CN-224227212-U - Motion detection device and chemical vapor deposition equipment

Abstract

The utility model relates to the technical field of semiconductor manufacturing, and provides a motion detection device and chemical vapor deposition equipment, wherein the motion detection device comprises a rotation unit, a linear motion unit, a first detection unit and a second detection unit; the rotating unit is connected with the linear motion unit and used for converting the rotating motion of the rotating unit into the linear motion of the linear motion unit, the first detection unit is at least used for detecting the rotating angle of the rotating unit, and the second detection unit is used for detecting the linear motion distance of the linear motion unit. By improving the motion detection device, the detection accuracy of the motion distance of the process component is effectively monitored.

Inventors

• TANG LIHONG
• XU KAIYUAN

Assignees

• 芯联集成电路制造股份有限公司

Dates

Publication Date

20260512

Application Date

20250422

Claims (10)

1. 1. The motion detection device is characterized by comprising a rotation unit, a linear motion unit, a first detection unit and a second detection unit; the rotating unit is connected with the linear motion unit and is used for converting the rotating motion of the rotating unit into the linear motion of the linear motion unit; the first detection unit is at least used for detecting the rotation angle of the rotation unit; the second detection unit is used for detecting the linear motion distance of the linear motion unit.
2. 2. The motion detection apparatus according to claim 1, wherein the first detection unit is an encoder; the rotating unit comprises an active rotating piece, and the encoder is at least partially arranged on the active rotating piece and is used for detecting the rotating angle of the active rotating piece.
3. 3. The motion detection apparatus as recited in claim 2, wherein the rotation unit further comprises an stationary member, the active rotation member being rotatably disposed on the stationary member.
4. 4. The motion detection apparatus as recited in claim 2, wherein the rotary unit further includes a driven rotary member in driving engagement with the driving rotary member, the driven rotary member having a driving thread, the linear motion unit being in driving engagement with the driven rotary member via the driving thread.
5. 5. The motion detection apparatus as claimed in claim 4, wherein the linear motion unit includes a first linear motion member and a second linear motion member, the first linear motion member is in driving connection with the driven rotation member through the driving screw, and the second linear motion member is fixedly connected with the first linear motion member.
6. 6. The motion detection apparatus as claimed in any one of claims 1 to 5, wherein the second detection unit includes a magnetic scale provided to the linear motion unit and a magnetic grating readhead for sensing a change in a magnetic field of the magnetic scale as the linear motion unit moves.
7. 7. The motion detection apparatus as recited in claim 6, wherein when the rotating unit includes an stationary member, the magnetic-grating reading head is disposed on the stationary member.
8. 8. The motion detection apparatus according to claim 1, further comprising a control unit connected to the first detection unit and the second detection unit.
9. 9. The motion detection apparatus of claim 8, further comprising an alarm unit coupled to the control unit.
10. 10. A chemical vapor deposition apparatus, characterized in that it comprises the motion detection device according to any one of claims 1 to 9.

Description

Motion detection device and chemical vapor deposition equipment Technical Field The present utility model relates to the field of semiconductor manufacturing technology, and in particular, to a motion detection device and a chemical vapor deposition apparatus. Background The driving device is widely used in semiconductor devices, such as etching, deposition, and photolithography, and is not separated from the driving device. Taking a vapor phase chemical deposition apparatus as an example, a Chemical Vapor Deposition (CVD) apparatus is an apparatus for generating a thin film on a substrate surface by chemical reaction. CVD techniques produce solid films and deposit on a substrate by introducing gaseous reactants comprising elements that form the film into a reaction chamber, where the reactants react chemically at elevated temperatures and under certain pressure. During the deposition process, it is often necessary for the drive means to drive the process components in motion, for example in a linear motion. During the deposition process, the position of process components in its process chamber directly affects the process quality. For example, the change of the position of the process component can cause the change of the position of the substrate carried by the process component, and further cause the change of the ambient temperature of the substrate, thereby affecting the process reaction. Or when there is a deviation in the position of the process components, it may cause interference with other components. In the vapor phase chemical deposition equipment, the movement distance of the process component is usually measured through a grating ruler, when the grating ruler generates measurement errors, a machine can not effectively acquire measurement errors, deviation of the movement position of the process component is easily caused, and at the moment, the process reaction is influenced. To avoid this, it is often necessary to provide manual inspection to check the running condition of the rail and whether the drive is abnormal. Therefore, the utility model provides a motion detection device and chemical vapor deposition equipment, and the motion detection device is improved to realize effective monitoring of the detection accuracy of the motion distance of the process component. Disclosure of utility model The utility model aims to provide a motion detection device and chemical vapor deposition equipment, which can effectively monitor the detection accuracy of the motion distance of a process component by improving the motion detection device. The utility model provides a motion detection device, which comprises a rotation unit, a linear motion unit, a first detection unit and a second detection unit; the rotating unit is connected with the linear motion unit and is used for converting the rotating motion of the rotating unit into the linear motion of the linear motion unit; the first detection unit is at least used for detecting the rotation angle of the rotation unit; the second detection unit is used for detecting the linear motion distance of the linear motion unit. Optionally, the first detection unit is an encoder; the rotating unit comprises an active rotating piece, and the encoder is at least partially arranged on the active rotating piece and is used for detecting the rotating angle of the active rotating piece. Optionally, the rotating unit further includes an immovable member, and the driving rotating member is rotatably disposed on the immovable member. Optionally, the rotation unit further comprises a driven rotation piece, the driven rotation piece is in transmission fit with the driving rotation piece, the driven rotation piece is provided with transmission threads, and the linear motion unit is in transmission connection with the driven rotation piece through the transmission threads. Optionally, the linear motion unit includes first linear motion spare and second linear motion spare, first linear motion spare with driven rotating member passes through transmission screw thread transmission is connected, second linear motion spare with first linear motion spare fixed connection. Optionally, the second detection unit includes a magnetic scale and a magnetic grating reading head, the magnetic scale is disposed on the linear motion unit, and the magnetic grating reading head is used for sensing a magnetic field change when the magnetic scale moves along with the linear motion unit. Optionally, when the rotating unit includes an immobile part, the magnetic grating reading head is disposed on the immobile part. Optionally, the motion detection device further comprises a control unit, and the control unit is connected with the first detection unit and the second detection unit. Optionally, the motion detection device further comprises an alarm unit, and the alarm unit is connected with the control unit. The utility model also provides chemical vapor deposition equipment which comprises the m