EP-4735664-A1 - HIGH PURITY MOLYBDENUM-CONTAINING PRECURSORS AND RELATED SYSTEMS AND METHODS

Abstract

High purity molybdenum-containing precursors and related systems and methods are provided. A precursor delivery system comprises a vaporizer vessel that is configured to contain a vaporizable precursor that, when vaporized, produces a precursor vapor. The precursor delivery system comprises at least one protective surface treatment. The at least one protective surface treatment covers a sufficient amount of at least one gasexposed surface of the precursor delivery system to reduce an amount of at least one contaminant in the precursor vapor as compared to a precursor vapor produced by a precursor delivery system without the at least one protective surface treatment.

Inventors

• REYNOLDS, III, Joseph E.
• WATSON, MICHAEL
• HENDRIX, BRYAN C.
• MOGHADDAM, Sara
• DION, Devon N.
• GARRETT, BENJAMIN R.
• WALDFRIED, CARLO
• WARKE, VIRENDRA

Assignees

• Entegris, Inc.

Dates

Publication Date

20260506

Application Date

20240626

Claims (20)

1. 1 . A precursor delivery system comprising: a vaporizer vessel configured to contain a vaporizable precursor that, when vaporized, produces a precursor vapor; and at least one protective surface treatment; wherein the at least one protective surface treatment covers a sufficient amount of at least one gas-exposed surface of the precursor delivery system to reduce an amount of at least one contaminant in the precursor vapor as compared to a precursor vapor produced by a precursor delivery system without the at least one protective surface treatment.
2. 2. The precursor delivery system of claim 1 , wherein the vaporizable precursor comprises a molybdenum-containing source reagent.
3. 3. The precursor delivery system of claim 1 , wherein the precursor vapor comprises M0O2CI2 vapor.
4. 4. The precursor delivery system of claim 1 , wherein the precursor vapor comprises M0CI5 vapor.
5. 5. The precursor delivery system of claim 1 , wherein the precursor vapor comprises less than 10 ppm of at least one contaminant after 180 days exposure at a temperature of at least 140 °C.
6. 6. The precursor delivery system of claim 1 , wherein the at least one protective surface treatment covers all gas-exposed surfaces of the precursor delivery system.
7. 7. The precursor delivery system of claim 1 , wherein the at least one protective surface treatment covers all gas-exposed surfaces of the vaporizer vessel.
8. 8. The precursor delivery system of claim 1 , further comprising: a gas supply line fluidly coupling the vaporizer vessel to a semiconductor processing tool, wherein at least a portion of at least one gas-exposed surface of the gas supply line is covered by the at least one protective surface treatment.
9. 9. The precursor delivery system of claim 8, wherein the at least one protective surface treatment covers all gas-exposed surfaces of the gas supply line.
10. 10. The precursor delivery system of claim 8, further comprising: at least one filter located in the gas supply line, wherein at least a portion of at least one gas-exposed surface of the at least one filter is covered by the at least one protective surface treatment.
11. 1 1. The precursor delivery system of claim 10, wherein the at least one protective surface treatment covers all gas-exposed surfaces of the at least one filter.
12. 12. The precursor delivery system of claim 8, further comprising: a valve assembly fluidly coupling the vaporizer vessel and the gas supply line, wherein at least a portion of at least one gas-exposed surface of the valve assembly is covered by the at least one protective surface treatment.
13. 13. The precursor delivery system of claim 12, wherein the at least one protective surface treatment covers all gas-exposed surfaces of the valve assembly.
14. 14. The precursor delivery system of claim 1 , wherein the at least one protective surface treatment comprises at least one of a coating, a surface modified region, or any combination thereof.
15. 15. The precursor delivery system of claim 1 , wherein the at least one protective surface treatment further covers at least one non-gas-exposed surface of the precursor delivery system.
16. 16. A method comprising: obtaining a precursor delivery system, the precursor delivery system comprising: a vaporizer vessel containing a vaporizable precursor; and at least one protective surface treatment covering at least a portion of at least one gas-exposed surface of the vaporizer vessel; vaporizing at least a portion of the vaporizable precursor to produce a precursor vapor; and flowing the precursor vapor from the vaporizer vessel to a semiconductor processing tool, wherein the at least one protective surface treatment covers a sufficient amount of the at least one gas-exposed surface of the precursor delivery system to reduce an amount of at least one contaminant in the precursor vapor as compared to a precursor vapor produced by a precursor delivery system without the at least one protective surface treatment.
17. 17. The method of claim 16, wherein the precursor vapor comprises a M0O2CI2 vapor.
18. 18. The method of claim 16, wherein the precursor vapor comprises a M0CI5 vapor.
19. 19. The method of claim 16, wherein the precursor vapor comprises less than 10 ppm of at least one of an iron contaminant, a nickel contaminant, or any combination thereof.
20. 20. The method of claim 16, wherein the vaporizable precursor is vaporized at a temperature of 145 °C or greater.

Description

HIGH PURITY MOLYBDENUM-CONTAINING PRECURSORS AND RELATED SYSTEMS AND METHODS FIELD [001] The present disclosure relates to molybdenum-containing precursors with high purity, as well as systems and methods relating thereto. CROSS-REFERENCE TO RELATED APPLICATIONS [002] This application claims the benefit under 35 USC 1 19 of U.S. Provisional Patent Application No. 63/523,612, filed Jun. 27, 2023, the disclosure of which is hereby incorporated herein by reference in its entirety. BACKGROUND [003] The presence of contaminants in precursor vapors is undesirable in precursor delivery applications, such as, applications relating to semiconductor fabrication and manufacturing. Reducing the presence of contaminants in the precursor vapors remains an ongoing challenge. SUMMARY [004] Some embodiments relate to a precursor delivery system. In some embodiments, the precursor delivery system comprises a vaporizer vessel. In some embodiments, the vaporizer vessel is configured to contain a vaporizable precursor that, when vaporized, produces a precursor vapor. In some embodiments, the precursor delivery system comprises at least one protective surface treatment. In some embodiments, the at least one protective surface treatment covers a sufficient amount of at least one gas-exposed surface of the precursor delivery system to reduce an amount of at least one contaminant in the precursor vapor as compared to a precursor vapor produced by a precursor delivery system without the at least one protective surface treatment. [005] Some embodiments relate to a method of precursor delivery. In some embodiments, the method of delivering the precursor vapor comprises obtaining a precursor delivery system. In some embodiments, the precursor delivery system comprises a vaporizer vessel containing a vaporizable precursor. In some embodiments, the vaporizer vessel comprises at least one protective surface treatment covering at least a portion of at least one gas-exposed surface of the vaporizer vessel. In some embodiments, the method of delivering the precursor vapor comprises vaporizing at least a portion of the vaporizable precursor to produce a precursor vapor. In some embodiments, the method of delivering the precursor vapor comprises flowing the precursor vapor from the vaporizer vessel to a semiconductor processing tool. In some embodiments, the at least one protective surface treatment covers a sufficient amount of the at least one gas- exposed surface of the precursor delivery system to reduce an amount of at least one contaminant in the precursor vapor as compared to a precursor vapor produced by a precursor delivery system without the at least one protective surface treatment. DRAWINGS [006] Some embodiments of the disclosure are herein described, by way of example only, with reference to the accompanying drawings. With specific reference now to the drawings in detail, it is stressed that the embodiments shown are by way of example and for purposes of illustrative discussion of embodiments of the disclosure. In this regard, the description taken with the drawings makes apparent to those skilled in the art how embodiments of the disclosure may be practiced. [007] FIG. 1 is a schematic diagram of a precursor delivery systems, according to some embodiments. [008] FIG. 2 is a cross-sectional view of a vaporizer vessel, according to some embodiments. [009] FIG. 3 is a schematic diagram of a flowchart of a method of precursor delivery, according to some embodiments. [0010] FIG. 4 is a graphical view illustrating iron contamination levels in molybdenum- containing precursors in coated versus uncoated systems, according to some embodiments. DETAILED DESCRIPTION [0011] Among those benefits and improvements that have been disclosed, other objects and advantages of this disclosure will become apparent from the following description taken in conjunction with the accompanying figures. Detailed embodiments of the present disclosure are disclosed herein; however, it is to be understood that the disclosed embodiments are merely illustrative of the disclosure that may be embodied in various forms. In addition, each of the examples given regarding the various embodiments of the disclosure which are intended to be illustrative, and not restrictive. [0012] Any prior patents and publications referenced herein are incorporated by reference in their entireties. [0013] Throughout the specification and claims, the following terms take the meanings explicitly associated herein, unless the context clearly dictates otherwise. The phrases "in one embodiment," “in an embodiment,” and "in some embodiments" as used herein do not necessarily refer to the same embodiment(s), though it may. Furthermore, the phrases "in another embodiment" and "in some other embodiments" as used herein do not necessarily refer to a different embodiment, although it may. All embodiments of the disclosure are intended to be combinable without departing from the scope or spirit