JP-2022535282-A5 -

Dates

Publication Date

20230512

Application Date

20200506

Description

While the embodiments described above are explained in some detail for clearer understanding, it will be apparent that certain changes and modifications can be practiced within the scope of the appended claims. Therefore, these embodiments should be considered illustrative rather than restrictive, and the embodiments should not be limited to the details described herein, but may be modified within the scope of the appended claims and equivalents. This disclosure includes the following examples of applications: [Application Example 1] A method of adjustment, Accessing a plurality of reflection parameter values associated with the second radio frequency generator for a first set of one or more cycles of operation of the first radio frequency generator, The process involves applying the plurality of reflection parameter values to a computer-based model of at least a portion of the radio frequency path to calculate a plurality of load impedance parameter values from the plurality of reflection parameter values, wherein the radio frequency path is located between the second radio frequency generator and the electrodes of the plasma chamber. Receiving multiple frequency modulation parameters of the radio frequency signal generated by the second radio frequency generator, The values of the plurality of frequency modulation parameters are determined by applying the plurality of load impedance parameter values to the computer-based model, wherein the values of the plurality of frequency modulation parameters are determined to minimize the reflection coefficient parameter at the input of the computer-based model. Controlling the second radio frequency generator according to the values of the plurality of frequency modulation parameters during a second set of one or more cycles of operation of the first radio frequency generator. Methods that include... [Application Example 2] The method according to Application Example 1, A method comprising accessing the plurality of reflection parameter values, calculating the plurality of load impedance parameter values, determining the value of the frequency modulation parameter, and controlling the second radio frequency generator, performed during processing of a substrate in the plasma chamber. [Application Example 3] The method according to Application Example 1, The method wherein the plurality of reflection parameter values include a plurality of voltage reflection coefficient values, and the reflection coefficient parameter is the average power reflection coefficient. [Application Example 4] The method according to Application Example 1, A method wherein a second set of one or more cycles of the operation follows a first set of one or more cycles of the operation. [Application Example 5] The method according to Application Example 1, The method wherein the first set comprises two or more cycles of operation of the first radio frequency generator, and each of the plurality of reflection parameter values is the average of a plurality of reflection coefficient values calculated over the two or more cycles of the first set. [Application Example 6] The method according to Application Example 1, For a third set of one or more cycles of operation of the first radio frequency generator, the process of accessing the plurality of reflection parameter values, calculating the plurality of load impedance parameter values, and determining the values of the plurality of frequency modulation parameters is repeated. The second radio frequency generator is controlled repeatedly for a fourth set of one or more cycles of operation of the first radio frequency generator. It further includes, The third set follows the second set, and the fourth set follows the third set. method. [Application Example 7] The method according to Application Example 1, A method wherein the plurality of reflection parameter values include a plurality of values for complex voltage and complex current. [Application Example 8] The method according to Application Example 1, The computer-based model comprises a plurality of circuit elements, two adjacent circuit elements of which are coupled to each other via connections, and the computer-based model has substantially the same impedance as the impedance of the radio frequency path. [Application Example 9] The method according to Application Example 1, The computer-based model comprises a plurality of circuit elements, two adjacent circuit elements of the plurality of circuit elements are connected to each other via connections, the plurality of circuit elements represent a plurality of circuit components of the radio frequency path, and are connected in the same manner as the plurality of circuit components of the radio frequency path. [Application Example 10] The method according to Application Example 1, The aforementioned radio frequency path is A radio frequency cable connecting the second radio frequency generator to the branching section of the match network, The a