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KR-102961188-B1 - PLASMA TREATMENT APPARATUS

KR102961188B1KR 102961188 B1KR102961188 B1KR 102961188B1KR-102961188-B1

Abstract

A plasma processing device according to one embodiment may include a chamber, an antenna disposed inside the chamber, a main shaft detachably connected to one end of the antenna, a connecting screw extending from the main shaft, an electrode plate disposed outside the chamber and having a hole through which the connecting screw passes, a ground plate disposed outside the chamber and having a hole through which the connecting screw passes, and a connecting nut for fixing the connecting screw to either the electrode plate or the ground plate.

Inventors

  • 박강일
  • 이재환
  • 김용성
  • 손경태

Assignees

  • 주식회사 엘에이티

Dates

Publication Date
20260507
Application Date
20240715

Claims (10)

  1. Chamber; An antenna disposed inside the above chamber; A main shaft detachably connected to one end of the above antenna; A connecting screw extending from the main shaft; An electrode plate disposed outside the chamber and having a hole formed therein through which the connecting screw can pass; A ground plate disposed outside the chamber and having a hole formed therein through which the connecting screw can pass; and It includes a connecting nut that secures the connecting screw to either the electrode plate or the ground plate, and The above main shaft is, A shaft body extending from the outside of the chamber to the inside; and A plasma processing device comprising a shaft head formed to protrude from the shaft body and inserted into the interior of the antenna.
  2. delete
  3. In Article 1, A plasma processing apparatus further comprising a holder fixed to a second surface facing a first surface of the chamber and supporting the other end of the antenna.
  4. In Paragraph 3, The above holder is, A fixed body that seals the interior of the chamber from the exterior; and A plasma processing apparatus comprising a support body extending from the fixed body and supporting the outer surface of the antenna.
  5. In Article 4, When the above antenna is separated from the above main shaft, The distance between one end of the antenna and the shaft body increases, and A plasma processing device in which the distance between the other end of the antenna and the fixed body is reduced.
  6. In Article 5, The above support body is a plasma processing device positioned spaced apart from the other end of the antenna.
  7. In Article 1, A plasma processing device in which the shaft head is screw-connected to the antenna.
  8. In Article 1, The above electrode plate is a plasma processing device disposed between the ground plate and the chamber.
  9. In Article 1, Based on the length direction of the above antenna, A plasma processing device in which at least a portion of the holes formed in the ground plate overlaps with the holes formed in the electrode plate.
  10. In Article 1, The antenna, the main shaft, the connecting screw, and the connecting nut are each provided in multiple numbers, and The plurality of antennas above include a first antenna, a second antenna, and a third antenna, and The plurality of main shafts includes a first main shaft connected to the first antenna, a second main shaft connected to the second antenna, and a third main shaft connected to the third antenna. The plurality of connecting screws includes a first connecting screw extending from the first main shaft, a second connecting screw extending from the second main shaft, and a third connecting screw extending from the third main shaft. The first connecting screw and the third connecting screw are each connected to the electrode plate through the first connecting nut and the third connecting nut, and A plasma processing device in which the second connecting screw is connected to the ground plate through the second connecting nut.

Description

Plasma Treatment Apparatus The present invention relates to a plasma processing device. Plasma is an ionized gas in an electrically neutral state containing electrons, ions, neutral particles, and ultraviolet (UV) rays. A plasma treatment device is a device that uses plasma to treat the surfaces of various materials. Plasma treatment devices are used in diverse industrial fields, including semiconductors, electronics, medical, aerospace, and automotive. Korean Patent Publication No. 2007-0009393 (January 18, 2007) discloses a technical concept for a super-area plasma generation device using dual frequencies. FIG. 1 is a perspective view illustrating a plasma processing apparatus according to one embodiment. Figure 2 is a cross-sectional perspective view of area A shown in Figure 1. FIG. 3 is a front view illustrating a cross-section of a chamber, antenna, main shaft, connecting screw, electrode plate, and ground plate according to one embodiment. FIG. 4 is a perspective view illustrating a cross-section of a chamber, an antenna, and a holder according to one embodiment. Specific structural or functional descriptions of the embodiments are disclosed for illustrative purposes only and may be modified and implemented in various forms. Accordingly, actual implementations are not limited to the specific embodiments disclosed, and the scope of this specification includes modifications, equivalents, or substitutions included in the technical concept described by the embodiments. Terms such as first or second may be used to describe various components, but these terms should be interpreted solely for the purpose of distinguishing one component from another. For example, the first component may be named the second component, and similarly, the second component may also be named the first component. When it is stated that a component is "connected" to another component, it should be understood that it may be directly connected to or coupled with that other component, or that there may be other components in between. The singular expression includes the plural expression unless the context clearly indicates otherwise. In this specification, terms such as "comprising" or "having" are intended to specify the existence of the described features, numbers, steps, actions, components, parts, or combinations thereof, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof. Components included in any one embodiment and components having common functions shall be described using the same names in other embodiments. Unless otherwise stated, the descriptions given in any one embodiment may also apply to other embodiments, and specific descriptions shall be omitted to the extent of overlap. Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as generally understood by those skilled in the art. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and should not be interpreted in an ideal or overly formal sense unless explicitly defined in this specification. Hereinafter, embodiments will be described in detail with reference to the attached drawings. In the description with reference to the attached drawings, identical components are given the same reference numeral regardless of the drawing number, and redundant descriptions thereof will be omitted. FIG. 1 is a perspective view illustrating a plasma processing apparatus according to one embodiment, FIG. 2 is a cross-sectional perspective view of area A shown in FIG. 1, FIG. 3 is a front view illustrating a cross-section of a chamber, antenna, main shaft, connecting screw, electrode plate, and ground plate according to one embodiment, and FIG. 4 is a perspective view illustrating a cross-section of a chamber, antenna, and holder according to one embodiment. Referring to FIGS. 1 to 4, a plasma treatment device (1) according to one embodiment may include a plurality of antennas (11) through which current flows. The plasma treatment device (1) may plasma treat the surface of a target object while moving the target object, such as a substrate (not shown), in one direction within the device. In one embodiment, the plasma treatment device (1) may include an antenna (11a), a main shaft (12a), a connecting screw (13a), an electrode plate (15), a ground plate (16), and a connecting nut (17a). Hereinafter, for convenience of explanation, the first antenna (11a) among the plurality of antennas (11a, 11b, 11c) will be described based on the first antenna (11a). An antenna (11a) may be placed inside the chamber (91). The chamber (91) may maintain a vacuum inside and contain gas inside. The antenna (11a) may ionize the gas inside the chamber (91) by emitting a high frequency or microwave signal. The antenna