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JP-2026076181-A - Electro-optical assembly with electromagnetic shielding

JP2026076181AJP 2026076181 AJP2026076181 AJP 2026076181AJP-2026076181-A

Abstract

[Problem] Shield a charged particle beam from external electromagnetic fields. [Solution] An electro-optical assembly for an electro-optical column 40 for projecting a charged particle beam along a beam path toward a target, wherein the electro-optical assembly includes an electromagnetic shield 31 configured to surround the charged particle beam path and shield the charged particle beam from an electromagnetic field outside the electromagnetic shield 31, the electromagnetic shield 31 includes a plurality of sections 32 extending along different locations along the beam path, each section 32 surrounding the charged particle beam, and the sections 32 are separable. [Selection Diagram] Figure 3

Inventors

  • ウォルヴード，デルク，フェルディナンド
  • ムドレトソフ，ドミトリー
  • フー，シュエラン
  • シー，シンポ
  • ヴァン ゾースト，ユルゲン
  • ウィーラント，マルコ，ジャン－ジャコ

Assignees

  • エーエスエムエル ネザーランズ ビー．ブイ．

Dates

Publication Date
20260511
Application Date
20251226
Priority Date
20201008

Claims (15)

  1. An electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path toward a target, wherein the electron-optical assembly is The electromagnetic shield includes the electromagnetic shield that surrounds the charged particle beam path and shields the charged particle beam from electromagnetic fields outside the electromagnetic shield, The electromagnetic shield includes a plurality of sections extending along different locations along the beam path, each section surrounding the charged particle beam path. An electro-optical assembly in which the sections are separable, the sections are arranged such that a gap in the electromagnetic shield is formed in the direction of the beam path between at least two adjacent sections, the adjacent sections have opposing surfaces extending radially with respect to the beam path, and at least one of the opposing surfaces includes a flange extending radially with respect to the beam path.
  2. The electron-optical assembly according to claim 2, wherein the opposing surface extends radially with respect to the beam path for a distance at least equal to the gap between the adjacent sections.
  3. The electro-optical assembly according to claim 1 or 2, comprising at least one electro-optical element between adjacent sections.
  4. The electron-optical assembly according to claim 3, wherein the electron-optical element includes a plurality of manipulators, preferably a manipulator array.
  5. The electron-optical assembly according to any one of claims 1 to 4, wherein the electromagnetic shield shields the charged particle beam from electric and/or magnetic fields.
  6. The electro-optical assembly according to any one of claims 1 to 5, wherein the electromagnetic shield comprises a magnetic permeable material.
  7. The electro-optical assembly according to any one of claims 1 to 6, wherein at least one section is arranged such that it is radially movable relative to the beam path, independently of any other section.
  8. The electro-optical assembly according to any one of claims 1 to 7, wherein at least two of the sections include adjacent ends that electromagnetically engage with each other.
  9. The electron-optical assembly according to claim 8, wherein the adjacent ends are sized to be arranged coaxially.
  10. The electro-optical assembly according to claim 8 or 9, wherein the adjacent ends are physically separated and electrically engaged.
  11. The electro-optical assembly according to any one of claims 1 to 10, wherein at least one of the sections comprises a mechanical reference member that enables the position of the section to be determined.
  12. The electro-optical assembly according to claim 11, wherein the mechanical reference member mechanically engages with another mechanical reference member of the section or the corresponding mechanical reference member of the column.
  13. A module comprising an electro-optical device and an electromagnetic shield for the beam path passing through the module when the device is located within an electro-optical column for projecting a charged particle beam along the beam path toward a target, wherein the electromagnetic shield comprises an up-beam section of the up-beam of the electro-optical device and a down-beam section of the down-beam of the electro-optical device, wherein at least one of the up-beam section and the down-beam section has a boundary surface extending radially with respect to the beam path, and at least one of the up-beam section and the down-beam section includes a flange extending radially with respect to the beam path.
  14. The module according to claim 13, wherein the interface of the upbeam section forms an interface with the upbeam element of the column, and the interface of the upbeam interface is an opposing surface.
  15. The module according to claim 14, wherein the up-beam element of the column includes the upper beam section of the electromagnetic shield, and the interface of the up-beam section is spaced apart from the upper beam section by a gap when the module is located within the electro-optical column, preferably the gap being at most the same size as the radius range of the interface of the up-beam section.

Description

Cross-reference of related applications [0001] This application claims priority to U.S. Patent Application No. 63/075,289 filed on 7 September 2020, European Patent Application No. 20200740.7 filed on 8 October 2020, and U.S. Patent Application No. 63/126932 filed on 17 December 2020, each of which is incorporated herein by reference in whole. [0002] The embodiments provided herein generally describe the provision of electro-optical assemblies, modules, and electro-optical columns for use, for example, in charged particle beam inspection apparatus. The embodiments also provide methods for manufacturing electro-optical assemblies, methods for replacing modules, and methods for projecting a charged particle beam along a beam path toward a target. [0003] When manufacturing semiconductor integrated circuit (IC) chips, undesirable pattern defects inevitably occur on the substrate (i.e., wafer) or mask during the manufacturing process, for example, as a result of optical effects and accidental particles, thereby reducing yield. Therefore, monitoring the extent of undesirable pattern defects is an important process in IC chip manufacturing. More generally, inspection and/or measurement of the surface of the substrate or other object/material is an important process during and/or after manufacturing. [0004] Pattern inspection tools using charged particle beams have been used to inspect objects, for example, to detect pattern defects. These tools generally use electron microscopy techniques, such as scanning electron microscopes (SEMs). In an SEM, a primary electron beam of relatively high-energy electrons is targeted in a final deceleration step to land on the target with a relatively low landing energy. The electron beam is focused onto the target as a probing spot. The interaction between the material structure at the probing spot and the landed electrons from the electron beam causes electrons such as secondary electrons, backscattered electrons, or Auger electrons to be emitted from the surface. The generated secondary electrons can be emitted from the material structure of the target. By scanning the primary electron beam as a probing spot across the target surface, secondary electrons can be emitted across the target surface. By collecting these emitted secondary electrons from the target surface, the pattern inspection tool can obtain an image representing the material structure features of the target surface. [0005] Another application of electron-optical columns is lithography. A charged particle beam reacts with a resist layer on the substrate surface. The desired pattern in the resist can be created by controlling the location on the resist layer where the charged particle beam is directed. [0006] The electron-optical column may also be a device for generating, illuminating, projecting, and/or detecting one or more charged particle beams. The charged particle beam path is controlled by an electromagnetic field. A stray electromagnetic field may undesirably deflect the beam. [0007] There is a general need to improve the control of charged particle beam paths. [0008] According to a first aspect of the present invention, an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path toward a target is provided, wherein the electron-optical assembly includes an electromagnetic shield configured to surround the charged particle beam path and shield the charged particle beam from an electromagnetic field outside the electromagnetic shield, the electromagnetic shield includes a plurality of sections extending along different locations along the beam path, each section surrounding the charged particle beam path, and the sections are separable. [0009] According to a second aspect of the present invention, a module is provided comprising an electro-optical device and an electromagnetic shield for a beam path passing through a module when the module is located within an electro-optical column for projecting a charged particle beam along a beam path toward a target, wherein the electromagnetic shield comprises an up-beam section of the up-beam of the electro-optical device and a down-beam section of the down-beam of the electro-optical device, and at least one of the up-beam section and the down-beam section has an interface extending radially with respect to the beam path. [0010] According to a third aspect of the present invention, an electro-optical assembly is provided for an electro-optical column for projecting a charged particle beam along a beam path toward a target, wherein the electro-optical assembly includes an electromagnetic shield configured to surround the charged particle beam path and shield the charged particle beam from an electromagnetic field outside the electromagnetic shield, the electromagnetic shield includes a plurality of sections extending along and surrounding the beam path, each section surrounding the charged particle beam path, an