EP-4632104-A3 - METHOD AND APPARATUS FOR PROCESSING SURFACE OF A SUBSTRATE
EP4632104A3EP 4632104 A3EP4632104 A3EP 4632104A3EP-4632104-A3
Abstract
The aspects of the disclosed embodiments relate to the processing of the surface of a substrate to grow a high-quality thin film layer with Atomic Layer Deposition (ALD), by first preparing the substrate surface and then creating an improved interface layer on the surface of the substrate prior the ALD growth. These processes are achieved within a single processing equipment.
Inventors
- ALONSO, VICENTE CALVO
- LÅNG, Jouko
Assignees
- Comptek Solutions OY
Dates
- Publication Date
- 20260513
- Application Date
- 20241231