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CN-224230745-U - Furnace tube equipment

CN224230745UCN 224230745 UCN224230745 UCN 224230745UCN-224230745-U

Abstract

The embodiment of the utility model provides furnace tube equipment, which comprises a furnace tube body, wherein the furnace tube body comprises a quartz process tube, a rotatable heater is positioned at the periphery of the quartz process tube, and the rotatable heater rotates around the periphery of the quartz process tube when the furnace tube equipment works so as to uniformly heat wafers carried by the wafer carrying structure. The technical scheme provided by the embodiment of the utility model can reduce the breaking risk of the wafer on the basis of uniformly heating the wafer.

Inventors

  • ZHANG CHUNYU

Assignees

  • 浙江创芯集成电路有限公司

Dates

Publication Date
20260512
Application Date
20250425

Claims (10)

  1. 1. The furnace tube equipment is characterized by comprising a furnace tube body, wherein the furnace tube body comprises: The quartz process tube comprises a wafer bearing structure in the quartz process tube; a rotatable heater located at the outer periphery of the quartz process tube; when the furnace tube equipment works, the wafer bearing structure is kept in a static state, and the rotatable heater rotates around the periphery of the quartz process tube so as to uniformly heat the wafer borne by the wafer bearing structure.
  2. 2. The furnace apparatus of claim 1, wherein the furnace body further comprises: The susceptor comprises a first area and a second area, wherein the first area is used for fixing the wafer bearing structure, and the second area is used for movably connecting the rotatable heater.
  3. 3. The furnace apparatus of claim 2, wherein the second zone is provided with a rotational track, the rotatable heater being located within the rotational track, the furnace apparatus further comprising: a drive module connected to the rotatable heater for powering the rotatable heater to rotate the rotatable heater along the rotation track; And the control module is used for controlling the driving module to control the rotatable heater to rotate according to a preset mode.
  4. 4. The furnace apparatus of claim 1, wherein the rotatable heater is provided with a rotation sensor for detecting a rotation angle and a position, the furnace apparatus further comprising: And the actuating mechanism is used for receiving a control instruction to drive the rotatable heater to rotate, and the control instruction is generated based on the signal of the rotation sensor.
  5. 5. The furnace apparatus of any one of claims 1-4, wherein the furnace body further comprises: And the silicon carbide lining pipe is positioned inside the quartz process pipe and is used for protecting the wafer borne by the wafer bearing structure.
  6. 6. The furnace apparatus of claim 5, wherein the furnace body further comprises: the gas transmission channel is used for transmitting gas flow to the inside of the quartz process tube; and the exhaust channel is communicated with the quartz process tube and is used for exhausting the waste gas in the quartz process tube to the outside of the furnace tube body.
  7. 7. The furnace apparatus of claim 6, further comprising: And the mass flow controller is communicated with one end port of the gas transmission channel and is used for controlling the gas flow transmitted to the inside of the quartz process tube.
  8. 8. The furnace apparatus of claim 7, further comprising: The transmission coil is positioned below the mass flow controller, connected with the gas supply line and used for controlling the flow direction of the gas flow; And the nitrogen bubble generator is positioned below the transmission coil, connected with a gas supply line and used for generating nitrogen bubbles.
  9. 9. The furnace apparatus of claim 8, further comprising: And the lifting module is positioned below the wafer bearing structure, and the wafer bearing structure is arranged on the base through the lifting module.
  10. 10. The furnace apparatus of claim 9, wherein the furnace apparatus is a vertical furnace apparatus and the wafer support structure is a wafer boat.

Description

Furnace tube equipment Technical Field The embodiment of the application relates to the technical field of semiconductor manufacturing, in particular to furnace tube equipment. Background Furnace tube apparatus is an important component of industrial heating equipment (e.g., various industrial furnaces, boilers, etc.) for transporting and heating fluid media. It is generally composed of a series of furnace body, pipe fittings (such as elbow, tee joint, etc.), supporting structure, etc. The furnace body is a core component and is a key structure for heating wafers. However, wafer fragments are easily caused in the process of heating the wafer by the furnace tube body. Therefore, in this context, how to provide a technical solution to reduce the breaking risk of the wafer on the basis of uniformly heating the wafer becomes a technical problem to be solved by those skilled in the art. Disclosure of utility model Therefore, the embodiment of the utility model provides furnace tube equipment so as to reduce the breaking risk of the wafer on the basis of uniformly heating the wafer. In order to achieve the above purpose, the embodiment of the present utility model provides the following technical solutions. In a first aspect, an embodiment of the present utility model provides a furnace apparatus, including a furnace body, the furnace body including: The quartz process tube comprises a wafer bearing structure in the quartz process tube; a rotatable heater located at the outer periphery of the quartz process tube; when the furnace tube equipment works, the wafer bearing structure is kept in a static state, and the rotatable heater rotates around the periphery of the quartz process tube so as to uniformly heat the wafer borne by the wafer bearing structure. The furnace tube equipment provided by the embodiment of the utility model comprises a furnace tube body, wherein the furnace tube body comprises a quartz process tube, a rotatable heater is arranged at the periphery of the quartz process tube, and the rotatable heater rotates around the periphery of the quartz process tube when the furnace tube equipment works so as to uniformly heat wafers carried by the wafer carrying structure. It can be seen that, according to the technical scheme provided by the embodiment of the utility model, since the rotatable heater is located at the periphery of the quartz process tube and can rotate around the quartz process tube, when the furnace tube device works, the wafer carried by the wafer carrying structure which is in a static state in the quartz process tube can be uniformly heated by the rotatable heater in the process of heating the wafer by the furnace tube body, so that the wafer is driven to rotate to uniformly heat in a manner of avoiding adopting the rotating wafer carrying structure. Because the wafer bearing structure rotates to drive the wafer to be heated, the risk of wafer breakage due to uneven stress can occur, the technical scheme provided by the embodiment of the utility model can effectively avoid the occurrence probability of wafer breakage risk, and can reduce the wafer breakage risk on the basis of uniformly heating the wafer. Drawings In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only embodiments of the present utility model, and that other drawings can be obtained according to the provided drawings without inventive effort for a person skilled in the art. FIG. 1 is a schematic diagram of a furnace apparatus according to an embodiment of the present utility model. Detailed Description The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model. As mentioned in the background, furnace tube apparatus is an important component of industrial heating equipment (e.g., various industrial furnaces, boilers, etc.) for transporting and heating fluid media. It is generally composed of a series of furnace bodies, pipe fittings (such as elbows, tees, etc.), supporting structures, and associated valves, meters, etc. The furnace body of the furnace tube is a core component, and is generally made of high-temperature-resistant and corrosion-resistant alloy steel tubes, and the furnace body of the furnace tube can be installed in a specific arrangement mode according to different process requirements and structures