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EP-4741748-A1 - FURNACE TUBE AND USING METHOD THEREOF

EP4741748A1EP 4741748 A1EP4741748 A1EP 4741748A1EP-4741748-A1

Abstract

A furnace tube and a using method of the same are provided. The furnace tube comprises a chamber for processing a wafer; a normal-pressure gas intake device and a low-pressure gas intake device configured to supply gas to the chamber, wherein each of the normal-pressure gas intake device and the low-pressure gas intake device is independently connected to the chamber; a normal-pressure control device and a low-pressure control device configured to control an air pressure in the chamber, wherein each of the normal-pressure control device and the low-pressure control device is configured to independently control the air pressure in the chamber; and a normal-pressure gas injection pipe located inside the chamber and connected to the normal-pressure gas intake device, and a low-pressure gas injection pipe located inside the chamber and connected to the low-pressure gas intake device. The present disclosure achieves compatibility of normal-pressure and low-pressure process treatment through one furnace tube.

Inventors

  • WANG, Huaiqing
  • WU, Tianli

Assignees

  • SwaySure Technology Co., Ltd.

Dates

Publication Date
20260513
Application Date
20250909

Claims (12)

  1. A furnace tube, comprising: a chamber (110) for processing a wafer; a normal-pressure gas intake device (120) and a low-pressure gas intake device (130) configured to supply gas to the chamber (110), wherein each of the normal-pressure gas intake device (120) and the low-pressure gas intake device (130) is independently connected to the chamber (110); an normal-pressure control device (170) and a low-pressure control device (180) configured to control an air pressure inside the chamber (110), wherein each of the normal-pressure control device (170) and the low-pressure control device (180) is configured to independently control the air pressure in the chamber (110); a normal-pressure gas injection pipe (140) located inside the chamber (110) and connected to the normal-pressure gas intake device (120), and a low-pressure gas injection pipe (150) located inside the chamber (110) and connected to the low-pressure gas intake device (130).
  2. The furnace tube of claim 1, wherein the chamber (110) comprises a gas inlet end and a gas outlet end; wherein the normal-pressure gas intake device (120) is connected to the normal-pressure gas injection pipe (140) via the gas inlet end, and the low-pressure gas intake device (130) is connected to the low-pressure gas injection pipe (150) via the gas inlet end; wherein the normal-pressure control device (170) and the low-pressure control device (180) are connected to the gas outlet end, respectively.
  3. The furnace tube of claim 2, wherein the low-pressure control device (180) comprises: a first main exhaust pipe (1801) , a first branch exhaust pipe (1802) , a second branch exhaust pipe (1804) and a second main exhaust pipe (1806) for providing gas channels, wherein a gas inlet end of the first main exhaust pipe (1801) is connected to the gas outlet end, gas inlet ends of the first branch exhaust pipe (1802) and the second branch exhaust pipe (1804) are respectively connected to an exhaust end of the first main exhaust pipe (1801) , and exhaust ends of the first branch exhaust pipe (1802) and the second branch exhaust pipe (1804) are respectively connected to a gas inlet end of the second main exhaust pipe (1806); a main valve (1803) for controlling the air pressure inside the chamber (110) when the chamber (110) is in a process state, wherein the main valve (1803) is provided on the first branch exhaust pipe (1802) ; a bypass pneumatic valve (1805) for controlling the air pressure inside the chamber (110) when the chamber (110) is in a non-process state, wherein the bypass pneumatic valve (1805) is provided on the second branch exhaust pipe (1804) ; a vacuum pump (1807) for pumping gas inside the chamber (110) , wherein an end of the vacuum pump (1807) is connected to the exhaust end of the second main exhaust pipe (1806) and another end of the vacuum pump (1807) is connected to an exhaust gas treatment device (190) .
  4. The furnace tube of claim 2, wherein the normal-pressure control device (170) comprises: a third main exhaust pipe (1701) , a mixed drainage pipe (1703) , a drain pipe (1705) , a first branch exhaust pipe (1706) , a second branch exhaust pipe (1709) , a third branch exhaust pipe (1712) and a fourth branch exhaust pipe (1715) , wherein an exhaust end of the third main exhaust pipe (1701) is connected to one end of a condenser (1702) , another end of the condenser (1702) is connected to an inlet of the mixed drainage pipe (1703) , outlets of the mixed drainage pipe (1703) are respectively connected to an inlet of the drain pipe (1705) and gas inlet ends of the first branch exhaust pipe (1706) , the second branch exhaust pipe (1709), the third branch exhaust pipe (1712) and the fourth branch exhaust pipe (1715), and exhaust ends of the first branch exhaust pipe (1706) , the second branch exhaust pipe (1709) , the third branch exhaust pipe (1712) and the fourth branch exhaust pipe (1715) are all connected to the exhaust gas treatment device (190) ; wherein the drain pipe (1705) is provided with a water tank (1704) and a pneumatic valve (1717) , the first branch exhaust pipe (1706) is provided with a pneumatic valve (1707) and an absolute pressure control valve (1708) , the second branch exhaust pipe (1709) is provided with a pneumatic valve (1710) and a relative pressure control valve (1711) , the third branch exhaust pipe (1712) is provided with an automatic valve (1713) and a one-way valve (1714) , and the fourth branch exhaust pipe (1715) is provided with a pneumatic valve (1716) ; wherein the relative pressure control valve (1711) is used to control the air pressure inside the chamber (110) when a temperature inside the chamber (110) is higher than a first set temperature; wherein the absolute pressure control valve (1708) is used to control the air pressure inside the chamber (110) when the temperature inside the chamber (110) is lower than or equal to the first set temperature.
  5. The furnace tube of claim 2, wherein the normal-pressure gas injection pipe (140) comprises a main body portion (141) extending in a height direction of the chamber (110) and a connection portion (142) connected to the normal-pressure gas intake device (120) , wherein the main body portion (141) is evenly provided with a plurality of nozzles (143) , the gas inlet end is located at a bottom of the chamber (110) , sizes of the nozzles (143) increase with their distances from the gas inlet end, such that nozzles farther from the gas inlet end are larger in size, and a height of the uppermost nozzle is greater than or equal to a height of an uppermost wafer in the chamber (110) .
  6. The furnace tube of claim 2, wherein the low-pressure gas injection pipe (150) is L-shaped, wherein an end of the low-pressure gas injection pipe (150) is connected to the low-pressure gas intake device (130) , and another end of the low-pressure gas injection pipe (150) is a gas outlet (151) extending upward in a height direction of the chamber (110) , and a height of the low-pressure gas injection pipe (150) is lower than a height of a lowest wafer in the chamber (110) .
  7. The furnace tube of claim 1, wherein the normal-pressure gas intake device (120) comprises: a first nitrogen gas supply pipe (1201) , an oxygen gas supply pipe (1202) , a hydrogen gas supply pipe (1203), a first mixed gas supply pipe (1206), a second mixed gas supply pipe (1207) and a third mixed gas supply pipe (1208) ; wherein exhaust ends of the first nitrogen gas supply pipe (1201) are respectively connected to gas inlet ends of a first nitrogen branch gas supply pipe (1204) and a second nitrogen branch gas supply pipe (1205) , exhaust ends of the first nitrogen branch gas supply pipe (1204) and the oxygen gas supply pipe (1202) are respectively connected to a gas inlet end of the first mixed gas supply pipe (1206) , exhaust ends of the second nitrogen branch gas supply pipe (1205) and the hydrogen gas supply pipe (1203) are respectively connected to a gas inlet end of the second mixed gas supply pipe (1207), exhaust ends of the first mixed gas supply pipe (1206) and the second mixed gas supply pipe (1207) are respectively connected to a gas inlet end of the third mixed gas supply pipe (1208) , and an exhaust end of the third mixed gas supply pipe (1208) is connected to a gas inlet end of the normal-pressure gas injection pipe (140) ; wherein each of the first nitrogen gas supply pipe (1201) , the oxygen gas supply pipe (1202) and the hydrogen gas supply pipe (1203) is provided with a filter, a hand valve, a pressure regulating valve and a pressure sensor in sequence, the hydrogen gas supply pipe (1203) is further provided with a pneumatic valve behind the pressure sensor, and each of the first nitrogen branch gas supply pipe (1204) and the second nitrogen branch gas supply pipe (1205) is provided with a pneumatic valve; wherein each of the first mixed gas supply pipe (1206) and the second mixed gas supply pipe (1207) is provided with a gas mass flow controller and a pneumatic valve, and the third mixed gas supply pipe (1208) is provided with an igniter (1209) .
  8. The furnace tube of claim 3, wherein the low-pressure gas intake device (130) comprises: a second nitrogen gas supply pipe (1301) , a fluorine gas supply pipe (1302) , a special gas supply pipe (1303), a fourth mixed gas supply pipe (1306), a fifth mixed gas supply pipe (1307), a sixth mixed gas supply pipe (1312), a first mixed branch gas supply pipe (1308), a second mixed branch gas supply pipe (1309), a third mixed branch gas supply pipe (1310), and a fourth mixed branch gas supply pipe (1311) ; wherein exhaust ends of the second nitrogen gas supply pipe (1301) are respectively connected to gas inlet ends of the third nitrogen branch gas supply pipe (1304) and the fourth nitrogen branch gas supply pipe (1305) , exhaust ends of the third nitrogen branch gas supply pipe (1304) and the fluorine gas supply pipe (1302) are respectively connected to a gas inlet end of the fourth mixed gas supply pipe (1306) , exhaust ends of the fourth nitrogen branch gas supply pipe (1305) and the special gas supply pipe (1303) are respectively connected to a gas inlet end of the fifth mixed gas supply pipe (1307) , exhaust ends of the fourth mixed gas supply pipe (1306) are respectively connected to gas inlet ends of the first mixed branch gas supply pipe (1308) and the second mixed branch gas supply pipe (1309) , exhaust ends of the fifth mixed gas supply pipe (1307) are respectively connected to gas inlet ends of the third mixed branch gas supply pipe (1310) and the fourth mixed branch gas supply pipe (1311) , exhaust ends of the first mixed branch gas supply pipe (1308) and the third mixed branch gas supply pipe (1310) are connected to a gas inlet end of the sixth mixed gas supply pipe (1312), a gas outlet end of the sixth mixed gas supply pipe (1312) is connected to a gas inlet end of the low-pressure gas injection pipe (150) , and exhaust ends of the second mixed branch gas supply pipe (1309) and the fourth mixed branch gas supply pipe (1311) are respectively connected to the second main exhaust pipe (1806) ; wherein the second nitrogen gas supply pipe (1301) is provided with a filter, a hand valve, a pressure regulating valve and a pressure sensor in sequence, the fluorine gas supply pipe (1302) is provided with a filter, a hand valve, a filter, a pressure sensor and a pneumatic valve in sequence, the special gas supply pipe (1303) is provided with a filter, a hand valve, a filter, a pressure regulating valve, a pressure sensor and a pneumatic valve in sequence, each of the third nitrogen branch gas supply pipe (1304) , the fourth nitrogen branch gas supply pipe (1305) , the first mixed branch gas supply pipe (1308) , the second mixed branch gas supply pipe (1309) , the third mixed branch gas supply pipe (1310) and the fourth mixed branch gas supply pipe (1311) is provided with a pneumatic valve, and each of the fourth mixed gas supply pipe (1306) and the fifth mixed gas supply pipe (1307) is provided with a gas mass flow controller.
  9. The furnace tube of claim 3 or 4, wherein the exhaust gas treatment device (190) comprises at least two exhaust gas treatment chambers (191) , wherein one exhaust gas treatment chamber (191) can be switched to another exhaust gas treatment chamber (191) when the exhaust gas treatment chamber (191) breaks down.
  10. A using method of the furnace tube of claim 1, comprising the steps of: enabling the normal-pressure gas intake device (120) and the normal-pressure control device (170), and disabling the low-pressure gas intake device (130) and the low-pressure control device (180) such that a wafer in the chamber (110) is subjected to a normal-pressure process.
  11. The using method of claim 10, wherein controlling a working environment in the chamber (110) to switch from a low-pressure environment to a normal-pressure environment comprises the steps of: controlling the low-pressure gas intake device (130) to introduce a mixed gas of fluorine gas and nitrogen gas into the chamber to completely remove a film layer formed on an inner wall of the chamber (110); disabling the low-pressure gas intake device (130) and the low-pressure control device (180), and enabling the normal-pressure gas intake device (120) to introduce nitrogen gas to switch interior of the chamber (110) from a low-pressure environment to an normal-pressure state; enabling the normal-pressure control device (170).
  12. A using method of the furnace tube of claim 1, wherein the low-pressure gas intake device (130) and the low-pressure control device (180) are kept enabled, and the normal-pressure gas intake device (120) and the normal-pressure control device (170) are kept disabled such that a wafer in the chamber (110) is subjected to a low-pressure process treatment.

Description

TECHNICAL FIELD The present disclosure relates to the field of semiconductor technology, and specifically to a furnace tube and a using method of the same. BACKGROUND In the manufacturing process of semiconductor chips, as an indispensable equipment, furnace tubes can be used in processes such as deposition, diffusion, oxidation and annealing on wafers. In the related art, furnace tubes can only achieve either normal-pressure control or low-pressure control independently, that is, there are only normal-pressure furnace tubes or low-pressure furnace tubes. In view of the presence of the above technical problems, the present disclosure provides a new furnace tube and a use method thereof to at least partially solve the above problems. SUMMARY A series of simplified concepts is introduced into the portion of Summary, which would be further illustrated in the portion of the detailed description. The Summary of the present disclosure does not mean attempting to define the key feature and essential technical feature of the claimed technical solution, let alone determining the protection scope thereof. In view of the existing problems, the present disclosure provides a furnace tube, comprising: a chamber for processing a wafer;a normal-pressure gas intake device and a low-pressure gas intake device configured to supply gas to the chamber, wherein each of the normal-pressure gas intake device and the low-pressure gas intake device is independently connected to the chamber;a normal-pressure control device and a low-pressure control device configured to control an air pressure inside the chamber, wherein each of the normal-pressure control device and the low-pressure control device is configured to independently control the air pressure in the chamber;a normal-pressure gas injection pipe located inside the chamber and connected to the normal-pressure gas intake device, and a low-pressure gas injection pipe located inside the chamber and connected to the low-pressure gas intake device. In some embodiments of the present disclosure, the chamber comprises a gas inlet end and a gas outlet end; wherein the normal-pressure gas intake device is connected to the normal-pressure gas injection pipe via the gas inlet end, and the low-pressure gas intake device is connected to the low-pressure gas injection pipe via the gas inlet end;wherein the normal-pressure control device and the low-pressure control device are connected to the gas outlet end, respectively. In some embodiments of the present disclosure, the low-pressure control device comprises: a first main exhaust pipe, a first branch exhaust pipe, a second branch exhaust pipe and a second main exhaust pipe for providing a gas channel, wherein a gas inlet end of the first main exhaust pipe is connected to the gas outlet end, gas inlet ends of the first branch exhaust pipe and the second branch exhaust pipe are respectively connected to an exhaust end of the first main exhaust pipe, and exhaust ends of the first branch exhaust pipe and the second branch exhaust pipe are respectively connected to a gas inlet end of the second main exhaust pipe;a main valve for controlling the air pressure inside the chamber when the chamber is in a process state, wherein the main valve is provided on the first branch exhaust pipe;a bypass pneumatic valve for controlling the air pressure inside the chamber when the chamber is in a non-process state, wherein the bypass pneumatic valve is provided on the second branch exhaust pipe;a vacuum pump for pumping gas inside the chamber, wherein an end of the vacuum pump is connected to the exhaust end of the second main exhaust pipe and another end of the vacuum pump is connected to an exhaust gas treatment device. In some embodiments of the present disclosure, the normal-pressure control device comprises: a third main exhaust pipe, a mixed drainage pipe, a drain pipe, a first branch exhaust pipe, a second branch exhaust pipe, a third branch exhaust pipe and a fourth branch exhaust pipe, wherein an exhaust end of the third main exhaust pipe is connected to an end of a condenser, another end of the condenser is connected to an inlet of the mixed drainage pipe, outlets of the mixed drainage pipe are respectively connected to an inlet of the drain pipe and gas inlet ends of the first branch exhaust pipe, the second branch exhaust pipe, the third branch exhaust pipe and the fourth branch exhaust pipe, and exhaust ends of the first branch exhaust pipe, the second branch exhaust pipe, the third branch exhaust pipe and the fourth branch exhaust pipe are respectively connected to the exhaust gas treatment device;wherein the drain pipe is provided with a water tank and a pneumatic valve , the first branch exhaust pipe is provided with a pneumatic valve and an absolute pressure control valve, the second branch exhaust pipe is provided with a pneumatic valve and a relative pressure control valve, the third branch exhaust pipe is provided with an automatic valve