JP-2026075079-A - Composition for detecting ultraviolet or plasma treatment

Abstract

[Problem] To provide a novel detection composition that has sufficient reactivity to ultraviolet light or atmospheric pressure plasma. [Solution] A composition for detecting ultraviolet treatment or plasma treatment, comprising at least one selected from the group consisting of organic fluorescent whitening agents, organic light-emitting materials, and inorganic fluorescent materials. [Selection Diagram] None

Inventors

• 玉木 万美子
• 大城 盛作
• 横森 友哉

Assignees

• 株式会社サクラクレパス

Dates

Publication Date

20260507

Application Date

20251020

Priority Date

20241021

Claims (7)

1. A composition for detecting ultraviolet or plasma treatment, comprising at least one material selected from the group consisting of organic and inorganic fluorescent materials.
2. The aforementioned organic fluorescent material is an organic fluorescent whitening agent. The plasma treatment detection composition according to claim 1, wherein the organic fluorescent whitening agent is at least one selected from the group consisting of coumarin-type organic fluorescent whitening agents, thiophene-type organic fluorescent whitening agents, naphthalene-type organic fluorescent whitening agents, bisbenzoxazole-type organic fluorescent whitening agents, bis(styryl)biphenyl-type organic fluorescent whitening agents, stilbene-type organic fluorescent whitening agents, and azole-type organic fluorescent whitening agents.
3. Furthermore, the plasma processing detection composition according to claim 1 or 2, comprising a non-color-changing dye.
4. A plasma processing detection composition according to claim 3, for use in detecting atmospheric pressure plasma processing.
5. The plasma treatment detection composition according to claim 1 or 2, further comprising at least one organic dye selected from the group consisting of methine dyes, anthraquinone dyes, oxazine dyes, azo dyes, thiaazine dyes, and triarylmethane dyes.
6. A plasma indicator having a plasma treatment detection layer made of the composition described in claim 1.
7. A real-time analysis method for plasma processing, comprising the step of irradiating a test substance containing the plasma processing detection composition described in claim 1 with plasma.

Description

This invention relates to a composition for detecting ultraviolet or plasma treatment. Plasma is utilized in various industrial fields, including welding, cutting and thermal spraying, microfabrication, thin-film synthesis, surface modification, and sterilization/disinfection, utilizing its thermal energy. Its applications are expected to continue expanding in the future. Furthermore, ultraviolet light (hereinafter also referred to as UV in this specification) is primarily used for sterilization purposes. Plasma or UV treatments are generally difficult to determine visually whether they are in progress or have been completed. Therefore, there is a strong need for a reliable means of determining whether such treatments have been performed or are in progress. Several plasma processing detection compositions have been proposed as means of confirming plasma processing (see, for example, Patent Document 1). Furthermore, in recent years, atmospheric pressure plasma, which can be used under normal pressure, has attracted particular attention from the perspective of improving productivity. However, depending on the discharge method or structure of the equipment, ozone may inevitably be generated during atmospheric pressure plasma processing due to the discharge of gases in the atmosphere. Conventional plasma processing detection compositions are generally reactive to ozone, and therefore lack sufficient processing detection capability for pure atmospheric pressure plasma (that is, plasma other than ozone). In other words, there is a problem in that the possibility of reacting only to ozone and not atmospheric pressure plasma cannot be ruled out. Novel ultraviolet or plasma processing detection compositions are needed. Japanese Patent Publication No. 2019-210468 In this specification, "contains" encompasses the concepts of "includes," "consist essentially of," and "consist of." Furthermore, in this specification, when a numerical range is indicated as "A to B," it means A or greater and B or less. (1. Composition for detecting ultraviolet or plasma treatment) The ultraviolet treatment or plasma treatment detection composition of the present invention (hereinafter also simply referred to as "the detection composition of the present invention" or "the composition of the present invention") comprises at least one selected from the group consisting of organic fluorescent materials and inorganic fluorescent materials. The ultraviolet or plasma treatment detection composition of the present invention emits light or changes color when ultraviolet or plasma treatment is performed in conjunction with an article to be treated. This makes it suitable for real-time confirmation of whether the treatment is being performed or confirmation that the treatment has been completed. There are no particular limitations on the wavelength of ultraviolet light to be processed and detected; for example, ultraviolet light in the range of 10 to 400 nm can be suitably detected. Among these, UV-C, UV-B, or UV-A with wavelengths of 100 to 400 nm are preferred, and more preferably, ultraviolet light in the range of 150 to 300 nm from vacuum ultraviolet lasers, xenon lamps, deuterium lamps, mercury lamps, and UV-LEDs commonly used in industry can be suitably detected. The plasma to be processed and detected can include plasma processing using a plasma generating gas and applying AC voltage, pulse voltage, high frequency, or microwave, etc., and is not particularly limited. More specifically, reduced-pressure plasma and atmospheric pressure plasma can be mentioned. Specific examples of atmospheric pressure plasma treatment include, for instance, cleaning and surface modification of flat panel displays (such as liquid crystal displays); cleaning and surface modification of mounted substrates or printed circuit boards; surface modification of automobile and aircraft parts; and disinfection, sterilization, and treatment applications in the medical field (dentistry or surgery). The gas used for generating reduced-pressure plasma is not limited to any gas that can generate plasma by applying AC voltage, pulse voltage, high frequency, microwave, etc., under reduced pressure. Examples include oxygen, nitrogen, hydrogen, chlorine, hydrogen peroxide, helium, argon, silane, ammonia, sulfur bromide, water vapor, nitrous oxide, tetraethoxylan, carbon tetrafluoride, trifluoromethane, carbon tetrachloride, silicon tetrachloride, sulfur hexafluoride, titanium tetrachloride, dichlorosilane, trimethylgallium, trimethylindium, and trimethylaluminum. These reduced-pressure plasma generating gases can be used individually or in mixtures of two or more. The gas used for generating atmospheric pressure plasma is not limited to any gas that can generate plasma by applying AC voltage, pulse voltage, high frequency, microwave, etc., under atmospheric pressure. Examples include oxygen, nitrogen, hydrogen, argon, helium, and air. These atmospheric pressure plasma generating