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JP-7855530-B2 - Shower head faceplate with angled gas distribution channel for semiconductor processing tools

JP7855530B2JP 7855530 B2JP7855530 B2JP 7855530B2JP-7855530-B2

Inventors

  • マンキディ・プラティク
  • ホーランド・ジョン
  • デ ラ レラ・アンソニー
  • ドライ・ラジェシュ

Assignees

  • ラム リサーチ コーポレーション

Dates

Publication Date
20260508
Application Date
20210614
Priority Date
20200615

Claims (20)

  1. It is a device, The shower head faceplate has a plurality of gas distribution passages that extend from a first side of the shower head faceplate to a second side of the shower head faceplate opposite to the first side, The first side and the second side define the average central plane of the shower head faceplate, The second side of the showerhead faceplate is configured to face a wafer support placed inside the semiconductor processing chamber and to be exposed to the plasma. The gas distribution passages in the first subset of the gas distribution passages among the plurality of gas distribution passages extend at least partially along a first oblique axis with respect to the central axis perpendicular to the average central plane of the shower head faceplate, The gas distribution passages in the second subset of the gas distribution passages among the plurality of gas distribution passages extend along a direction parallel to the central axis and are arranged in the outermost circular pattern of the gas distribution passages. The gas distribution passages in the first subset of the gas distribution passages are arranged in a first circular pattern of gas distribution passages that is smaller than the outermost circular pattern of the gas distribution passages and is located radially inward of the outermost circular pattern of the gas distribution passages. The apparatus wherein each gas distribution passage in the first subset of the gas distribution passages intersects the first side of the shower head faceplate at a location closer to the central axis than the location where the gas distribution passage intersects the second side of the shower head faceplate.
  2. The apparatus according to claim 1, wherein each of the gas distribution passages in the first subset of the gas distribution passages follows a linear path between the first side of the shower head faceplate and the second side of the shower head faceplate.
  3. The apparatus according to claim 1, An additional subset of the gas distribution passages among the plurality of gas distribution passages extends at least partially along a second oblique axis with respect to the central axis, The first angle differs from the second angle, The gas distribution passages among the additional subsets of the gas distribution passages are also devices located inside the outermost circular pattern of the gas distribution passages.
  4. The apparatus according to claim 1, The additional subset of the gas distribution passages among the plurality of gas distribution passages extends at least partially along an axis parallel to the central axis, The gas distribution passages among the additional subset of the gas distribution passages are also devices located inside the outermost circular pattern of the gas distribution passages.
  5. The apparatus according to claim 1, wherein the gas distribution passages in the first subset of the gas distribution passages are arranged in a plurality of concentric circular patterns.
  6. An apparatus according to any one of claims 2 to 5, wherein the angle between the central axis and the axis through which the first subset of the gas distribution passages extends at least partially is the same.
  7. The apparatus according to claim 5, wherein the angle between the central axis and the axis on which the first subset of the gas distribution passages extends at least partially is increasing as a function of the increasing diameter of each of the multiple concentric circular patterns.
  8. An apparatus according to any one of claims 1 to 5, wherein each of the gas distribution passages in the first subset of the gas distribution passages follows a linear path through the showerhead faceplate.
  9. The apparatus according to any one of claims 1 , 3, 4, and 5, wherein each of the gas distribution passages in a first subset of the gas distribution passages follows a non-linear path through the showerhead faceplate.
  10. The apparatus according to claim 1, The apparatus wherein the first circular pattern is concentric with the outermost circular pattern.
  11. The apparatus according to claim 1, A device in which multiple concentric rings of a gas distribution passage exist within a second subset of the gas distribution passage.
  12. The apparatus according to claim 1, further comprising the semiconductor processing chamber, shower head, and wafer support, The shower head is positioned above the wafer support inside the semiconductor processing chamber. The wafer support has a circular wafer support area with a diameter D configured to support a semiconductor wafer having a nominal diameter D, The shower head faceplate is installed inside the shower head so that the second side of the shower head faceplate faces the wafer support. An apparatus in which no structure exists between the shower head faceplate and at least 90% of the wafer support area.
  13. The apparatus according to claim 12, further comprising a gas distribution plate disposed inside the shower head, having an outlet port configured to supply processed gas to the gas distribution passage.
  14. The shower head faceplate comprises a plurality of gas distribution passages extending from a first side of the shower head faceplate to a second side of the shower head faceplate opposite to the first side, The first side and the second side define the average central plane of the shower head faceplate, The second side of the showerhead faceplate is configured to face a wafer support placed inside the semiconductor processing chamber and to be exposed to the plasma. The gas distribution passages in the first subset of the gas distribution passages among the plurality of gas distribution passages extend at least partially along a first oblique axis with respect to the central axis perpendicular to the average central plane of the shower head faceplate, The gas distribution passages in the first subset of the gas distribution passages are arranged in a first circular pattern of gas distribution passages. Each gas distribution passage in the first subset of the gas distribution passages intersects the first side of the shower head faceplate at a location closer to the central axis than where the gas distribution passage intersects the second side of the shower head faceplate, Each of the first subsets of the gas distribution passages has an inlet opening on the first side of the shower head face plate and two or more outlet openings on the second side of the shower head face plate, following a branching path through the shower head face plate. An apparatus wherein at least one of the outlet openings of each of the gas distribution passages in the first subset of gas distribution passages is further from the central axis than the inlet opening of that gas distribution passage.
  15. The apparatus according to claim 14, Each of the branch paths for the gas distribution passage in the first subset of the gas distribution passage has a plurality of parts, including an inlet portion and a plurality of outlet portions. Each of the gas distribution passages in the first subset of the gas distribution passages has a first end that terminates at the inlet opening for that gas distribution passage. Each outlet portion of each gas distribution passage in the first subset of the gas distribution passage has a first end that terminates at one of the outlet openings for that gas distribution passage, Each of the gas distribution passages in the first subset of the gas distribution passages has a second end that is fluidly connected to each other inside the shower head faceplate. A device in which at least two of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages are of the same length.
  16. The apparatus according to claim 14, Each of the branch paths for the gas distribution passage in the first subset of the gas distribution passage has a plurality of parts, including an inlet portion and a plurality of outlet portions. Each of the gas distribution passages in the first subset of the gas distribution passages has a first end that terminates at the inlet opening for that gas distribution passage. Each of the outlet portions of each gas distribution passage in the first subset of the gas distribution passage has a first end that terminates at one of the outlet openings for that gas distribution passage, Each of the gas distribution passages in the first subset of the gas distribution passages has a plurality of second ends that are fluidly connected to each other inside the shower head faceplate. A device in which at least two of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages are of different lengths.
  17. The apparatus according to claim 16, Of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages, at least two have different cross-sectional areas within the corresponding cross-sectional plane. A device in which each of the aforementioned cross-sectional planes is perpendicular to a portion of the branching path following the corresponding discharge portion.
  18. The apparatus according to claim 17, Each of the gas distribution passages in the first subset of the gas distribution passages has a cross-sectional area in the corresponding cross-sectional plane that is different from the cross-sectional area of one or more of the discharge portions for that gas distribution passage, A device in which each of the aforementioned cross-sectional planes is perpendicular to a portion of the branch path following the corresponding portion.
  19. The apparatus according to any one of claims 1 to 9 , The gas distribution passages in the first subset of the gas distribution passages are located inside the first annular region. The gas distribution passages in the second subset of the gas distribution passages among the plurality of gas distribution passages are located inside the second annular area. The first annular region is a different device from the second annular region.
  20. The apparatus according to claim 19, wherein the gas distribution passages in the second subset of the gas distribution passages extend along an axis parallel to the central axis.

Description

(Cross-reference of related applications) The PCT application form is filed concurrently with this specification as part of this application. Each application on which this application claims benefit or priority, as identified in the concurrently filed PCT application form, is incorporated into this specification in whole by reference. Semiconductor processing tools typically use a “showerhead” that distributes semiconductor processing gases across the entire surface of a substrate or wafer supported inside a semiconductor processing chamber by a base or chuck. The showerhead typically features a faceplate, which contains numerous gas distribution channels, such as holes, that face the wafer and deliver processing gases from one or more internal volumes of the showerhead through the faceplate during semiconductor processing. There are two common classes of showerheads used in semiconductor processing tools: “chandelier” type showerheads and “recessed” showerheads. A chandelier type showerhead typically includes a disc-like structure housing gas distribution channels, one or more internal plenums for distributing processing gases to these gas distribution channels, and a stalk-like portion that connects to or extends from the uppermost side of the disc-like structure, connecting to or extending through the ceiling of the processing chamber where the chandelier type showerhead is located. The stalk-like portion supports the disc-like structure inside the processing chamber and also serves to establish pathways for processing gases to one or more plenums inside the disc-like structure. The recessed showerhead does not have a stem-like portion or equivalent structure; rather, it is simply mounted on the wall of the semiconductor processing chamber and, in many cases, actually serves as a lid for the semiconductor processing chamber. The showerhead faceplate may, in various implementations, be a separate component from the rest of the showerhead, or it may be an integral part of the showerhead, for example, brazed or welded together with other structures to form a single structure. Some showerheads may feature an open internal plenum, one or more large volumes fluidly connected to, for example, a processing gas inlet and multiple gas distribution passages, while others may incorporate a gas distribution plate, which may be an internal structure of the showerhead that serves to establish a path for processing gas from the processing gas inlet of the showerhead to various gas distribution passages in the showerhead faceplate. This specification presents various designs for showerhead faceplates featuring one or more angled gas distribution channels. A simplified diagram of an example semiconductor processing unit is shown. A simplified diagram of another example of a semiconductor processing device is shown. This shows a cross-sectional view of the plan view of an example showerhead. This shows a partial cross-sectional view of a showerhead faceplate installed in an example of a semiconductor processing unit. An isometric view of an example of a shower head faceplate is shown.An example of a shower head faceplate is shown in the top view.This shows a side cross-sectional view of an example of a shower head faceplate. Figure 5 shows an isometric view of an example of a shower head faceplate similar to the shower head faceplate in Figure 5, but with a contoured lower section.Figure 6 shows a top view of an example of a shower head faceplate, similar to the shower head faceplate in Figure 6, but with a contoured lower section.Figure 7 shows a side cross-sectional view of an example of a shower head faceplate, similar to the shower head faceplate shown in Figure 7, but with a contoured lower section. An isometric view of another example of a showerhead faceplate is shown.A top view of another example of a shower head faceplate is shown.A side cross-sectional view of another example of a showerhead faceplate is shown. This is an isometric view of an example of a shower head faceplate similar to the one in Figure 11, but with a contoured lower section.Figure 12 shows a top view of an example of a shower head faceplate, similar to the shower head faceplate shown in Figure 12, but with a contoured lower section.Figure 13 shows a side cross-sectional view of an example of a shower head faceplate similar to the shower head faceplate shown in Figure 13, but with a contoured lower section. This shows a partial cross-sectional view of another example of a showerhead faceplate installed in an example of a semiconductor processing unit. An isometric view of another example of a showerhead faceplate is shown.A top view of another example of a showerhead faceplate is shown.A side cross-sectional view of another example of a showerhead faceplate is shown. This is an isometric view of an example of a shower head faceplate similar to the one in Figure 18, but with a contoured lower section.Figure 19 shows a top view of an example of