Search

CN-224234107-U - ITO film with high water vapor barrier rate

CN224234107UCN 224234107 UCN224234107 UCN 224234107UCN-224234107-U

Abstract

The utility model provides an ITO film with high water vapor barrier rate, which belongs to the technical field of conductive films and comprises a glass fiber base layer, a base layer and an ITO layer, wherein the glass fiber base layer is a conductive film main body supporting layer, the base layer is positioned at the top of the glass fiber base layer and consists of one or more of silicon dioxide, silicon nitride and aluminum oxide, the ITO layer is positioned at the top of the base layer, and the conductive film has higher weather resistance, light transmittance and barrier rate through the glass fiber base layer and the base layer, so that the service life of a battery is indirectly prolonged.

Inventors

  • YANG ZHONGHUA
  • Nie Xinchuang

Assignees

  • 安阳嵩阳光电子材料有限公司

Dates

Publication Date
20260512
Application Date
20250506

Claims (8)

  1. 1. An ITO film with high water vapor barrier rate is characterized by comprising; A glass fiber base layer (1) which is a conductive film main body supporting layer; The priming layer (2) is positioned on the top of the glass fiber base layer (1) and consists of one or more of silicon dioxide, silicon nitride and aluminum oxide; an ITO layer (3) on top of the primer layer (2).
  2. 2. The ITO film with high water vapor barrier rate according to claim 1, wherein the glass fiber base layer (1) has a thickness of 40-100 μm.
  3. 3. A high water vapor barrier ITO film according to claim 2, wherein said glass fiber base layer (1) has a thickness of 80. Mu.m.
  4. 4. The ITO film with high water vapor barrier rate according to claim 1, wherein the thickness of the bottom layer (2) is 20-200 nm.
  5. 5. A high water vapor barrier ITO film according to claim 1, wherein the primer layer (2) comprises a silicon dioxide layer and a silicon nitride layer, and the silicon dioxide layer is connected with the glass fiber base layer (1).
  6. 6. A high water vapor barrier ITO film according to claim 1, wherein the primer layer (2) comprises a silicon dioxide layer and an aluminum oxide layer, and the silicon dioxide layer is connected with the glass fiber base layer (1).
  7. 7. A high water vapor barrier ITO film according to claim 1, wherein the primer layer (2) is composed of a silicon nitride layer and an aluminum oxide layer, and the silicon nitride layer is connected with the glass fiber base layer (1).
  8. 8. An ITO film with high water vapor barrier rate according to claim 1, characterized in that the primer layer (2) consists of a silicon dioxide layer and a silicon nitride layer and an aluminum oxide layer, the silicon dioxide layer being connected to the glass fiber base layer (1), the silicon nitride layer being located between the silicon dioxide layer and the aluminum oxide layer.

Description

ITO film with high water vapor barrier rate Technical Field The utility model relates to the technical field of conductive films, in particular to an ITO film with high water vapor barrier rate. Background In the technical field of flexible perovskite photovoltaic cells, the selection of the window electrode material plays a key role in the overall performance of the cell. Currently, a high-transmittance Indium Tin Oxide (ITO) film based on polyethylene terephthalate (PET) is mainly used as a window electrode in the industry. PET substrates are widely used in flexible electronic devices due to their good flexibility, transparency and low cost. However, with the continued advancement of flexible perovskite photovoltaic cell technology, the weatherability of the window electrode is increasingly demanding. The existing PET substrate ITO film has a remarkable defect that the water vapor transmittance of the PET substrate is high, and the water vapor transmittance is usually more than 10 g/(m2.24h). The high water vapor permeability causes that the water vapor easily permeates into the battery in the long-term use process of the photovoltaic battery, and causes irreversible damage to perovskite materials, so that the conversion efficiency and the service life of the battery are obviously reduced. To ameliorate this problem, it is often desirable to add additional barrier materials, such as organic-inorganic composite films or metal oxide layers, to the battery package to improve the weatherability of the assembly. However, this not only increases the production cost, but also tends to reduce the light transmittance of the window layer due to the introduction of additional materials, thereby affecting the overall performance of the photovoltaic cell. Disclosure of utility model In view of the above, the utility model provides an ITO film with high water vapor barrier rate, which can realize that the conductive film has higher weather resistance, light transmittance and barrier rate through the glass fiber base layer and the priming layer, thereby indirectly prolonging the service life of the battery. In order to solve the technical problems, the utility model provides an ITO film with high water vapor barrier rate, which comprises a glass fiber base layer which is a main conductive film supporting layer, namely the glass fiber base layer is a flexible base layer and has higher light transmittance and water vapor barrier rate. The bottom layer is positioned on the top of the glass fiber base layer and is composed of one or more of silicon dioxide, silicon nitride and aluminum oxide, namely, the interface reflection can be reduced through the bottom layer, and the light transmittance of the conductive film is improved. An ITO layer on top of the underlayer. The thickness of the glass fiber base layer is 40-100 μm, and preferably, the thickness of the glass fiber base layer is 80 μm. The thickness of the base layer is 20-200 nm, and the thickness of the base layer is 70nm. The priming layer is composed of a silicon dioxide layer and a silicon nitride layer, and the silicon dioxide layer is connected with the glass fiber base layer. The priming layer is composed of a silicon dioxide layer and an aluminum oxide layer, and the silicon dioxide layer is connected with the glass fiber base layer. The priming layer is composed of a silicon nitride layer and an aluminum oxide layer, and the silicon nitride layer is connected with the glass fiber base layer. The priming layer is composed of a silicon dioxide layer, a silicon nitride layer and an aluminum oxide layer, wherein the silicon dioxide layer is connected with the glass fiber base layer, and the silicon nitride layer is arranged between the silicon dioxide layer and the aluminum oxide layer. In summary, compared with the prior art, the application has at least one of the following beneficial technical effects: 1. Remarkably improves the water vapor barrier performance: The high-compactness glass fiber base layer (the thickness is optimized to 40-100 mu m, preferably 80 mu m) is used as the supporting layer, and the intrinsic water vapor transmittance is lower than that of the traditional PET base material by 1-2 orders of magnitude. The silicon dioxide/silicon nitride/aluminum oxide composite base layer (with the thickness of 20-200 nm, preferably 70 nm) is combined to form a 'stepped' diffusion barrier mechanism, so that a water vapor molecular permeation path is effectively blocked. 2. Light transmittance maximization: The average light transmittance of the glass fiber base layer in the visible light wave band (400-700 mu m) is more than 92%, and the interface reflectivity is reduced and the comprehensive light transmittance is improved by designing the graded refractive index of the base layer (such as a SiO 2/Si3N4/Al2O3 multilayer structure). 3. The process and cost advantages: The integrated preparation comprises the steps of synchronously depositing a glass fi