CN-224230713-U - Supporting device for sintering thick film heater substrate

Abstract

The utility model discloses a supporting device for sintering a thick film heater substrate, which belongs to the technical field of thick film heaters and comprises a supporting base, wherein a left limit stud is arranged on the left side of the upper surface of the supporting base, a right limit stud is arranged on the right side of the upper surface of the supporting base, a left connecting rod is sleeved on the left limit stud and can move up and down along the height direction of the left limit stud, a right connecting rod is sleeved on the right limit stud and can move up and down along the height direction of the right limit stud, a limit fixing plate is connected between the left connecting rod and the right connecting rod, a left fixing nut is connected onto the left limit stud above the left connecting rod in a threaded manner, a right fixing nut is connected onto the right limit stud above the right connecting rod in a threaded manner, and a plurality of ceramic plates are uniformly distributed on the upper surface of the supporting base below the limit fixing plate in an array manner.

Inventors

• LIU HAO
• CHEN TIANTIAN
• YU YANG
• HUANG MAOQIN

Assignees

• 浙江机电职业技术大学

Dates

Publication Date

20260512

Application Date

20250428

Claims (6)

1. 1. The utility model provides a thick film heater base plate strutting arrangement for sintering, its characterized in that, including supporting base (1), support base (1) upper surface left side is provided with left limit stud (2), support base (1) upper surface right side is provided with right limit stud (3), the cover is equipped with left connecting rod (4) and left connecting rod (4) can follow left limit stud (2) direction of height and reciprocate, the cover is equipped with right connecting rod (5) and right connecting rod (5) can follow right limit stud (3) direction of height and reciprocate, be connected with spacing fixed plate (6) between left connecting rod (4) and right connecting rod (5), it has left fixation nut (7) still to be located left connecting rod (4) top threaded connection on left limit stud (2), it has right fixation nut (8) still to be located right connecting rod (5) top on right limit stud (3), support base (1) upper surface is located spacing fixed plate (6) below department evenly distributed has a plurality of ceramic array (9).
2. 2. A support device for sintering thick film heater substrates according to claim 1, characterized in that a buffer spacer is further provided between the ceramic plate (9) and the support base (1).
3. 3. A thick film heater substrate sintering support according to claim 2 wherein the material of the buffer spacer is a polycrystalline alumina fibre mat.
4. 4. A supporting device for sintering a thick film heater substrate according to claim 1, wherein the supporting base (1) comprises a rectangular bottom plate (101) and supporting blocks (102) provided at four corners of the lower surface of the bottom plate (101).
5. 5. A thick film heater substrate sintering support according to claim 1, characterized in that the material of the support base (1) is corundum ceramic or quartz glass.
6. 6. A thick film heater substrate sintering support according to claim 1, wherein the ceramic sheet (9) is of Al 2 O 3 .

Description

Supporting device for sintering thick film heater substrate Technical Field The utility model belongs to the technical field of thick film heaters, and particularly relates to a supporting device for sintering a thick film heater substrate. Background The thick film heater is a heating element which is formed by printing conductive, resistive, insulating and other functional slurries on a metal or ceramic substrate by using a thick film process and forming a circuit structure by high-temperature sintering. The technology is widely applied to the fields of household appliances, medical treatment, industrial heating and the like. In the production process of thick film heaters, a substrate (typically stainless steel or ceramic) is easily warped due to gravity or uneven thermal expansion at high temperature sintering (typically 800-900 ℃), and is upwardly arched to be thermally deformed, resulting in a decrease in flatness. Such warpage can affect the accuracy of subsequent circuit printing, heating uniformity, and quality of the final product. Therefore, how to improve the flatness of a substrate after high temperature processing is one of the key problems facing the industry. Currently, flatness is generally improved by optimizing substrate materials, adjusting sintering process, adding mechanical correction steps and the like in the industry, but the following disadvantages exist in the methods: The material optimization is limited in that although the thermal expansion coefficients of different stainless steel or ceramic materials are different, the material selection is often limited by factors such as cost, process suitability and the like, and the problem cannot be thoroughly solved. The sintering process has great adjustment difficulty, the adjustment of sintering temperature and time can influence the performance of the thick film circuit, and the suitability of the thick film circuit for different substrate materials is different, so that a general solution is difficult to form. The mechanical correction step is complicated, and the subsequent mechanical correction (such as pressure correction) requires additional equipment and processing steps, increases the production cost, and may cause the microstructure of the substrate to change, affecting the service life. Disclosure of utility model The utility model aims to provide a supporting device for sintering a thick film heater substrate, which solves the problems of poor flatness and poor product quality caused by poor flatness due to thermal deformation of the conventional thick film heater substrate during sintering. The technical scheme adopted by the utility model is as follows: The utility model provides a thick film heater base plate strutting arrangement for sintering, includes the support base, support base upper surface left side is provided with left spacing double-screw bolt, support base upper surface right side is provided with right spacing double-screw bolt, the cover is equipped with left connecting rod and left connecting rod on the left spacing double-screw bolt and can follow left spacing double-screw bolt direction of height and reciprocate, the cover is equipped with right connecting rod and right connecting rod on the right spacing double-screw bolt and can follow right spacing double-screw bolt direction of height and reciprocate, be connected with spacing fixed plate between left connecting rod and the right connecting rod, it has left fixation nut still to be located left connecting rod top on the left spacing double-screw bolt, it has right fixation nut still to be located right connecting rod top on the right spacing double-screw bolt, support base upper surface is located spacing fixed plate below department even array and distributes and has a plurality of ceramic pieces. Further, a buffer gasket is further arranged between the ceramic plate and the supporting base. Further, the material of the buffer pad is polycrystalline alumina fiber felt. Further, the support base comprises a rectangular bottom plate and support blocks arranged at four corners of the lower surface of the bottom plate. Further, the supporting base is made of corundum ceramic or quartz glass. Further, the ceramic plate is made of Al 2O3. In summary, due to the adoption of the technical scheme, the beneficial effects of the utility model are as follows: 1. The utility model comprises a support base, a left limit stud is arranged on the left side of the upper surface of the support base, a right limit stud is arranged on the right side of the upper surface of the support base, a left connecting rod is sleeved on the left limit stud and can move up and down along the height direction of the left limit stud, a right connecting rod is sleeved on the right limit stud and can move up and down along the height direction of the right limit stud, the ceramic plate is characterized in that a limiting fixing plate is connected between the left connecting rod and t