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JP-2026075327-A - Processing unit

JP2026075327AJP 2026075327 AJP2026075327 AJP 2026075327AJP-2026075327-A

Abstract

[Problem] To provide a processing device that can easily clean abrasive particles and abrasive powder. [Solution] The processing apparatus 10 includes a splash cover 13 having an entrance 13a, a nozzle 19 positioned inside the splash cover 13 for spraying processing liquid 1, and a processing tank 15 in which the object to be processed 3 is placed, which can be brought into the splash cover 13 from the entrance 13a and installed at a predetermined processing position 81. [Selection Diagram] Figure 1

Inventors

  • 恒川 侑弥
  • 小柳 真美

Assignees

  • 株式会社スギノマシン

Dates

Publication Date
20260508
Application Date
20241022

Claims (9)

  1. A splash cover with an entrance, A nozzle is located inside the splash cover and sprays the processing liquid, A processing tank in which the object to be processed is placed, the processing tank being brought into the splash cover from the entrance and installed at a predetermined processing position, A processing apparatus having
  2. An external guide extending toward the aforementioned entrance and positioned outside the splash cover, An internal guide, which is connected to the external guide and located inside the splash cover, It further possesses, The processing tank can be transported to the processing position by being guided by the external guide and the internal guide. The apparatus according to claim 1.
  3. An internal conveyor arranged in the internal guide, An external conveyor positioned on the external guide, It further possesses, The processing tank moves on the internal conveyor and the external conveyor. The apparatus according to claim 1 or 2.
  4. The processing tank has an overflow port located at its upper end, The splash cover has a recovery basin that receives the treatment liquid that flows out from the overflow port when the treatment tank is in the treatment position. The apparatus according to any one of claims 1 to 3.
  5. The aforementioned processing tank is A drain port located at the bottom, A drain valve connected to the drain port, The apparatus according to any one of claims 1 to 4, having
  6. A lifting box having a table on which the workpiece is placed, and being able to move up and down between an upward end and a downward end, wherein when the lifting box is at the upward end, the processing tank can be positioned at the processing position, and when the processing tank is at the processing position, the lifting box further has a part that moves down to the downward end to insert the table into the processing tank. The apparatus according to any one of claims 1 to 5.
  7. The aforementioned processing tank stores the processing liquid and polishing powder, A first stirring nozzle is arranged in the lifting box and moves up and down integrally with the lifting box, and further comprises a first stirring nozzle that injects the processing liquid or gas into the processing tank to suspend the polishing powder. The apparatus according to claim 6.
  8. The first stirring nozzle is, A stirring pipe arranged in the lifting box, the stirring pipe being an annular shape that is located near the bottom of the processing tank and extends along the inner circumference of the processing tank when the lifting box is lowered, Multiple nozzles arranged in the stirring pipe, The apparatus according to claim 7, having the following features.
  9. The table is rotatably supported by the lifting box, A second stirring nozzle is positioned on the table and rotates integrally with the table, further comprising a second stirring nozzle that sprays the processing liquid into the processing tank to suspend the polishing powder. The apparatus according to claim 7 or 8.

Description

This invention relates to a processing apparatus. A polishing peening apparatus is known that includes a processing tank, a distribution chamber, a stirring nozzle, a peening nozzle, and a moving device (Japanese Patent Publication No. 2022-42334, hereinafter referred to as Patent Document 1). The processing tank stores polishing particles and peening liquid, and the object to be immersed in the peening liquid is placed at the bottom. The distribution chamber distributes the peening liquid. The stirring nozzle is connected to the distribution chamber and ejects the peening liquid. The peening nozzle ejects the peening liquid onto the object. The moving device moves the peening nozzle relative to the object. Perspective view of the processing apparatus according to the embodiment.Plan view of the processing apparatus of the embodimentCross-sectional view along line III-III in Figure 2Cross-sectional view along line III-III in Figure 2 during the processing of the lifting box.Figure 2 shows a cross-sectional view along the line IV-IV. As shown in Figures 1 and 3A, the peening apparatus (processing device) 10 of this embodiment includes a frame 11, a splash cover 13, a feed table 18, an expandable cover 21, a nozzle head 17, a peening nozzle (nozzle) 19, an internal guide 23, an internal conveyor 25, an external frame 26, an external guide 27, an external conveyor 29, a processing tank 15, a recovery bin 53, a lifting device 31, a lifting box 35, a table 47, a first stirring nozzle 49, a second stirring nozzle 51, a tank 54, a high-pressure pump 58, and a low-pressure pump 56. The peening nozzle 19 can move freely in the left-right direction (X direction), the front-back direction (Y direction), and the up-down direction (Z direction). The positive X direction is to the right in Figure 2. The positive Z direction is to the left in Figure 3A. Figure 2 is a cross-sectional view taken along line II-II in Figure 3A. The polishing powder 2 and processing liquid 1 are stored in the processing tank 15. The frame 11 is the main frame of the peening device 10. The splash cover 13 is fixed above the frame 11. The splash cover 13 has an entrance 13a and a rear opening (not shown). The entrance 13a is located, for example, at the front of the splash cover 13. The splash cover 13 has an entrance door (not shown) that opens and closes the entrance 13a. The tank 54, the high-pressure pump 58, and the low-pressure pump 56 are located outside the splash cover 13. The tank 54 stores the processing liquid 1. The high-pressure pump 58 is, for example, a piston pump. The high-pressure pump 58 pressurizes the processing liquid 1 stored in the tank 54 and supplies it to the peening nozzle 19 via the feed stand 18 and nozzle head 17. The low-pressure pump 56 is, for example, a centrifugal pump. The low-pressure pump 56 pressurizes the processing liquid 1 stored in the tank 54 and supplies it to the first stirring nozzle 49 and the second stirring nozzle 51. The feed table 18 is positioned on the frame 11 and extends in the Y direction. The feed table 18 extends from the rear of the splash cover 13 into the interior, passing through a rear opening (not shown). The feed table 18 moves in the X, Y, and Z directions. The expandable cover 21 is positioned on the splash cover 13. The expandable cover 21 covers the space between the feed table 18 and the rear opening. The expandable cover 21 is, for example, a bellows cover, a telescopic cover, or a roll cover. The nozzle head 17 is positioned at the tip of the feed table 18. The peening nozzle 19 is positioned on the nozzle head 17. As shown in Figure 3A, the peening nozzle 19 has a shaft 19a and a nozzle 19b. The shaft 19a extends along the nozzle rotation axis 4. The nozzle 19b is positioned at the tip of the shaft 19a. For example, the processing liquid 1 is sprayed from the nozzle 19b in the -Z direction. The peening nozzle 19 is, for example, a straight spray nozzle or a flat spray nozzle. A pair of internal guides 23 are positioned inside the splash cover 13. The internal guides 23 are fixed above the frame 11. The internal guides 23 extend in the Y-direction toward the entrance 13a. The internal guides 23 have a rectangular cross-section extending vertically. The pair of internal guides 23 extend parallel to each other to guide the processing tank 15. The internal conveyor 25 consists of multiple cam followers arranged in the Y-axis direction. These cam followers are positioned at equal intervals on the inner sides of a pair of internal guides 23. The upper surface of the internal conveyor 25 is located above the lower surface of the entrance 13a. The external frame 26 is positioned in front of the frame 11. The external frame 26 may have casters (not shown). The external frame 26 may be detachable from the frame 11. A pair of external guides 27 are positioned outside the splash cover 13. The external guides 27 are fixed above the external frame 26. The external guides 27 extend in