SUBSTRATE PROCESSING APPARATUS, METHOD OF ADJUSTING ELECTROMAGNETIC WAVE SHIELD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND PROGRAM

Abstract

It is possible to prevent a leakage of an electromagnetic wave. There is provided a technique that includes: a vessel in which a substrate is processed; a plasma generator including: an electrode provided on an outer periphery of the vessel; a power supply line connected to the electrode; and a supplier configured to supply a high frequency power to the electrode via the power supply line; a shield provided on an outer periphery of the electrode and configured to shield an electromagnetic wave emitted from the electrode; an opening provided at the shield, wherein the power supply line is inserted through the opening; a plurality of shielding structures provided to overlap with one another around the opening and around locations of the supplier facing the opening; and a controller configured to be capable of controlling the plasma generator to move relative to the shield.

Inventors

SAKURAI, TASUKU
UEDA, TSUYOSHI
MUROBAYASHI, MASAKI

Assignees

Kokusai Electric Corp.

Dates

Publication Date: 20260506
Application Date: 20250925