JP-7855068-B2 - Recipe creation system, length measurement system, and recipe creation method

Inventors

• 藤田 浩美
• 川原 敏一
• 菅原 仁志

Assignees

• 株式会社日立ハイテク

Dates

Publication Date

20260507

Application Date

20220530

Claims (15)

1. A recipe creation system that creates a recipe describing the procedure for measuring an object of observation using a computer system, The aforementioned computer system, A storage process that stores the design data of the object to be observed, which includes multiple layers, in a storage device, A layer setting process that sets one or more layers from the plurality of layers for each image acquisition condition of the observed target, A measurement cursor setting process is performed to automatically set a measurement cursor indicating the measurement area of the object to be observed on a design image composed of designs existing in the one or more layers set by the layer setting process , The aforementioned computer system, Further, a layer type setting process is performed to set a layer type that indicates whether or not each of the plurality of layers is the object of observation. The measurement cursor setting process includes a process to set the measurement cursor in the design image while avoiding the designs of layers other than the layer set as the observation target by the layer type setting process. A recipe creation system characterized by the following features.
2. The aforementioned computer system, The recipe creation system according to claim 1, further characterized by performing a display process that displays the design image and the measuring cursor on a single screen.
3. The recipe creation system according to claim 1, characterized in that the layer setting process includes a process of setting one or more layers from the plurality of layers according to the user's selection.
4. The recipe creation system according to claim 1, characterized in that the layer setting process includes a process of setting one or more layers from the plurality of layers based on the image acquisition conditions.
5. The aforementioned computer system, The recipe creation system according to claim 1, further characterized by performing a transmission process to transmit a recipe including the image acquisition conditions and the length measurement cursor to a charged particle beam apparatus that measures the length of the object to be observed according to the recipe.
6. A length-measuring system comprising: a recipe creation system that creates a recipe describing a procedure for measuring the length of an object to be observed using a first computer system; and a charged particle beam apparatus that executes the recipe using a second computer system to measure the length of the object to be observed, The first computer system is A storage process that stores the design data of the object to be observed, which includes multiple layers, in a storage device, A layer setting process that sets one or more layers from the plurality of layers for each image acquisition condition of the observed target, A measurement cursor setting process is performed to automatically set a measurement cursor indicating the measurement area of the object to be observed on a design image composed of designs existing in the one or more layers set by the layer setting process, The second computer system is A receiving process for receiving the aforementioned design image, The system performs a display process that captures an SEM image of the measurement area indicated by the measurement cursor, and displays the design image received by the reception process . The first computer system is Further, a layer type setting process is performed to set a layer type that indicates whether or not each of the plurality of layers is the object of observation. The measurement cursor setting process includes setting the measurement cursor in the design image while avoiding the designs of layers other than the layer set as the observation target by the layer type setting process. A length measuring system characterized by the following features.
7. The measurement system according to claim 6 , characterized in that the display process includes the process of overlaying the measurement cursor onto the SEM image and displaying it.
8. The second computer system is The length measuring system according to claim 6 , further characterized in that a correction process is performed to correct the length measuring cursor on the SEM image displayed by the display process.
9. The learning system further comprises a learning system trained using training data that includes the image acquisition conditions and one or more layers set in the image acquisition conditions, The length measuring system according to claim 6 , characterized in that the learning system executes the layer setting process which sets one or more layers from the plurality of layers for each image acquisition condition of the object to be observed.
10. The first computer system or the second computer system is Further, a layer modification process is performed to modify one or more layers set in the image acquisition conditions, The length measuring system according to claim 9 , characterized in that the learning system performs additional learning using learning data which includes the image acquisition conditions and one or more layers modified by the layer modification process.
11. A method for creating a recipe that describes the procedure for measuring the length of an object to be observed, The design data of the object to be observed, which includes multiple layers, is stored in a storage device. For each image acquisition condition of the observed object, one or more layers are selected from the plurality of layers. Automatically set a length measuring cursor indicating the length measuring area of the object to be observed in the design image composed of the designs present in the one or more layers set above, and create a recipe including the image acquisition conditions and the set length measuring cursor. It has, The system further includes setting a layer type that indicates whether or not each of the aforementioned plurality of layers is the object of observation, Setting the measurement cursor includes setting the measurement cursor while avoiding the design of layers other than the layer designated as the object of observation in the design image. A method for creating recipes characterized by the following features.
12. The recipe creation method according to claim 1 , further comprising displaying the design image and the length measuring cursor on a single screen.
13. The recipe creation method according to claim 1 , characterized in that setting one or more layers includes setting one or more layers from among the multiple layers according to the user's selection.
14. The recipe creation method according to claim 1 , characterized in that setting one or more layers includes setting one or more layers from among the multiple layers based on the image acquisition conditions.
15. The recipe creation method according to claim 1 , further comprising transmitting a recipe including the image acquisition conditions and the length measuring cursor to a charged particle beam apparatus that measures the length of the object to be observed according to the recipe.

Description

This disclosure relates to a recipe creation system, a length measurement system, and a recipe creation method. To achieve larger scale and higher integration of semiconductor devices, device stacking is progressing. As multilayering progresses with 3D-NAND structures and other methods, it becomes necessary to measure deep grooves and deep holes. Therefore, scanning electron microscopes equipped with multiple detectors (for example, detectors that detect secondary electrons and detectors that detect backscattered electrons) have been proposed (see, for example, Patent Document 1). Because the scanning electron microscope in Patent Document 1 is equipped with multiple detectors, the SEM images are diverse. As a result, even at the same measurement position, the patterns of multiple layers may or may not be observable depending on the SEM image. Japanese Patent Publication No. 2009-243993 This diagram shows the overall configuration of the length measuring system in Example 1.This is a data flow diagram for the offline recipe creation system of Example 1.This is a flowchart showing the processes performed by the offline recipe creation system in Example 1.This figure shows the design layout setting screen for Example 1.This figure shows the layer detail settings screen for Example 1.This figure shows an example of the offline recipe creation system of Example 1 setting a length measuring cursor on a design image.This figure shows the SEM image display screen of Example 2.This figure shows the SEM image display screen of Example 3.This is a diagram showing the configuration of a system equipped with the learning system of Example 4.This figure shows the output results of the learning system in Example 4.This figure shows an example of measuring semiconductor patterns according to a recipe created using a conventional offline recipe creation system. Embodiments of this disclosure will be described in detail with reference to the drawings. It goes without saying that in the following embodiments, the configuration (including the steps in the flowchart) is not necessarily essential, except where specifically indicated or where it is clearly essential in principle. Hereinafter, preferred embodiments of this disclosure will be described with reference to the drawings.