REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING THE SAME

Abstract

A reflective mask blank having auxiliary marks that can be formed with a simple structure and little risk of particle generation in a reference mark is provided. A reflective mask blank including at least a substrate, a multilayer reflective film provided on the substrate and reflecting exposure light, and an absorber film provided on the multilayer reflective film and absorbing the exposure light, in which the reflective mask blank further includes a reference mark formed on a surface on a same side as the multilayer reflective film of the reflective mask blank, the reference mark consists of a main mark serving as a reference position for a defect position, and an auxiliary mark group disposed around the main mark, the auxiliary mark group consists of a plurality of auxiliary marks formed at intervals from one another to extend in at least one direction starting from the main mark, and the plurality of auxiliary marks are all formed in a same shape and in a same orientation.

Inventors

TAKEDA, Atsuhiro
MUNEYASU, Riku

Assignees

Shin-Etsu Chemical Co., Ltd.

Dates

Publication Date: 20260506
Application Date: 20250930