JP-7857396-B2 - Plasma-treated liquid manufacturing method and plasma irradiation apparatus

Inventors

• 池戸 俊之
• 日下 航

Assignees

• 株式会社FUJI

Dates

Publication Date

20260512

Application Date

20220222

Claims (4)

1. A supply process involves supplying the liquid to be processed to a container placed inside a sealed housing, The supply step includes a discharge step in which the liquid to be processed is supplied to the container while the liquid to be processed is discharged from the container, An adjustment step that adjusts the command value for the amount of liquid to be treated supplied per unit time in the supply step and the command value for the amount of liquid to be treated discharged per unit time in the discharge step, so that the liquid to be treated supplied to the container is stored therein. The irradiation step involves irradiating the liquid to be processed stored in the container with plasma generated by a plasma generator connected to the housing, towards the inside of the housing. Includes, In the adjustment step, the command value for the amount of liquid to be treated supplied per unit time in the supply step is adjusted to be greater than the command value for the amount of liquid to be treated discharged per unit time in the discharge step, and further, the command value for the amount of liquid to be treated supplied per unit time in the supply step and the command value for the amount of liquid to be treated discharged per unit time in the discharge step are adjusted so that the weight of the container in which the liquid to be treated is stored is maintained. A method for producing a plasma-treated liquid by irradiating it with plasma in the aforementioned irradiation step.
2. A supply step of supplying an inert gas into the housing, A detection step in which the oxygen concentration inside the housing is detected while an inert gas is supplied into the housing in the supply step, Includes, The irradiation step is, A method for producing a plasma-treated liquid according to claim 1, wherein the plasma generated by the plasma generator is irradiated onto the liquid to be treated supplied to the container when the oxygen concentration inside the housing detected in the detection step falls below a threshold value.
3. A method for producing a plasma-treated liquid according to claim 1 or 2, further comprising a pre-irradiation step of irradiating the container with plasma before the liquid to be treated is supplied in the supply step.
4. A sealed housing, A supply device that supplies the liquid to be processed to a container placed inside the housing, A discharge device that supplies the liquid to be processed into the container using the supply device, while simultaneously discharging the liquid to be processed from the container, A plasma generator connected to the housing generates plasma toward the interior of the housing, thereby irradiating the liquid to be processed stored in the container with plasma, Equipped with, A plasma irradiation apparatus in which, when adjusting the command value for the amount of liquid to be treated per unit time supplied to the supply device and the command value for the amount of liquid to be treated per unit time discharged to the discharge device, the command value for the amount of liquid to be treated per unit time supplied by the supply device is adjusted to be greater than the command value for the amount of liquid to be treated per unit time discharged by the discharge device, and further, the command value for the amount of liquid to be treated per unit time supplied by the supply device and the command value for the amount of liquid to be treated per unit time discharged by the discharge device are adjusted so as to maintain the weight of the container in which the liquid to be treated is stored .

Description

This invention relates to a technique for producing plasma-treated liquids by irradiating a liquid to be treated with plasma. Patent Document 1 describes a technique for irradiating a liquid to be treated, supplied to a container, with plasma. Patent Documents 2 and 3 describe techniques for supplying the liquid using a supply device such as a pump. International Publication No. 2020/026324Japanese Patent Application Publication No. 10-015573Special Publication No. 2010-523326 This is a perspective view of an atmospheric pressure plasma irradiation device.This is an exploded view of a plasma generator.This is an exploded view of a plasma generator.This is a cross-sectional view of a plasma generator.This is a perspective view of an atmospheric pressure plasma irradiation device.This is a side view of an atmospheric pressure plasma irradiation device.This is a side view of an atmospheric pressure plasma irradiation device.This is a perspective view of an atmospheric pressure plasma irradiation device.(a) is a perspective view of the irradiation block and (b) is a cross-sectional perspective view of the same block along line AA.This is a block diagram of the control device. The embodiments of this disclosure will be described in detail below with reference to the drawings. Figure 1 shows an atmospheric pressure plasma irradiation apparatus 10 according to one embodiment of the present disclosure. The atmospheric pressure plasma irradiation apparatus 10 is a device for irradiating a culture medium (an example of the "liquid to be treated") with plasma under atmospheric pressure, and comprises a plasma generator 20, a cover housing 22, an opening/closing mechanism 24, a stage 26, a lifting/lowering device 28, a purge gas supply mechanism 32 (see Figure 5), a concentration detection mechanism 34, an exhaust mechanism 36, and a control device 38 (see Figure 10). The width direction of the atmospheric pressure plasma irradiation apparatus 10 is referred to as the X direction, the depth direction as the Y direction, and the direction perpendicular to the X and Y directions, i.e., the vertical direction, as the Z direction. As shown in Figures 2 to 4, the plasma generator 20 includes a cover 50, an upper block 52, a lower block 54, a pair of electrodes 56, and a nozzle block 58. The cover 50 is generally a covered rectangular tube, and the upper block 52 is disposed inside the cover 50. The upper block 52 is generally a rectangular parallelepiped and is made of ceramic. A pair of cylindrical recesses 60 are formed on the lower surface of the upper block 52. Furthermore, the lower block 54 is generally rectangular in shape and is made of ceramic. A recess 62 is formed on the upper surface of the lower block 54. The recess 62 consists of a pair of cylindrical recesses 66 and a connecting recess 68 that connects these two cylindrical recesses 66. The lower block 54 is fixed to the lower surface of the upper block 52, protruding from the lower end of the cover 50, and the cylindrical recesses 60 of the upper block 52 and the cylindrical recesses 66 of the lower block 54 are in communication. The cylindrical recesses 60 and 66 are approximately the same diameter. A slit 70 is formed on the bottom surface of the recess 62, penetrating through to the lower surface of the lower block 54. Each of the pair of electrodes 56 is positioned in a cylindrical space defined by the cylindrical recess 60 of the upper block 52 and the cylindrical recess 66 of the lower block 54. The outer diameter of the electrodes 56 is smaller than the inner diameters of the cylindrical recesses 60 and 66. The nozzle block 58 is generally flat and fixed to the lower surface of the lower block 54. The nozzle block 58 has an outlet 72 that communicates with the slit 70 of the lower block 54, and this outlet 72 penetrates the nozzle block 58 vertically. The plasma generator 20 further includes a processing gas supply device 74 (see Figure 10). The processing gas supply device 74 supplies a processing gas, which is a mixture of an active gas such as oxygen and an inert gas such as nitrogen in any desired ratio. It is connected via piping (not shown) to the cylindrical space partitioned by the cylindrical recesses 60 and 66, and to the upper part of the connecting recess 68. As a result, the processing gas is supplied into the recess 62 from the gap between the electrode 56 and the cylindrical recess 66, and from the upper part of the connecting recess 68. With this structure, the plasma generator 20 ejects plasma from the nozzle block 58's outlet 72. Specifically, a processing gas is supplied to the interior of the recess 62 by the processing gas supply device 74. At this time, a voltage is applied to a pair of electrodes 56 in the recess 62, causing a current to flow between the electrodes 56. This generates a discharge between the electrodes 56, and this discharge converts the processing gas into plasma. The plasma is then ejected from the outlet 72 th