CN-224231859-U - Silicon rod resistivity on-line measuring system
Abstract
The application relates to an online measuring system for resistivity of a silicon rod, which comprises an electromagnetic induction measuring unit, a processing unit and a positioning device, wherein the electromagnetic induction measuring unit comprises an excitation mechanism for applying an alternating magnetic field to the silicon rod and an induction mechanism for inducing a changing magnetic field of the silicon rod to form induction current, the processing unit is electrically connected with the electromagnetic induction measuring unit, the positioning device comprises a displacement mechanism which is connected with the electromagnetic induction measuring unit and used for adjusting the position of the electromagnetic induction measuring unit, and a distance measuring unit which is arranged on the displacement mechanism and used for measuring the distance between the electromagnetic induction measuring unit and a reference object in a single crystal furnace. According to the scheme, the online non-contact measurement of the resistivity in the silicon rod crystal pulling process can be realized, the purpose of monitoring the resistivity of the silicon rod in real time is achieved, and the contact damage risk of the silicon rod is avoided.
Inventors
- CAO SHAOWEN
- HUANG XUGUANG
- MA HAOTIAN
Assignees
- 晶澳太阳能有限公司
Dates
- Publication Date
- 20260512
- Application Date
- 20250423
Claims (10)
- 1. An on-line measurement system for resistivity of a silicon rod, comprising: An electromagnetic induction measurement unit (100) which is arranged in the single crystal furnace (400) and is positioned on the lifting path of the silicon rod, wherein the electromagnetic induction measurement unit (100) comprises an excitation mechanism for applying an alternating magnetic field to the silicon rod and an induction mechanism for inducing the changing magnetic field of the silicon rod and forming an induction current; A processing unit (200) electrically connected to the electromagnetic induction measurement unit (100); Positioning device (300), comprising: A displacement mechanism (310) connected to the electromagnetic induction measurement unit (100) for adjusting the position of the electromagnetic induction measurement unit (100); And the distance measuring unit (320) is arranged on the displacement mechanism (310) and is used for measuring the distance between the electromagnetic induction measuring unit (100) and a reference object in the single crystal furnace (400).
- 2. The silicon rod resistivity online measurement system of claim 1, wherein the excitation mechanism includes an excitation coil (110) and a high frequency signal generator (140) electrically connected to the excitation coil (110); The induction mechanism comprises an induction coil (120) arranged opposite to the exciting coil (110) and a magnetic field sensor (130) arranged on the induction coil (120).
- 3. The silicon rod resistivity online measurement system of claim 2, wherein the induction coil (120) and the excitation coil (110) are coaxially disposed in a single crystal furnace (400); and/or the induction coil (120) is located above the excitation coil (110).
- 4. The silicon rod resistivity online measurement system of claim 2, wherein the displacement mechanism (310) includes: A support (311) for mounting the electromagnetic induction measurement unit (100) and being horizontally opposed to the reference object; And the adjusting piece (312) is connected between the supporting piece (311) and the furnace wall of the single crystal furnace (400) and is used for adjusting the horizontal position of the supporting piece (311).
- 5. The silicon rod resistivity on-line measurement system of claim 4, wherein, The supporting piece (311) comprises two supporting plates which are oppositely arranged, and the adjusting piece (312) is arranged between each supporting plate and the furnace wall of the single crystal furnace (400); the exciting coil (110) and the induction coil (120) are wound on the two support plates.
- 6. The on-line measurement system of silicon rod resistivity according to claim 5, wherein, At least one positioning column (330) is arranged on the furnace wall of the single crystal furnace (400) in a protruding manner at the position corresponding to each supporting plate; the adjustment member (312) includes an adjustment screw threadedly coupled between the support plate and the positioning post (330).
- 7. The on-line measurement system of silicon rod resistivity according to claim 5, wherein, The reference object is horizontally opposite to the electromagnetic induction measuring unit (100) in the single crystal furnace (400); The distance measuring unit (320) comprises at least one optical distance measuring sensor, wherein the optical distance measuring sensor is arranged on the supporting plate and faces the reference object along the displacement direction of the supporting plate, and the displacement direction of the supporting plate is a direction horizontally approaching or far away from the reference object.
- 8. The silicon rod resistivity online measurement system of claim 1, wherein the processing unit (200) comprises: A signal processing module (210) in signal connection with the electromagnetic induction measuring unit (100); The data acquisition module (220) is in signal connection with the signal processing module (210); And the data processing module (230) is in signal connection with the data acquisition module (220).
- 9. The silicon rod resistivity online measurement system of claim 8, further comprising a temperature sensor (500) in signal connection with the processing unit (200), the temperature sensor (500) being disposed within the single crystal furnace (400) with a temperature measurement end directed toward the silicon rod.
- 10. The silicon rod resistivity online measurement system of claim 9, further comprising a control unit electrically connected to the electromagnetic induction measurement unit (100), the processing unit (200), and the temperature sensor (500).
Description
Silicon rod resistivity on-line measuring system Technical Field The application relates to the technical field of silicon rod testing, in particular to an online measuring system for resistivity of a silicon rod. Background In the production process of a single crystal silicon rod, the resistivity is a key parameter for measuring the quality of crystals. The prior art adopts a contact probe method, needs to be measured after a silicon rod is cooled, and has the following defects: 1. the cooling process is time-consuming, so that the production flow is interrupted, and the process parameters are difficult to adjust on line. 2. And the physical damage risk is that the contact of the probe can scratch the surface of the silicon rod, and the quality of a finished product is affected. 3. The environment adaptability is poor, and the high-temperature and high-vacuum single crystal furnace environment presents challenges for the stability of contact type equipment. Disclosure of utility model Based on the above, the utility model provides an online measuring system for the resistivity of a silicon rod, which aims to solve the problems that the traditional single crystal silicon rod resistivity measuring device cannot measure the resistivity of the silicon rod in real time, so that the measuring period is long, the online adjustment of the crystal pulling process parameters is difficult, and the like. The utility model provides an online measuring system for resistivity of a silicon rod, which comprises the following components: The electromagnetic induction measuring unit is arranged in the single crystal furnace and positioned on the lifting path of the silicon rod, and comprises an excitation mechanism for applying an alternating magnetic field to the silicon rod and an induction mechanism for inducing the changing magnetic field of the silicon rod to form induction current; the processing unit is electrically connected with the electromagnetic induction measuring unit; positioning device, comprising: The displacement mechanism is connected with the electromagnetic induction measuring unit and is used for adjusting the position of the electromagnetic induction measuring unit; And the distance measuring unit is arranged on the displacement mechanism and is used for measuring the distance between the electromagnetic induction measuring unit and a reference object in the single crystal furnace. In one embodiment, the excitation mechanism comprises an excitation coil and a high frequency signal generator electrically connected to the excitation coil; The induction mechanism comprises an induction coil and a magnetic field sensor, wherein the induction coil is arranged opposite to the excitation coil, and the magnetic field sensor is arranged on the induction coil. In one embodiment, the induction coil and the excitation coil are coaxially arranged in a single crystal furnace; And/or the induction coil is positioned above the excitation coil. In one embodiment, the displacement mechanism comprises: a support for mounting the electromagnetic induction measuring unit and horizontally opposing the reference object; and the adjusting piece is connected between the supporting piece and the furnace wall of the single crystal furnace and is used for adjusting the horizontal position of the supporting piece so as to adjust the horizontal distance between the electromagnetic induction measuring unit and the reference object. In one embodiment, the supporting piece comprises two supporting plates which are oppositely arranged, and the adjusting piece is arranged between each supporting plate and the furnace wall of the single crystal furnace; The exciting coil and the induction coil are wound on the two support plates. In one embodiment, at least one positioning column is arranged on the furnace wall of the single crystal furnace in a protruding manner at the position corresponding to each supporting plate; The adjusting piece comprises an adjusting screw which is connected between the supporting plate and the positioning column in a threaded mode. In one embodiment, the reference is horizontally opposite to the electromagnetic induction measuring unit in the single crystal furnace; the distance measuring unit comprises at least one optical distance measuring sensor, wherein the optical distance measuring sensor is arranged on the supporting plate and faces the reference object along the displacement direction of the supporting plate, and the displacement direction of the supporting plate is the direction horizontally approaching to or far from the reference object. In one embodiment, the processing unit includes: the signal processing module is in signal connection with the electromagnetic induction measuring unit; The data acquisition module is in signal connection with the signal processing module; and the data processing module is in signal connection with the data acquisition module. In one embodiment, the silicon rod re