JP-2026514221-A - AG mirror sealing method

Abstract

This disclosure provides a method comprising depositing mirrors on a waveguide having an input coupler and an output coupler. A sealing layer is deposited on the mirrors. A resist is formed on the input coupler, exposing the remaining sealing portion of the sealing layer on the non-input coupler region. The remaining sealing portion of the sealing layer is removed, exposing the remaining mirror portion of the mirror on the non-input coupler region. The remaining mirror portion of the mirror on the input coupler is removed, exposing the non-input region of the waveguide. The resist on the input coupler is removed, and the waveguide has mirrors only on the input coupler and the sealing layer only on the mirrors. [Selection Diagram] Figure 1

Inventors

• ゴデット， ルドヴィーク
• ハウラニ， ラミ
• チェン， ユエ
• チェン， エリカ
• マイヤー ティマーマン タイセン， ラトガー

Assignees

• アプライド マテリアルズ インコーポレイテッド

Dates

Publication Date

20260507

Application Date

20240426

Priority Date

20230428

Claims (20)

1. It is a substrate, An input coupler comprising a first-arranged waveguide structure, wherein the first-arranged waveguide structure has a critical dimension defining one or more gaps between each waveguide structure of the first-arranged waveguide structure, An output coupler comprising a second arrangement of waveguide structures, wherein the second arrangement of waveguide structures has critical dimensions defining one or more gaps between each waveguide structure of the second arrangement of waveguide structures, A substrate including, A mirror disposed on the input coupler, wherein the mirror is disposed in one or more gaps between each waveguide structure of the first waveguide structure, A sealing layer disposed on the mirror, wherein the sealing layer has a refractive index of about 1.0 to about 1.5, A medium having a refractive index of approximately 1.0, placed on the output coupler, and a medium placed in one or more gaps between each waveguide structure of the second arrangement of waveguide structures, A device equipped with the following features.
2. The device according to claim 1, wherein the sealing layer is disposed only on the upper surface of the mirror.
3. The device according to claim 2, wherein the sealing layer is further disposed on one or more side walls of the mirror.
4. The device according to claim 1, wherein the mirror has a reflectance greater than 90%.
5. Attaching mirrors to a waveguide having an input coupler and an output coupler, Depositing a sealing layer on the aforementioned mirror, Forming a resist on the input coupler such that the residual sealing portion of the sealing layer on the non-input coupler region is exposed, Removing the remaining sealing portion of the sealing layer, such that the remaining mirror portion of the mirror on the non-input coupler region is exposed, Removing the remaining mirror portion of the mirror of the input coupler, wherein the remaining mirror portion is removed in such a way that the non-input coupler region of the waveguide is exposed. Removing the resist on the input coupler, wherein the waveguide has the mirror only on the input coupler and the sealing layer only on the mirror, A method that includes this.
6. Forming the resist on the input coupler means Depositing a resist layer on the aforementioned sealing layer, The resist layer is patterned so that the remaining sealed portion is exposed. The method according to claim 5, including the method described in claim 5.
7. The method according to claim 5, wherein the deposition of the sealing layer comprises performing one or more gas-phase deposition processes.
8. The method according to claim 7, wherein performing one or more gas-phase deposition processes includes generating an oxygen plasma.
9. The method according to claim 5, wherein the sealing layer is chromium or silicon nitride.
10. The method according to claim 5, wherein the mirror is made of silver or aluminum.
11. The method according to claim 5, wherein removing the residual sealing portion of the sealing layer includes etching the residual sealing portion of the sealing layer using an etching process.
12. The method according to claim 11, wherein the etching process is a wet etching process or a dry etching process.
13. Attaching mirrors to a waveguide having an input coupler and an output coupler, Forming a first resist on the input coupler, wherein the remaining mirror portion of the mirror on the non-input coupler region is exposed. Removing the remaining mirror portion of the mirror on the non-input coupler region, Removing the first resist, Depositing a sealing layer on the mirror and on the non-input coupler region, Forming a second resist on the mirror such that the remaining sealing portion of the sealing layer on the non-input coupler region is exposed by the second resist, Removing the remaining sealing portion, such that the non-input coupler region of the waveguide is exposed, Removing the second resist, wherein the waveguide has the mirror only on the input coupler and the sealing layer, Having only on the mirror, or having on the mirror and on the outer portion of the input coupler surrounding the grating of the input coupler, Removing the second resist, A method that includes this.
14. Forming the resist on the input coupler means Depositing a resist layer on the aforementioned sealing layer, The resist layer is patterned so that the remaining sealed portion is exposed. The method according to claim 13, including the method described in claim 13.
15. The method according to claim 14, wherein the deposition of the sealing layer comprises performing one or more gas-phase deposition processes.
16. The method according to claim 15, wherein performing one or more gas-phase deposition processes includes generating an oxygen plasma.
17. The method according to claim 13, wherein the sealing layer is chromium or silicon nitride.
18. The method according to claim 13, wherein the mirror is made of silver or aluminum.
19. The method according to claim 13, wherein removing the residual sealing portion of the sealing layer includes etching the sealing layer using an etching process.
20. The method according to claim 19, wherein the etching process is a wet etching process or a dry etching process.

Description

[0001] Embodiments of this disclosure generally relate to waveguides for augmented reality, virtual reality, and mixed reality. [0002] Waveguides can be used to manipulate the propagation of light using waveguide structures formed on a substrate. Waveguides involve an arrangement of structures with planar dimensions smaller than half the design wavelength of light. These structures have submicron critical dimensions (e.g., nanoscale dimensions) and manipulate photons to alter the propagation of light, causing local phase discontinuities (i.e., abrupt phase changes at distances shorter than the wavelength of light). Metallic coatings can also be applied to the structures, which act as mirrors, guiding light and increasing the efficiency of the device. However, metallic coatings often corrode by reacting with oxygen and/or sulfur-containing gases in the ambient atmosphere. [0003] Therefore, an improved method for forming waveguides is needed. [0004] This disclosure provides a method comprising depositing mirrors on a waveguide having an input coupler and an output coupler. A sealing layer is deposited on the mirrors. A resist is formed on the input coupler, exposing the remaining sealing portion of the sealing layer on the non-input coupler region. The remaining sealing portion of the sealing layer is removed, exposing the remaining mirror portion of the mirror on the non-input coupler region. The remaining mirror portion of the mirror on the input coupler is removed, exposing the non-input region of the waveguide. The resist on the input coupler is removed, and the waveguide has mirrors only on the input coupler and the sealing layer only on the mirrors. [0005] This disclosure further provides a method. This method includes depositing mirrors on a waveguide having an input coupler and an output coupler. A first resist is formed on the input coupler, exposing the remaining mirror portion of the mirror on the non-input coupler region. The remaining mirror portion of the mirror on the non-input coupler region is exposed. The first resist is removed. A sealing layer is deposited on the mirror and the non-input coupler region. A second resist is formed on the mirror, exposing the remaining sealing portion of the sealing layer on the non-input coupler region. The remaining sealing portion is removed, exposing the non-input coupler region of the waveguide. The second resist is removed, and the waveguide has mirrors only on the input coupler, and the sealing layer is on the mirror only, or on the mirror and on the outer portion of the input coupler surrounding the grating of the input coupler. [0006] This disclosure further provides a method. This method includes depositing a mirror containing silver or aluminum on a waveguide. The waveguide has an input coupler and an output coupler. A sealing layer containing chromium or silicon nitride is deposited on the mirror. A resist is formed on the input coupler. The remaining sealing portion of the sealing layer on the non-input coupler region is exposed. The remaining sealing portion of the sealing layer on the non-input coupler region and the remaining mirror portion of the mirror are removed. The resist on the input coupler is removed. [0007] To allow for a more detailed understanding of the above-mentioned features of this disclosure, a more specific description of this disclosure, which has been briefly summarized above, can be given by reference to embodiments, some of which are shown in the accompanying drawings. However, it should be noted that the accompanying drawings only illustrate exemplary embodiments of this disclosure and are therefore not intended to limit the scope of this disclosure, and other equally effective embodiments are also permitted. This is a schematic diagram of a waveguide according to an aspect of the present disclosure.This is a flowchart of a method for forming a waveguide according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a flowchart of a method for forming a waveguide according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclosure.This is a schematic cross-sectional view of a substrate in a method according to an aspect of the present disclos