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CN-224234138-U - Wafer cleaning device

CN224234138UCN 224234138 UCN224234138 UCN 224234138UCN-224234138-U

Abstract

The utility model relates to a cleaning device, which belongs to the technical field of wafer production, and particularly relates to a wafer cleaning device, comprising a flushing frame, wherein the inner wall of the flushing frame is connected with a moving block in a sliding manner, the bottom of the moving block is fixedly connected with a flushing plate, the cleaning device further comprises a placing table, the placing table is arranged below the flushing plate, the placing table is provided with a placing frame, the placing frame comprises a plurality of clamping plates which are connected with one another, a rotating wheel is rotationally connected with the clamping plates, an auxiliary plate is fixedly connected with the inner wall of the flushing frame, the inner wall of the auxiliary plate is rotationally connected with an auxiliary cleaning roller, one side of the auxiliary plate is fixedly connected with an auxiliary motor, the output end of the auxiliary motor is coaxially fixed with the auxiliary cleaning roller, and a fixing piece is arranged in the placing frame and is partially attached to the placing frame.

Inventors

  • Shen Luman
  • Jia Xinzhong
  • LIU TIANSHENG

Assignees

  • 山西华耀亿嘉集成电路有限公司

Dates

Publication Date
20260512
Application Date
20250604

Claims (6)

  1. 1. The wafer cleaning device comprises a flushing frame (1) and is characterized in that the inner wall of the flushing frame (1) is connected with a moving block (2) in a sliding manner, the bottom of the moving block (2) is fixedly connected with a flushing plate (3), and the wafer cleaning device further comprises; The device comprises a placing table (4), wherein the placing table (4) is positioned below a flushing plate (3), a placing frame (5) is arranged on the placing table (4), the placing frame (5) comprises a plurality of clamping plates (501) which are connected with each other, and a rotating wheel (502) is rotationally connected with the clamping plates (501); The auxiliary plate (6), the auxiliary plate (6) is fixedly connected to the inner wall of the washing frame (1), the inner wall of the auxiliary plate (6) is rotatably connected with an auxiliary washing roller (7), one side of the auxiliary plate (6) is fixedly connected with an auxiliary motor (8), and the output end of the auxiliary motor (8) is coaxially fixed with the auxiliary washing roller (7); The fixing piece (9), the fixing piece (9) is located in the placing table (4), and part of the fixing piece (9) is attached to the placing frame (5).
  2. 2. The wafer cleaning device according to claim 1, wherein a plurality of atomizing nozzles (10) are arranged on the lower surface of the flushing plate (3), the inner cavity of the flushing plate (3) is hollow and is communicated with the atomizing nozzles (10), and the flushing plate (3) is connected with external equipment through a pipeline.
  3. 3. The wafer cleaning device according to claim 1, wherein a movable screw (11) is rotatably connected to the inner wall of the washing frame (1) on one side, a movable motor (12) is fixedly connected to one side of the washing frame (1) on the same side, the output end of the movable motor (12) is coaxially fixed to the movable screw (11), and the movable block (2) is in threaded connection with the movable screw (11).
  4. 4. The wafer cleaning device according to claim 1, wherein the inner wall of the flushing frame (1) at the other side is fixedly connected with a movable polish rod (13), and the movable block (2) is in sliding connection with the movable polish rod (13).
  5. 5. The wafer cleaning device according to claim 1, wherein the fixing member (9) comprises a stable bidirectional screw rod (901) rotatably connected with the inner wall of the placing table (4), a stable button (902) coaxially fixed with the stable bidirectional screw rod (901) is rotatably connected to one side of the placing table (4), and a stable polished rod (903) is fixedly connected with the inner wall of the placing table (4).
  6. 6. A wafer cleaning device according to claim 5, wherein the fixing member (9) further comprises two fixing plates (904) slidably connected to the inner wall of the placement table (4), the two fixing plates (904) are screwed with the fixing bidirectional screw (901), and the two fixing plates (904) are slidably connected with the fixing polish rod (903).

Description

Wafer cleaning device Technical Field The utility model relates to the technical field of wafer production, in particular to a wafer cleaning device. Background The wafer refers to a silicon wafer used for manufacturing a silicon semiconductor circuit, and a silicon wafer is formed by grinding, polishing and slicing a silicon crystal bar, so that the surface of the wafer is required to be cleaned in order to ensure the quality of the wafer. In the prior art, a wafer cleaning and fixing device disclosed in China patent publication No. CN112967996A comprises a bottom plate, a limiting mechanism and a fixing mechanism, wherein the bottom plate is provided with hollow columns at the left and right ends of the upper surface, rectangular openings are formed in the middle of the outer cambered surface of each hollow column, hollow blocks are arranged on the upper end faces of the hollow columns, rotating columns are connected to the opposite inner side faces of the two hollow blocks through bearings in a rotating mode, supporting plates are arranged at the opposite inner side ends of the two rotating columns, strip-shaped openings are formed in the middle of each supporting plate, the limiting mechanism is respectively arranged in the hollow columns, the upper ends of the limiting mechanism are respectively fixedly connected with the outer side ends of the rotating columns on the same side, the middle of the limiting mechanism is respectively and slidably connected with the rectangular openings on the same side, the fixing mechanism is respectively arranged on the front end faces of the supporting plates, the rear ends of the fixing mechanism are respectively and slidably connected with the strip-shaped openings on the same side, and the wafer cleaning and fixing device is suitable for clamping and fixing wafers with different diameters. However, the patent has the disadvantage that the wafer is clamped by the fixing device, and the fluidity of the cleaning solution on the wafer is insufficient when the cleaning solution is flushed, and meanwhile, the side edge of the wafer is difficult to clean effectively because the wafer is clamped, so that the wafer cleaning device is proposed to solve the problems. Disclosure of utility model In order to solve the above technical problems, the present utility model provides a wafer cleaning device for cleaning both sides and side edges of a wafer to achieve a better cleaning effect. The wafer cleaning device comprises a flushing frame, wherein the inner wall of the flushing frame is connected with a moving block in a sliding manner, the bottom of the moving block is fixedly connected with a flushing plate, and the wafer cleaning device further comprises; The placing table is positioned below the flushing plate, a placing frame is arranged on the placing table, the placing frame comprises a plurality of clamping plates which are connected with each other, and a rotating wheel is connected with the clamping plates in a rotating mode; The auxiliary plate is fixedly connected to the inner wall of the washing frame, the inner wall of the auxiliary plate is rotatably connected with an auxiliary washing roller, one side of the auxiliary plate is fixedly connected with an auxiliary motor, and the output end of the auxiliary motor is coaxially fixed with the auxiliary washing roller; The fixing piece is positioned in the placing table, and part of the fixing piece is attached to the placing frame. In some embodiments, the lower surface of the flushing plate is provided with a plurality of atomizing spray heads, the inner cavity of the flushing plate is hollow and communicated with the atomizing spray heads, and the flushing plate is connected with external equipment through a pipeline. In some embodiments, a movable screw is rotatably connected to the inner wall of the flushing frame on one side, a movable motor is fixedly connected to one side of the flushing frame on the same side, an output end of the movable motor is coaxially fixed to the movable screw, and the movable block is in threaded connection with the movable screw. In some embodiments, the inner wall of the flushing rack on the other side is fixedly connected with a movable polish rod, and the movable block is in sliding connection with the movable polish rod. In some embodiments, the fixing member includes a stable bidirectional screw rod rotatably connected to an inner wall of the placement table, a stable button coaxially fixed to the stable bidirectional screw rod is rotatably connected to one side of the placement table, and a stable polish rod is fixedly connected to the inner wall of the placement table. In some embodiments, the fixing member further includes two fixing plates slidably connected to an inner wall of the placement table, the two fixing plates are screwed to the fixing bidirectional screw rod, and the two fixing plates are slidably connected to the fixing polish rod. Compared with the prior art, the