Search

KR-102959843-B1 - Structure of a scanning electron microscope measuring equipment equipped with an electromagnetic shield

KR102959843B1KR 102959843 B1KR102959843 B1KR 102959843B1KR-102959843-B1

Abstract

The present invention relates to a structure of a scanning electron microscope measuring device equipped with an electromagnetic shielding part. More specifically, the invention discloses a technical field regarding a structure of a scanning electron microscope measuring device equipped with an electromagnetic shielding part that minimizes magnetic stray field at the wafer sample surface, i.e., the target point, by attaching end caps made of mu-metal to both ends of the yoke of the linear motor of the stage part, so as to secure high-resolution images through a scanning electron microscope (SEM) for wafer inspection, and installing a shielding shield inside the sample analysis chamber so as to be spaced apart from the upper part of the electrostatic chuck of the stage part.

Inventors

  • 김동민
  • 김명현
  • 최영만
  • 윤경택
  • 방병훈
  • 신수근

Assignees

  • 한국표준과학연구원
  • 아주대학교산학협력단
  • (주)브이에이디인스트루먼트

Dates

Publication Date
20260508
Application Date
20251024

Claims (9)

  1. Sample analysis chamber (100); and A stage portion (200) installed inside the sample analysis chamber (100) to which a sample is attached; and A scanning microscope (300) installed on the upper part of the sample analysis chamber (100) and scanning an electron beam toward a target point (10,★) which is a sample; and It is configured to include a shielding shield (400) made of Mu-metal, which is connected to the sample analysis chamber (100) and installed so as to be spaced apart from the upper part of the electrostatic chuck (252) of the x-axis stage (250), and installed so as to be positioned in the center of the base plate (210). The above stage section (200) base plate (210); and A pair of first motors (220) installed in the y-axis direction on the upper part of the base plate (210); and A y-axis stage (230) installed on the upper part of the pair of first motors (220) and moved in the y-axis direction by the pair of first motors (220); and A second motor (240) installed in the x-axis direction on the upper part of the y-axis stage (230); and The apparatus is configured to include an x-axis stage (250) installed on the upper part of the second motor (240), which is moved in the x-axis direction by the second motor (240), and which has an electrostatic chuck (252) provided on its upper part. The above first motor (220) and second motor (240) While characterized by being a linear motor, The above second motor (240) is A scanning electron microscope measuring device structure equipped with an electromagnetic shielding part, characterized by comprising: an end cap (242) that is coupled to each of the one end and the other end and is made of Mu-metal to reduce magnetic leakage at the target point (10,★).
  2. delete
  3. In paragraph 1, The above shielding shield (400) is A scanning electron microscope measuring device structure equipped with an electromagnetic shielding part characterized by being formed in a ring shape.
  4. In paragraph 1, The above shielding shield (400) is Ring-shaped body (410); and A scanning electron microscope measuring device structure equipped with an electromagnetic shielding part, characterized by comprising: an upper plate (420) formed to cover the upper part of the body (410) and having an upper through hole (422) formed in the center through which an electron beam can pass.
  5. In paragraph 1, The above shielding shield (400) is Ring-shaped body (410); and An upper plate (420) formed to cover the upper part of the body (410) and having an upper through-hole (422) formed in the center through which an electron beam can pass; and A scanning electron microscope measuring device structure equipped with an electromagnetic shielding section, characterized by comprising: a lower plate (430) formed to cover the lower part of the body (410) and having a lower through-hole (432) formed in the center through which an electron beam can pass.
  6. In any one of paragraphs 3 through 5, The above shielding shield (400) is A scanning electron microscope measuring device structure equipped with an electromagnetic shielding section spaced 1 to 5 mm apart from the upper portion of the electrostatic chuck (252).
  7. In paragraph 6, The above shielding shield (400) is A scanning electron microscope measuring device structure equipped with an electromagnetic shielding section spaced 3 mm apart from the upper part of the electrostatic chuck (252).
  8. In any one of paragraphs 3 through 5, The above shielding shield (400) is A scanning electron microscope measuring device structure equipped with an electromagnetic shielding part characterized by being formed to a size of 2/3 to 1 of the size of the electrostatic chuck (252).
  9. In paragraph 8, The above shielding shield (400) is A scanning electron microscope measuring device structure equipped with an electromagnetic shielding part, characterized by being formed with a size corresponding to the size of the electrostatic chuck (252) above.

Description

Structure of a scanning electron microscope measuring equipment equipped with an electromagnetic shield The present invention relates to a scanning electron microscope measuring device structure equipped with an electromagnetic shielding part, and more specifically, to a scanning electron microscope measuring device structure equipped with an electromagnetic shielding part that minimizes magnetic stray field at the wafer sample surface, i.e., the target point, by attaching end caps made of mu-metal to both ends of the yoke of the linear motor of the stage part so as to obtain high-resolution images through a scanning electron microscope (SEM) for wafer inspection and installing a shielding shield inside the sample analysis chamber so as to be spaced apart from the upper part of the electrostatic chuck of the stage part. Due to the recent advancement of IT/NT technology, the packing density of semiconductors, displays, and component materials is rapidly increasing, and the demand for electron microscopy analysis capable of analyzing the technologies obtained through such IT/NT is also steadily rising. Electron microscopes are classified into transmission electron microscopes (TEM) and scanning electron microscopes (SEM). The transmission electron microscope is a device used to observe the density, thickness, and internal elemental information of a sample, while the scanning electron microscope is a device used to observe the surface information of a sample. Currently, scanning electron microscopes are mainly used because of their simple structure and low cost. A scanning electron microscope is an observation device that utilizes the principle of focusing an electron beam emitted from an electron gun through electromagnetic lenses and scanning it over a certain microscopic area, similar to a TV, to capture secondary electrons ejected from the surface of a sample and fill the scanned area into monitor pixels for observation. It is an image analysis device used for observing the surface of a sample (tens of nm). These scanning electron microscopes are highly sensitive to ambient magnetic fields, so image quality can easily degrade due to even minute changes in the magnetic field. Recently, as the use of linear motors for stage movement has increased for high-speed and high-precision sample positioning, a significant amount of magnetic stray field is occurring in the stage. To further explain, as an example of a scanning electron microscope, Korean Registered Patent No. 10-1539738 comprises a sample analysis chamber; a sample stage installed inside the sample analysis chamber to support a sample to be examined and movable in five axes; an ion gun installed in the sample analysis chamber to irradiate an ion beam to produce a cross-section of the sample onto the sample stage; and a scanning electron barrel unit connected to the sample analysis chamber and scanning an electron beam onto the sample. A dual-beam scanning electron microscope is disclosed, characterized by comprising: a shielding plate installed between the ion gun and the sample stage to determine the cross-section fabrication point of a sample placed on the sample stage; a shielding plate position adjuster installed in the sample analysis chamber to support the shielding plate and enable fine position adjustment with nano-range resolution; a detector that detects the cross-section fabrication state of the sample by an ion beam irradiated from the ion gun and, after cross-section fabrication, observes the cross-section of the sample by scanning an electron beam from the scanning electron unit; and a stage driving unit for driving the sample stage in five axes to change the position and orientation of the sample stage between the cross-section fabrication position where the scanning direction of the ion beam is orthogonal and the observation position where the scanning direction of the electron beam is orthogonal to the sample stage. In addition, a linear motor is a power device that drives a driving object in a linear reciprocating motion, and as an example, Korean Registered Patent No. 10-1372664 comprises: a driving unit having multiple driving parts arranged in parallel, each having multiple electromagnets arranged in a row; a fixed unit having multiple fixed parts arranged in parallel, each having multiple magnets arranged in a row; and multiple power terminals provided on the upper surface of each electromagnet of the driving unit and electrically connected to each electromagnet. A linear motor is disclosed comprising: a plurality of brush terminals provided between each fixed part of the fixed unit and contacting the power terminal of the driving unit to supply current when the driving unit is moved; wherein the length of the driving part of the driving unit is longer than the length of the fixed part of the fixed unit, and the diameter of the electromagnet constituting the driving part of the driving unit is smaller than the diameter of the mag