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JP-7854919-B2 - Exposure head and exposure apparatus for exposure equipment

JP7854919B2JP 7854919 B2JP7854919 B2JP 7854919B2JP-7854919-B2

Inventors

  • 奥山 隆志
  • 小林 義則

Assignees

  • 株式会社オーク製作所

Dates

Publication Date
20260507
Application Date
20221028

Claims (7)

  1. An optical modulation element array in which multiple optical modulation elements are arranged in a two-dimensional array, The system includes a projection optical system that projects the light reflected by the aforementioned optical modulation element array onto the exposure surface of the object to be drawn, The aforementioned projection optical system, A first optical system that focuses the light of the pattern image reflected by the aforementioned optical modulation element array onto a first imaging plane, An image splitting optical system that splits a pattern image formed on the first imaging plane to form a plurality of split pattern images, The system includes a second optical system that images the light from the plurality of segmented pattern images onto the exposure surface, The aforementioned divided optical system A plurality of pairs of dividing mirrors for dividing the pattern image formed on the first imaging surface such that the plurality of divided pattern images are projected on the exposure surface at positions separated from each other by a predetermined distance with respect to the main scanning direction and the sub-scanning direction, wherein the plurality of pairs of dividing mirrors are inclined and intersect with respect to the first imaging surface and are in a parallel planar relationship, A reflective optical system that moves the light of the plurality of divided pattern images on the exposure surface, The system includes an optical path length modulation optical member that adjusts the optical path length of the light of the divided pattern image, The aforementioned reflective optical system comprises a plurality of pairs of mirrors that are in a parallel planar relationship with each other, An exposure head for an exposure apparatus, characterized in that at least one mirror of each pair of mirrors rotates on an axis or moves in translation according to the projection positions of a predetermined number of segmented pattern images.
  2. The exposure head for an exposure apparatus according to claim 1, characterized in that each of the plurality of mirror pairs is composed of a pair of galvanometer mirrors that rotate on an axis while maintaining a parallel plane relationship.
  3. The exposure head for an exposure apparatus according to claim 1, characterized in that one of the mirrors in each pair of mirrors moves parallel to the mirror along a direction perpendicular to its reflective surface.
  4. The exposure head for an exposure apparatus according to claim 1, characterized in that one of the mirrors in each pair of mirrors rotates on an axis.
  5. The exposure head for an exposure apparatus according to claim 1, further comprising an imaging unit for capturing the projection position of the segmented pattern image formed by the image segmentation optical system.
  6. The exposure head for an exposure apparatus according to claim 1, characterized in that the optical path length modulating optical member has a wedge-shaped prism .
  7. An exposure apparatus characterized by comprising an exposure head for an exposure apparatus as described in any one of claims 1 to 6.

Description

Application of Article 30, Paragraph 1 of the Patent Act: Publication against the applicant's will in Japanese Patent Publication No. 2021-96300 This invention relates to a maskless exposure apparatus that directly draws patterns using an array of optical modulation elements such as a DMD (Digital Micro-mirror Device), and more particularly to an optical system for projecting a pattern image onto an exposure surface. In a maskless exposure apparatus equipped with a DMD, it is possible to divide the pattern light reflected by the DMD and project multiple divided pattern images along the sub-scanning direction. For example, an exposure apparatus equipped with a division optical system comprising a pair of reflective optical systems is known (see Patent Document 1). In this apparatus, a pair of mirrors in a parallel plane relationship are arranged according to the number of divisions, and the mirrors are positioned so as not to intersect with the imaging plane (conjugate plane) that forms the image division plane, thereby forming the divided pattern image. In an exposure apparatus equipped with such a segmented optical system, segmented pattern images are projected onto the exposure surface so as to be spaced apart from each other along the main scanning direction. Therefore, in order to effectively perform raster data generation processing for each scanning band (scanning region) and exposure data generation processing for the optical modulation element array, exposure data is generated by extracting and integrating raster data corresponding to a series of segmented pattern images from a series of raster data sequentially generated according to each scanning band, using the projection position of a specific segmented pattern image as a reference (see Patent Document 2). On the other hand, a segmented optical system is known that forms numerous segmented pattern images by preparing a number of parallel-plane pairs of mirrors equal to the number of segments, and arranging the mirrors so as to intersect with the imaging plane (conjugate plane) (see Patent Document 3). In this system, the segmented mirrors are tilted with respect to the conjugate plane and arranged so as to intersect with it, with a predetermined distance between them in the main scanning direction and the sub-scanning direction. Furthermore, maskless exposure apparatuses are also known that include a segmented optical system (see Patent Document 4) equipped with multiple triangular prism-shaped optical elements, each with a different inclination angle with respect to the optical axis of the projection optical system, or a segmented optical system (see Patent Document 5) that splits the light reflected by the DMD into two using two mirrors. Patent No. 5881314Patent No. 5881313Patent No. 6590638Japanese Patent Publication No. 2014-92707Japanese Patent Publication No. 2009-87995 This is a schematic perspective view of the exposure apparatus according to this embodiment.This diagram schematically shows the internal structure of an exposure head.This figure shows the configuration of the image splitting optical system 30.This diagram shows the configuration of a mirror pair in a reflective optical system.This is a diagram showing the reflective surface in DMD22.This diagram shows the projection position of the segmented pattern image.This is a block diagram of the exposure apparatus. The embodiments of the present invention will be described below with reference to the drawings. Figure 1 is a schematic perspective view of the exposure apparatus according to this embodiment. The exposure apparatus 10 is a maskless exposure apparatus that directly irradiates a substrate W coated (or attached) with pattern light, and comprises a gate-shaped structure 12 and a base 14. The base 14 is equipped with an X-Y stage drive mechanism 56 that supports a drawing table 18, and the substrate W is placed on the drawing table 18. The gate-shaped structure 12 is equipped with light sources 20a and 20b, and exposure heads 201 and 202 for pattern formation are arranged side by side above the substrate W. Exposure head 201 is equipped with a DMD (Digital Micro-mirror Device) and a projection optical system (not shown here) and projects a pattern image onto the substrate W based on the light emitted from light source 20a. Exposure head 202 has a similar configuration and projects a pattern image using the light from light source 20b. The rectangular substrate W is an electronic circuit board, such as a printed circuit board, dry film, or glass substrate, and is mounted on the drawing table 18 in a blank state after pre-baking, coating/attaching of photosensitive material, etc. The substrate W (drawing table 18) has a defined X-Y-Z coordinate system with mutually orthogonal coordinates. The drawing table 18 is movable along the X and Y directions and rotatable around the Z axis. Here, the X direction is defined as the primary scanning direction, and the Y direction as the s