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EP-4650872-A3 - AN EXPOSURE APPARATUS AND A METHOD OF PERFORMING A LITHOGRAPHIC EXPOSURE PROCESS

EP4650872A3EP 4650872 A3EP4650872 A3EP 4650872A3EP-4650872-A3

Abstract

An exposure apparatus configured to perform a lithographic exposure process, comprising an actuator, and a control unit configured to control the actuator, the control unit comprising a trained machine learning model. The control unit is configured to determine, within a predetermined amount of time, a control setting for controlling the actuator by: obtaining a desired correction of the lithographic exposure process; determining an initial control setting for the actuator based on the desired correction of the lithographic exposure process; and iteratively refining the initial control setting to approach the desired correction of the lithographic exposure process, thereby obtaining the control setting for the actuator. The control unit is configured to determine the initial control setting for the actuator by providing the desired correction of the lithographic exposure process as input to the trained machine learning model.

Inventors

  • VAN DEN BRINK, Arie
  • WERKMAN, ROY

Assignees

  • ASML Netherlands B.V.

Dates

Publication Date
20260513
Application Date
20250930