical vapor deposition device, the position of the carbon raw material in the deposition chamber, namely the positions of the carbon raw material and the heating zone, can be changed by controlling the mobile sample injector, so that the diff