CN-224231640-U - Jig for detecting mask substrate

CN224231640UCN 224231640 UCN224231640 UCN 224231640UCN-224231640-U

Abstract

The utility model relates to a jig for inspecting a photomask substrate, which relates to the technical field of semiconductors and comprises a rack, a frame and four rotating mechanisms, wherein two ends of the frame are respectively and rotatably connected to the rack, the frame is provided with a cavity for accommodating the photomask substrate, the cavity penetrates through the front end and the rear end of the frame, the four rotating mechanisms are respectively arranged on the frame and are arranged in a pairwise mode, the four rotating mechanisms are respectively and uniformly distributed along the circumferential direction of the frame, the rotating mechanisms comprise rotating heads which are rotatably arranged on the frame, the rotating heads can move relative to the frame and are used for extending into or withdrawing from the cavity, one end of each rotating head, facing the cavity, is provided with a clamping groove for adapting to the photomask substrate, and the clamping groove is used for restraining the photomask substrate.

Inventors

LV WENFEI
PAN XINGYOU
LI JIAZHEN

Assignees

绍兴芯链半导体科技有限公司

Dates

Publication Date: 20260512
Application Date: 20250528

Claims (10)

1. The jig for inspecting the mask substrate is characterized by comprising a frame, a frame and four rotating mechanisms, wherein two ends of the frame are respectively and rotatably connected to the frame, the frame is used for supporting the frame, and the frame can rotate relative to the frame; The frame is provided with a cavity for accommodating the photomask substrate, and the cavity penetrates through the front end and the rear end of the frame; the four rotating mechanisms are respectively arranged on the frame and are distributed in pairs, the four rotating mechanisms are uniformly distributed along the circumferential direction of the frame, each rotating mechanism comprises a rotating head, the rotating heads are rotatably arranged on the frame and can move relative to the frame and are used for extending into or exiting from the cavity, one end of each rotating head, which faces the cavity, is provided with a clamping groove for adapting to the photomask substrate, and the clamping groove is used for restraining one corner of the photomask substrate.
2. The jig for inspecting a reticle substrate according to claim 1, wherein two rotating mechanisms are respectively provided at an upper end and a lower end of the frame, and the other two rotating mechanisms are respectively provided at a left end and a right end of the frame.
3. The jig for inspecting a reticle substrate according to claim 1, wherein the clamping groove is configured as a V-groove, and an included angle between both side surfaces of the V-groove is configured to be 90-120 degrees; and/or the frame adopts a circular ring structure.
4. A jig for inspecting a photomask substrate according to any one of claims 1 to 3, wherein the rotating mechanism further comprises an adjusting member, a guide hole formed in the frame, and a screw hole, one end of the guide hole is communicated with the cavity, the other end is communicated with the screw hole, and the screw hole penetrates the outside of the frame; The rotating head further comprises a sliding block matched with the threaded hole and a constraint rod connected with the sliding block, the clamping groove is formed at the end part of the constraint rod, the sliding block and the threaded hole form a moving pair and/or the constraint rod and the guide hole form a moving pair, and at least the constraint rod can rotate relative to the guide hole; The restraining rod sleeve is provided with a return spring, one end of the return spring is propped against the frame, and the other end of the return spring is propped against the sliding block; The adjusting piece is in threaded connection with the threaded hole and abuts against the sliding block.
5. The jig for inspecting a reticle substrate according to claim 4, wherein the rotating mechanism further comprises a reset hole formed in the frame, both ends of the reset hole are respectively communicated with the guide hole and the threaded hole, an inner diameter of the reset hole is larger than an inner diameter of the guide hole, a first step is formed between the guide hole and the reset hole, an inner diameter of the threaded hole is larger than an inner diameter of the reset hole, a second step is formed between the threaded hole and the reset hole, one end of the reset spring abuts against the first step, and an outer diameter of the slider is larger than an inner diameter of the reset hole.
6. The jig for inspecting a reticle substrate according to claim 5, wherein the guide hole, the reset hole and the screw hole are all circular holes, the outer diameter of the slider is smaller than the inner diameter of the screw hole, and the outer diameter of the constraint rod is smaller than the inner diameter of the guide hole; Alternatively, the restraining bar may be rotatably coupled to the slider.
7. The jig for inspecting a reticle substrate according to claim 6, wherein the slider is configured with a mounting groove, the upper end of the restraining bar is sleeved with a rubber ring adapted to the mounting groove and used for increasing friction, the upper end of the restraining bar is inserted into the mounting groove, and the rubber ring is pressed between the restraining bar and the side wall of the mounting groove.
8. The jig for inspecting a mask blank according to claim 4, wherein the frame is provided with hinge shafts at both left and right ends thereof, the frame is constructed with hinge holes adapted to the hinge shafts, the frame is rotatably connected to the frame by the cooperation of the hinge shafts and the hinge holes, screw holes in rotation mechanisms at left and right ends of the frame correspond to the hinge shafts, respectively, and penetrate through the hinge shafts, respectively; And/or, the regulating part comprises a knob, a connecting shaft connected with the knob and a screw rod connected with the connecting shaft, the outer diameter of the connecting shaft is smaller than that of the screw rod, the screw rod is provided with external threads matched with the threaded holes, and the regulating part is connected with the threaded holes of the frame through the screw rod threads.
9. The jig for inspecting a reticle substrate according to claim 1, wherein the frame comprises a bracket, a supporting member and a base, which are adapted to the frame, the upper end of the supporting member is connected to the bracket, and the lower end of the supporting member is connected to the base; the bracket adopts a U-shaped structure or an arc-shaped structure; The left end and the right end of the frame are respectively provided with a hinge shaft, the two ends of the bracket are respectively provided with a hinge hole for adapting to the hinge shafts, and the frame is rotatably connected to the bracket through the matching of the hinge shafts and the hinge holes.
10. The jig for inspecting a reticle substrate according to claim 9, wherein a pre-tightening layer for increasing friction is further provided between the hinge shaft and the hinge hole, the pre-tightening layer has elasticity, and the pre-tightening layer is in a state of being elastically compressed; And/or the support can be lifted.

Description

Jig for detecting mask substrate Technical Field The utility model relates to the technical field of semiconductors, in particular to a jig for detecting a photomask substrate. Background A photomask substrate (simply referred to as a substrate) is a key component of a photomask, and has a significant role in the field of semiconductor manufacturing and the like. It is usually made of quartz glass with high purity, low reflectivity and low thermal expansion coefficient to ensure stability and accuracy in photolithography. In the photolithography process, it is generally necessary to inspect the photomask substrate, on the one hand, to inspect whether the substrate itself has defects such as particles, pinholes, scratches and contamination, because the defects are likely to be transferred to the wafer during the photolithography process, thereby causing faults or functional anomalies in the semiconductor device, and on the other hand, to evaluate the accuracy and precision of the pattern for the photomask substrate with the circuit pattern, to confirm whether the etched or deposited pattern faithfully presents the expected circuit design, to inspect whether the pattern has abnormal conditions such as pattern deviation, feature missing, etc., which relate to the quality of the semiconductor manufacturing process, and to ensure that the photomask substrate meets the high-precision production standard by a comprehensive and strict inspection process, thereby laying a solid foundation for the subsequent photolithography process. The existing photomask substrate is generally square in structure, as shown in fig. 1, in the prior art, the photomask substrate is usually required to be placed in a clamp for transferring and checking, at present, an F-type, I-type or V-type clamp is usually adopted, but in the actual checking process, the photomask substrate is easy to fall off from the clamp to cause damage, and meanwhile, the existing clamp is inconvenient for adjusting the azimuth of the photomask substrate, so that the photomask substrate is inconvenient to comprehensively check, and the clamp is easy to generate shadows under a strong light, so that missed checking is caused, and the problem is to be solved. Disclosure of utility model The first aspect of the present utility model solves the above technical problems, and provides a jig which is more convenient to use, not only can restrain a photomask substrate more stably and prevent the photomask substrate from falling, but also can adjust the azimuth of the photomask substrate in an omnibearing manner, so that the photomask substrate can be inspected very conveniently and comprehensively, and the missed inspection caused by the shadow of the jig can be prevented effectively, and the main concept is as follows: The jig for inspecting the photomask substrate comprises a frame, a frame and four rotating mechanisms, wherein two ends of the frame are respectively and rotatably connected to the frame, the frame is used for supporting the frame, the frame can rotate relative to the frame, a cavity for accommodating the photomask substrate is formed in the frame, the cavity penetrates through the front end and the rear end of the frame, the four rotating mechanisms are respectively arranged on the frame and are arranged in a pair-by-pair mode, the four rotating mechanisms are respectively and uniformly distributed along the circumferential direction of the frame, the rotating mechanisms comprise rotating heads, the rotating heads are rotatably arranged on the frame and can move relative to the frame and are used for extending into or withdrawing from the cavity, and a clamping groove for adapting to the photomask substrate is formed in one end of the rotating heads, which faces the cavity, and is used for restraining one corner of the photomask substrate. In the scheme, the two ends of the frame are respectively and rotatably connected with the frame, so that the frame can rotate at will along the X direction relative to the frame, and the photomask substrate arranged on the frame can synchronously rotate along the X direction, so that the azimuth of the photomask substrate can be adjusted; the four rotating mechanisms are uniformly distributed along the circumferential direction of the frame, so that the four rotating mechanisms can be enclosed into a square so as to adapt to the photomask substrate with a square structure, so that each rotating mechanism corresponds to one corner of the photomask substrate respectively so as to constrain one corner of the photomask substrate respectively, the rotating mechanism is configured to comprise a rotatable rotating head, one end of the rotating head is configured to adapt to the photomask substrate and is used for constraining one corner of the photomask substrate, and the rotating head is movably arranged on the frame so that the rotating head can move relative to the frame so as to extend into or withdraw from the cavity,