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JP-2026076311-A - electrostatic chuck

JP2026076311AJP 2026076311 AJP2026076311 AJP 2026076311AJP-2026076311-A

Abstract

[Problem] To provide an electrostatic chuck that can improve the uniformity of the in-plane temperature distribution of an object being processed while suppressing the complexity of temperature control. [Solution] An electrostatic chuck comprising a ceramic dielectric substrate, a base plate, and a heater section, wherein the heater section has first and second heater elements, the first heater element has a plurality of zones including a first zone, the first zone has a first heater line and first and second power supply sections, the first heater line has a first extension section provided with a first protrusion and a second extension section provided with a second protrusion, the first zone has a first opposing region where the first protrusion and the second protrusion are arranged adjacent to each other and facing each other, the second heater element has a plurality of zones including a second zone, the second zone has a second heater line and third and fourth power supply sections, the second zone has a central region and an outer peripheral region, and the first opposing region is provided at a position overlapping with the central region. [Selection Diagram] Figure 14

Inventors

  • 小野 瑛人
  • 上藤 淳平

Assignees

  • ＴＯＴＯ株式会社

Dates

Publication Date
20260511
Application Date
20260213
Priority Date
20220329

Claims (7)

  1. A ceramic dielectric substrate having a first main surface on which the object to be processed is placed, and a second main surface opposite to the first main surface, A base plate having an upper surface on the ceramic dielectric substrate side and a lower surface opposite to the upper surface, which supports the ceramic dielectric substrate, A heater section for heating the ceramic dielectric substrate, Equipped with, The heater section has a first heater element, The first heater element is provided between the first main surface and the upper surface, The first heater element has a plurality of zones, The plurality of zones of the first heater element have a first zone, The first zone includes a first heater line that generates heat when an electric current flows through it, and a first power supply unit and a second power supply unit that supply power to the first heater line. The first heater line has a plurality of extending portions that extend along a first direction and are aligned in a second direction perpendicular to the first direction, and a plurality of protruding portions provided on the plurality of extending portions that project in the second direction, The plurality of extensions include a first extension and a second extension. The plurality of protrusions include a first protrusion provided on the first extension and a second protrusion provided on the second extension. The first projection protrudes toward the second projection, The second projection protrudes toward the first projection, The first zone has a first opposing region in which the first protrusion and the second protrusion are arranged adjacent to each other and facing each other. The first zone, when viewed along the Z-direction perpendicular to the first main surface, has a central region located in the center of the first zone and an outer peripheral region located outside the central region. The first opposing region is an electrostatic chuck provided in the central region.
  2. A ceramic dielectric substrate having a first main surface on which the object to be processed is placed, and a second main surface opposite to the first main surface, A base plate having an upper surface on the ceramic dielectric substrate side and a lower surface opposite to the upper surface, which supports the ceramic dielectric substrate, A heater section for heating the ceramic dielectric substrate, Equipped with, The heater section has a first heater element, The first heater element is provided between the first main surface and the upper surface, The first heater element has a plurality of zones divided in the radial direction, The plurality of zones of the first heater element have a first zone, The first zone includes a first heater line that generates heat when an electric current flows through it, and a first power supply unit and a second power supply unit that supply power to the first heater line. The first heater line has a plurality of extending portions that extend along a first direction and are aligned in a second direction perpendicular to the first direction, and a plurality of protruding portions provided on the plurality of extending portions that project in the second direction, The plurality of extensions include a first extension and a second extension. The plurality of protrusions include a first protrusion provided on the first extension and a second protrusion provided on the second extension. The first projection protrudes toward the second projection, The second projection protrudes toward the first projection, The first zone has a first opposing region in which the first protrusion and the second protrusion are arranged adjacent to each other and facing each other. The first zone includes the outer edge of the first heater element, The first zone has an inner circumferential portion located radially inside the radial center line that divides the first zone radially into two equal parts, and an outer circumferential portion located radially outside the radial center line and including the outer edge. The first opposing region is an electrostatic chuck provided on the inner circumference.
  3. The plurality of zones of the first heater element are divided radially, The electrostatic chuck according to claim 1 or 2, wherein the first direction is the circumferential direction.
  4. The plurality of zones of the first heater element are divided radially, The electrostatic chuck according to claim 1 or 2, wherein the first direction is the radial direction.
  5. The plurality of extensions further have a third extension located between the first extension and the second extension in the second direction. The electrostatic chuck according to claim 1 or 2, wherein the third extension is provided in a position that does not overlap with the first protrusion and the second protrusion in the second direction.
  6. The plurality of protrusions further have a third protrusion provided on the first extension and projecting toward the second protrusion, The electrostatic chuck according to claim 1 or 2, wherein the third protrusion is arranged adjacent to and opposite to the second protrusion.
  7. A ceramic dielectric substrate having a first main surface on which the object to be processed is placed, and a second main surface opposite to the first main surface, A base plate having an upper surface on the ceramic dielectric substrate side and a lower surface opposite to the upper surface, which supports the ceramic dielectric substrate, A heater section for heating the ceramic dielectric substrate, Equipped with, The heater section has a first heater element, The first heater element is provided between the first main surface and the upper surface, The first heater element has a plurality of zones, The plurality of zones of the first heater element have a first zone, The first zone includes a first heater line that generates heat when an electric current flows through it, and a first power supply unit and a second power supply unit that supply power to the first heater line. The first heater line has a curved first projection and a second projection, The curvature direction of the first protrusion is opposite to that of the curvature direction of the second protrusion. The first zone has a first opposing region in which the first protrusion and the second protrusion are arranged adjacent to each other and facing each other. The first zone, when viewed along the Z-direction perpendicular to the first main surface, has a central region located in the center of the first zone and an outer peripheral region located outside the central region. The first opposing region is an electrostatic chuck provided in the central region.

Description

Aspects of this invention generally relate to electrostatic chucks. In plasma processing chambers used for etching, CVD (Chemical Vapor Deposition), sputtering, ion implantation, and ashing, electrostatic chucks are used to hold and adsorb objects such as semiconductor wafers and glass substrates. Electrostatic chucks work by applying electrostatic power to their internal electrodes, thereby attracting substrates such as silicon wafers through electrostatic force. In recent years, there has been a demand for miniaturization and increased processing speed in IC chips, including semiconductor elements such as transistors. Consequently, there is a need to improve the processing accuracy, such as etching, when forming semiconductor elements on wafers. Etching accuracy refers to whether the wafer processing can create patterns with the designed width and depth. Improving etching accuracy allows for miniaturization of semiconductor elements and increased integration density. In other words, improving processing accuracy enables both miniaturization and increased speed of chips. It is known that the processing accuracy, such as etching, depends on the wafer temperature during processing. Therefore, in substrate processing equipment equipped with an electrostatic chuck, controlling the temperature distribution within the wafer surface during processing is required to achieve a uniform etching rate. One known method for controlling the temperature distribution within the wafer surface is to use an electrostatic chuck with a built-in heater (heating element). In particular, with the miniaturization of semiconductor devices in recent years, there is a demand for faster heating and more precise control of the in-plane temperature distribution. To achieve this, a two-layer structure consisting of a main heater and a sub-heater is known. Furthermore, heater patterns for configurations with multiple zones are also known. Japanese Patent Publication No. 2004-111107 This is a schematic perspective view of an electrostatic chuck according to an embodiment.Figures 2(a) and 2(b) are schematic cross-sectional views showing a part of the electrostatic chuck according to the embodiment.This is an exploded perspective view schematically showing the heater section according to the embodiment.This is an exploded cross-sectional view schematically showing the heater section according to the embodiment.This is a schematic plan view showing the main zone of the main heater element according to the embodiment.This is a schematic plan view showing a subzone of a subheater element according to the embodiment.This is a schematic plan view showing the positional relationship between the main zone of the main heater element and the subzone of the subheater element according to the embodiment.This is a schematic plan view showing a part of the first zone of the heater section according to the embodiment.This is a schematic plan view showing a part of the first zone of the heater section according to a modified embodiment.This is a schematic plan view showing a part of the first zone of the heater section according to a modified embodiment.This is a schematic plan view showing a part of the first zone of the heater section according to a modified embodiment.This is a schematic plan view showing a part of the first zone of the heater section according to a modified embodiment.This is a schematic plan view showing the positional relationship between a part of the first zone and the second zone of the heater section according to the first embodiment.This is a schematic plan view showing the positional relationship between a part of the first zone and the second zone of the heater section according to the first embodiment.This is a schematic plan view showing the first zone of the heater section according to the second embodiment.This is a schematic plan view showing the first zone of the heater section according to the third embodiment. The embodiments of the present invention will be described below with reference to the drawings. In each drawing, similar components are denoted by the same reference numerals, and detailed descriptions are omitted as appropriate. Figure 1 is a schematic perspective view of an electrostatic chuck according to an embodiment. Figures 2(a) and 2(b) are schematic cross-sectional views showing a part of the electrostatic chuck according to the embodiment. In Figure 1, for the sake of explanation, a cross-sectional view of a part of the electrostatic chuck is shown. Figure 2(a) is a cross-sectional view taken along the line A1-A2 shown in Figure 1. Figure 2(b) is an enlarged view of region B1 shown in Figure 2(a). Note that the object to be processed W is omitted in Figure 2(b). As shown in Figures 1, 2(a), and 2(b), the electrostatic chuck 10 according to this embodiment comprises a ceramic dielectric substrate 100, a heater unit 200, and a base plate 300. The ceramic dielectric substrate 100 is, for example, a flat su