JP-7855985-B2 - Electromagnetic field analysis program and electromagnetic field analysis method

Inventors

• 川崎 健

Assignees

• 住友電気工業株式会社

Dates

Publication Date

20260511

Application Date

20221007

Claims (9)

1. A coplanar waveguide comprising a dielectric layer, a signal line, and a conductor pattern provided on the dielectric layer having a reference potential pattern provided on the dielectric layer with the signal line in between and spaced apart from the signal line, comprising the steps of generating a mesh such that a first mesh is generated in a first region of a certain width in a direction perpendicular to the direction in which the signal line extends, including the signal line and a part of the reference potential pattern, and no mesh is generated in a second region other than the first region, or a second mesh with a larger dimension than the first mesh is generated, The steps include: performing electromagnetic field analysis of the coplanar waveguide using the aforementioned mesh; Have the computer run it, An electromagnetic field analysis program that includes the step of generating the mesh, which includes setting a first region within a certain distance in a direction perpendicular to the extension direction of the center line with respect to the center line, and setting a second region outside the certain distance in the direction perpendicular to the center line.
2. The step of generating the mesh includes generating the first mesh on the surface of the conductive pattern in the first region, and not generating a mesh in the second region. The electromagnetic field analysis program according to claim 1, wherein the step of performing electromagnetic field analysis is a step of performing electromagnetic field analysis using the boundary element method.
3. The electromagnetic field analysis program according to claim 2, wherein the step of generating the mesh includes a step of not generating a mesh on the dielectric layer.
4. The step of generating the mesh includes generating the first mesh in the conductive pattern and dielectric layer within the first region, and generating the second mesh in the conductive pattern and dielectric layer within the second region. The electromagnetic field analysis program according to claim 1, wherein the step of performing electromagnetic field analysis is a step of performing electromagnetic field analysis using the finite element method.
5. The electromagnetic field analysis program according to claim 1, wherein the width of the signal line in the orthogonal direction is W1 , the distance between the signal line and the reference potential pattern in the orthogonal direction is W2, A is a constant number, and B is a constant number, and the constant distance is A × W1 + B × W2.
6. The electromagnetic field analysis program according to claim 5 , wherein A is a constant number between 0.5 and 2.5, and B is a constant number between 1 and 5.
7. The aforementioned signal line includes a first signal line, a second signal line, and a third signal line connected at one location. The step of generating the mesh includes setting the first region to be a region in which the following overlaps: a region within a first distance range in a first direction perpendicular to the extension direction of the first centerline of the first signal line, a region within a second distance range in a second direction perpendicular to the extension direction of the second centerline of the second signal line, and a region within a third distance range in a third direction perpendicular to the extension direction of the third centerline of the third signal line. When the width of the first signal line in the first direction is W1a, the distance between the first signal line and the reference potential pattern in the first direction is W2a, the width of the second signal line in the second direction is W1b, the distance between the second signal line and the reference potential pattern in the second direction is W2b, the width of the third signal line in the third direction is W1c, the distance between the third signal line and the reference potential pattern in the third direction is W2c, and A is a constant number and B is a constant number, The first distance is A × W1a + B × W2a, The second distance is A × W1b + B × W2b, The electromagnetic field analysis program according to any one of claims 1 to 4, wherein the third distance is A × W1c + B × W2c.
8. The signal line includes a first signal line and a second signal line whose first end is connected to the first signal line and whose second end is open. The step of generating the mesh includes setting the first region to be a region in which a region overlaps with a first distance range in a first direction perpendicular to the extension direction of the first center line of the first signal line and a third distance range in a second direction perpendicular to the extension direction of a line obtained by extending the second center line of the second signal line by a second distance from the second end of the second signal line, When the width of the first signal line in the first direction is W1a, the distance between the first signal line and the reference potential pattern in the first direction is W2a, the width of the second signal line in the second direction is W1b, the distance between the second signal line and the reference potential pattern in the second direction is W2b, and A is a constant number and B is a constant number, The first distance is A × W1a + B × W2a, The second distance is A × W1b + B × W2b - W1b/2, The electromagnetic field analysis program according to any one of claims 1 to 4, wherein the third distance is A × W1b + B × W2b.
9. A coplanar waveguide comprising a dielectric layer, a signal line, and a conductive pattern provided on the dielectric layer having a reference potential pattern provided spaced apart from the signal line with the signal line in between, comprising the steps of generating a mesh such that a first mesh is generated in a first region of a certain width in a direction perpendicular to the direction in which the signal line extends, including the signal line and a part of the reference potential pattern, and no mesh is generated in a second region other than the first region, or a second mesh with dimensions larger than the first mesh is generated in the second region, The steps include: performing electromagnetic field analysis of the coplanar waveguide using the aforementioned mesh; of Including, The step of generating the mesh includes setting a first region within a certain distance in a direction perpendicular to the extension direction of the center line with respect to the center line, and setting a second region outside the certain distance in a direction perpendicular to the center line. Electromagnetic field analysis method.

Description

This invention relates to an electromagnetic field analysis program and an electromagnetic field analysis method. Coplanar waveguides are used as transmission lines for high-frequency signals. Electromagnetic field analysis using computers is known (for example, Patent Document 1). Japanese Patent Publication No. 2007-249642 Figure 1 is a plan view of a coplanar waveguide.Figure 2 is a cross-sectional view taken along line A-A in Figure 1.Figure 3 is a block diagram of the computer in Example 1.Figure 4 is a flowchart showing the electromagnetic field analysis method in Example 1.Figure 5 is a plan view showing an example of the pattern in Example 1.Figure 6 is a plan view showing an example of the pattern in Example 1.Figure 7 is a plan view showing an example of the pattern in Example 1.Figure 8 is a plan view showing an example of the pattern in Example 1.Figure 9 shows a plan view and a cross-sectional view of the mesh used in the boundary element method.Figure 10 shows a plan view and a cross-sectional view of the mesh used in the finite element method.Figure 11 is a plan view showing the first and second regions in a distributor or combiner.Figure 12 shows the method for generating the first region in Figure 11.Figure 13 is a plan view showing the first and second regions in the signal line and stub.Figure 14 shows the method for generating the first region in Figure 13.Figure 15 is a plan view showing the mesh in the signal line and stub. [Description of Embodiments in this Disclosure] First, the contents of the embodiments of this disclosure will be listed and explained. (1) One embodiment of the present disclosure is an electromagnetic field analysis program that causes a computer to perform the following steps in a coplanar waveguide: a dielectric layer and a conductive pattern provided on the dielectric layer having a signal line and a reference potential pattern provided spaced apart from the signal line, the first mesh being generated in a first region of a certain width in a direction perpendicular to the direction in which the signal line extends, including the signal line and a part of the reference potential pattern, and not generating a mesh in a second region other than the first region, or generating a second mesh that is larger in size than the first mesh; and performing electromagnetic field analysis of the coplanar waveguide using the mesh. This enables efficient electromagnetic field analysis. (2) In (1) above, the step of generating the mesh includes generating the first mesh on the surface of the conductive pattern in the first region and not generating a mesh in the second region, and the step of performing electromagnetic field analysis is a step of performing electromagnetic field analysis using the boundary element method. (3) In (2) above, the step of generating the mesh includes the step of not generating a mesh in the dielectric layer. (4) In (1) above, the step of generating the mesh includes generating the first mesh in the conductive pattern and dielectric layer in the first region and generating the second mesh in the conductive pattern and dielectric layer in the second region, and the step of performing electromagnetic field analysis is a step of performing electromagnetic field analysis using the finite element method. (5) In any of (1) to (4) above, the step of generating the mesh includes setting the first region within a certain distance in a direction perpendicular to the extension direction of the center line with respect to the center line of the signal line, and setting the second region outside the certain distance in a direction perpendicular to the center line. (6) In (5) above, when the width of the signal line in the orthogonal direction is W1, the distance between the signal line and the reference potential pattern in the orthogonal direction is W2, A is a constant number, and B is a constant number, the constant distance is A × W1 + B × W2. (7) In (6) above, A is a constant number between 0.5 and 2.5, and B is a constant number between 1 and 5. (8) In any of (1) to (4) above, the signal line includes a first signal line, a second signal line and a third signal line connected at one location, and the step of generating the mesh includes setting the first region to an area where the following overlaps: within a range of a first distance in a first direction perpendicular to the extension direction of the first center line with respect to the first center line of the first signal line, within a range of a second distance in a second direction perpendicular to the extension direction of the second center line with respect to the second center line of the second signal line, and within a range of a third distance in a third direction perpendicular to the extension direction of the third center line with respect to the third center line of the third signal line, and the first signal in the first direction Let W1a be the width of the line, W2a be the distance b