JP-2024157368-A5 -

Dates

Publication Date

20260507

Application Date

20230425

Description

According to one aspect of the present invention, an exposure apparatus is provided for projecting a pattern from a master plate onto a substrate using a projection optical system and exposing the substrate, comprising: a stage that holds and moves the substrate; a measurement unit that measures the height position of the substrate held by the stage at a plurality of measurement points in the exposure region; and a control unit that controls the measurement unit and corrects the position of the stage based on the measurement results so that the amount of deviation of the height position with respect to the image plane of the projection optical system is reduced, wherein the control unit sets the plurality of measurement points in the exposure region based on information about the exposure region.