JP-2022515347-A5 -

Dates

Publication Date

20221223

Application Date

20191217

Description

[0061] In one example, an angled etching profile on the substrate 210 in a first region is generated by an ion beam 216 passing through a first set of openings 506, an angled etching profile on the substrate 210 in a second region is generated by an ion beam 216 passing through a second set of openings 510, and an angled etching profile on the substrate 210 in a third region is generated by an ion beam 216 passing through a third set of openings 514. Different etching profiles of fins or grids formed on the substrate are generated by regions 504, 508, and 512 of the filter plate 500. The intention is to modulate the characteristics of the ion beam 216 by utilizing various opening designs, shapes, spacings, densities, etc., incorporated within the filter plate 500, thereby enabling different angled etching profiles on the substrate while utilizing a single ion beam chamber 202 and/or ion beam source 204. [0065] The system 600 includes a chamber body 602 that surrounds or otherwise defines the processing space 640. The chamber body 602 may be manufactured from a suitable material such as stainless steel, aluminum, or an alloy or combination thereof. A first liner 636 is positioned adjacent to the chamber body 602 and protects the chamber body 602 from the processing environment of the processing space 640. In one example, the first liner 636 may be manufactured from a process-inert or resistant material such as a ceramic material or other suitable material. A second liner 638 is also positioned adjacent to the chamber body 602 and is positioned to substantially surround the processing space 640. In one embodiment, the second liner 638 is manufactured from a dielectric material such as quartz or a ceramic material. In another embodiment, the second liner 638 is manufactured from a material similar to that used to manufacture the first liner 636. In certain embodiments, one or both of the first liner 636 and the second liner 638 are optional. In such embodiments, the chamber body 602 may be manufactured and configured to function without a liner. [0066] An exhaust port 648 is formed through the second liner 636 and the chamber body 602. The exhaust port 648 is formed through the second liner 636 and the chamber body 602 at a position below the pedestal 604 located within the processing space 640. The pump 650 is fluidly connected to the processing space 640 via the exhaust port 648 and the pump port 646 surrounding the pedestal 604. The pump 650 enables the discharge of material from the processing space 640. The lid 616 is connected to the chamber body 602 opposite the pedestal 604 or is otherwise integrated with it.