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JP-7857466-B1 - Water treatment method, water treatment apparatus, and water treatment system

JP7857466B1JP 7857466 B1JP7857466 B1JP 7857466B1JP-7857466-B1

Abstract

[Problem] To provide a water treatment method that can increase the purity of water used for purposes other than scrubber water supplied to exhaust gas treatment equipment, or water supplied to ancillary equipment installed around exhaust gas treatment equipment. [Solution] The water treatment method is characterized by comprising: a desalination treatment step of further desalination treatment of a portion of the desalination treated water supplied as scrubber water to the exhaust gas treatment equipment 14 that treats exhaust gas, using a desalination equipment 30; and a treated water supply step of supplying the treated water after the desalination treatment step to the exhaust gas treatment equipment 14 or a first ancillary equipment installed around the exhaust gas treatment equipment as water to be used for purposes other than the scrubber water, or to a second ancillary equipment installed around the exhaust gas treatment equipment 14 for treating the exhaust gas. [Selection Diagram] Figure 1

Inventors

  • 中野 徹
  • 成田 裕樹
  • 中村 勇規
  • 佐々木 慶介
  • 高橋 一重
  • 中居 巧

Assignees

  • オルガノ株式会社

Dates

Publication Date
20260512
Application Date
20250402

Claims (10)

  1. A desalination treatment water line that supplies desalination treatment water as scrubber water to an exhaust gas treatment facility that processes exhaust gases, A water supply line that branches off from the desalination water line and carries a portion of the desalination water, A desalination facility that further desalinates a portion of the desalination treated water supplied in the aforementioned water supply line, A water treatment apparatus comprising: a treated water line A that supplies treated water, desalinated by the desalination equipment, to the exhaust gas treatment equipment or a first ancillary equipment installed around the exhaust gas treatment equipment as water to be used for purposes other than the scrubber water; or a treated water line B that supplies treated water to a second ancillary equipment installed around the exhaust gas treatment equipment for treating the exhaust gas.
  2. The water treatment apparatus according to claim 1, wherein the electrical conductivity of the treated water desalinated by the desalination equipment is 10 μS/cm or less.
  3. The water treatment apparatus according to claim 1 or 2, characterized in that the desalination equipment includes an EDI device.
  4. The water treatment apparatus according to claim 1 or 2, characterized in that the desalination equipment is installed in the same building as the exhaust gas treatment equipment.
  5. The water treatment apparatus according to claim 1 or 2, characterized in that the desalination equipment is unitized with the exhaust gas treatment equipment.
  6. The water treatment apparatus according to claim 1 or 2, characterized in that the first ancillary equipment is a chemical solution manufacturing apparatus.
  7. The second ancillary equipment includes a water electrolysis hydrogen generator that generates hydrogen gas by electrolyzing water, The water treatment apparatus according to claim 1 or 2, characterized in that it has a hydrogen gas line that supplies the hydrogen gas generated by supplying the treated water, which has been desalted by the desalination equipment via the treated water line B to the water electrolysis hydrogen generator, to the exhaust gas or gas treated by the exhaust gas treatment equipment.
  8. The water treatment apparatus according to claim 1 or 2, characterized in that it has a return line for returning the wastewater discharged from the desalination equipment to the desalination treated water line for supplying the scrubber water to the exhaust gas treatment equipment.
  9. A water treatment system characterized by comprising the water treatment apparatus described in claim 1 or 2 and the exhaust gas treatment equipment.
  10. Step A involves supplying desalination-treated water as scrubber water to an exhaust gas treatment facility that processes exhaust gases, Step B involves branching the desalination treatment water to obtain a portion of the desalination treatment water, A desalination treatment step in which a portion of the desalination treatment water obtained in step B is further desalinized using a desalination facility, A water treatment method characterized by comprising: a treated water supply step of supplying the treated water after the desalination step to the exhaust gas treatment equipment or a first ancillary equipment installed around the exhaust gas treatment equipment as water to be used for purposes other than the scrubber water, or a treated water supply step of supplying the treated water to a second ancillary equipment installed around the exhaust gas treatment equipment for treating the exhaust gas.

Description

This disclosure relates to water treatment methods, water treatment equipment, and water treatment systems. To neutralize harmful gases, including HF and NH3 , emitted from semiconductor factories and other sources, exhaust gas treatment equipment (so-called pollution control equipment) is used. In exhaust gas treatment equipment, scrubber water is used to absorb and neutralize harmful components in the exhaust gas, reduce the concentration of harmful components in the exhaust gas, and cool the exhaust gas. From the perspective of cost and water resource conservation, the scrubber water used in exhaust gas treatment equipment is mainly desalination water recovered by desalination treatment of wastewater discharged from the exhaust gas treatment equipment using RO membranes, etc. However, this desalination water is generally of a relatively low quality, around 200 μS/cm (not pure water). For example, Patent Document 1 discloses a technology for treating wastewater discharged from exhaust gas treatment equipment and recovering it as scrubber water, but the required water quality for the scrubber water is only at the level of tap water, and it is preferable to use soft water or RO-treated industrial water. In exhaust gas treatment facilities, there are cases where clean water is required for purposes other than scrubbing. Furthermore, clean water is also required for supplying water to ancillary equipment installed around the exhaust gas treatment facility to purify the exhaust gas. However, conventionally, clean water has not been used for purposes other than scrubbing in the exhaust gas treatment facility, nor for water supplied to ancillary equipment. For example, Patent Document 2 discloses a technology for reducing harmful components such as PFCs (perfluorocompounds) contained in exhaust gas discharged from an exhaust gas treatment facility by supplying hydrogen gas to the exhaust gas. Furthermore, a method is proposed for generating this hydrogen gas using a device that generates hydrogen gas by electrolyzing water. While this device is considered an ancillary facility surrounding the exhaust gas treatment facility, it is preferable to use clear water (e.g., pure water) for electrolysis. However, conventionally, it has been difficult to supply clear water to such a device. Japanese Patent Publication No. 2022-070609Special Publication No. 2023-547670 This is a schematic diagram showing an example of a water purification system equipped with a water treatment device according to this embodiment.This is a schematic diagram showing another example of a water purification system equipped with the water treatment device according to this embodiment.This is a schematic diagram showing another example of a water purification system equipped with the water treatment device according to this embodiment.This is a schematic diagram showing another example of a water purification system equipped with the water treatment device according to this embodiment. The embodiments of this disclosure are described below. These embodiments are examples of implementing this disclosure, and this disclosure is not limited to these embodiments. Figure 1 is a schematic diagram showing an example of a water treatment system equipped with a water treatment device according to this embodiment. The water treatment system 1 shown in Figure 1 comprises a water treatment device 10 and an exhaust gas treatment device 12. The exhaust gas purification device 12 is a device for treating exhaust gas discharged from semiconductor factories and the like. Its configuration is not particularly limited, but for example, as shown in Figure 1, it has an exhaust gas treatment facility 14, an exhaust gas inlet line 16, a desalination treatment water line 18 which is a scrubber water line, a gas discharge line 20, a wastewater discharge line 22, a circulation line 24, a circulation pump 26, and fluid nozzles 28a and 28b. The exhaust gas treatment facility 14 has a gas-liquid contact section 14a and a storage section 14b. The gas-liquid contact section 14a shown in Figure 1 is a flow path through which the exhaust gas flows in a meandering manner. The exhaust gas treatment facility 14 is provided with a gas inlet, a water inlet, a gas outlet, and a circulation inlet, which are located on the gas-liquid contact section 14a side, although these are not shown. The exhaust gas inlet line 16 is connected to the gas inlet, one end of the desalination treatment water line 18 is connected to the water inlet, the gas discharge line 20 is connected to the gas outlet, and one end of the circulation line 24 is connected to the circulation inlet. Furthermore, the exhaust gas treatment equipment 14 is provided with a drain port and a circulation outlet, although these are not shown in the diagram, located on the storage section 14b side. One end of the drain discharge line 22 is connected to the drain port, and the other end of the circulation line 24 is connected to