JP-2022533662-A5 -

Dates

Publication Date

20230529

Application Date

20200520

Description

[0081] In one or more embodiments, the absorber layer pairs 420a/420b, 420c/420d, 420e/420f include a first layer (420a, 420c, 420e) containing an absorber material comprising a boron-nickel alloy, and a second absorber layer (420b, 420d, 420f) containing an absorber material comprising a boron -nickel alloy. In a particular embodiment, the absorber layer pair includes a first layer (420a, 420c, 420e) containing a boron-nickel alloy, and a second absorber layer (420b, 420d, 420f) containing an absorber material comprising a boron-nickel alloy. [0085] Another aspect of the present disclosure relates to a method for manufacturing an extreme ultraviolet (EUV) mask blank, the method comprising forming a multilayer laminate of reflective layers on a substrate, the multilayer laminate comprising a plurality of pairs of reflective layers, forming a capping layer on the multilayer laminate of reflective layers, and forming an absorber layer comprising a boron-nickel alloy on the capping layer, the boron-nickel alloy comprising, on the total weight of the alloy, about 2% to about 10.9% by weight of boron and about 89.1% to about 98% by weight of nickel . In one or more embodiments, the boron-nickel alloy comprises, on the total weight of the alloy, about 3% to about 9.9% by weight of boron and about 90.1% to about 97% by weight of nickel. In one or more embodiments, the boron-nickel alloy contains, based on the total weight of the alloy, 5% to about 7.9% by weight of boron and about 92.1% to about 95% by weight of nickel. In one or more embodiments, the boron-nickel alloy is amorphous. In one or more embodiments, the alloy is a single-phase alloy.