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KR-102961567-B1 - DC block and plasma generator using it

KR102961567B1KR 102961567 B1KR102961567 B1KR 102961567B1KR-102961567-B1

Abstract

Two high-frequency power transmission antennas (111, 121) formed on each of two microstrip lines (101, 102) are arranged facing each other with an insulating sheet (103) in between, and by forming the high-frequency power transmission antennas (111, 121) on the microstrip lines (101, 102) to realize the transmission of high-frequency power, it is possible to make it smaller compared to a conventional DC block using a coaxial line shape or a waveguide shape, and also to block high-voltage DC power by the insulating sheet (103) while transmitting only high-frequency power with high efficiency.

Inventors

  • 고이즈미 히로유키
  • 아타카 야스호
  • 아사카와 준
  • 야기누마 가즈야
  • 나카가와 유이치
  • 시마무라 고헤이
  • 미조지리 세이

Assignees

  • 가부시키가이샤 페일블루
  • 고쿠리츠다이가쿠호우진 도쿄다이가쿠

Dates

Publication Date
20260507
Application Date
20210316

Claims (15)

  1. Two high-frequency power transmission antennas, each formed on two microstrip lines, are arranged facing each other with an insulating sheet in between, and The above microstrip line has a layer structure comprising a wiring conductor layer on which the high-frequency power transmission antenna is formed, a ground conductor layer on which the high-frequency power transmission antenna is not formed, and a dielectric layer squeezed between the wiring conductor layer and the ground conductor layer. The two microstrip lines are arranged facing each other such that the wiring conductor layers of the two microstrip lines face each other with the insulating sheet in between, and the ground conductor layers of the two microstrip lines are spaced apart from the insulating sheet. DC block.
  2. Two high-frequency power transmission antennas, each formed on two microstrip lines, are arranged facing each other with an insulating sheet in between, and At least one of the two high-frequency power transmission antennas is in the shape of an open ring having a cutout in a part, and The above two high-frequency power transmission antennas have an asymmetrical shape, DC block.
  3. In paragraph 2, Both sides of the two high-frequency power transmission antennas have an open ring shape with cutouts in parts, and A DC block having at least one of the ring width, ring diameter, cut position, cut width, and number of cuts of the open ring asymmetrically formed for the two high-frequency power transmission antennas above.
  4. Two high-frequency power transmission antennas, each formed on two microstrip lines, are arranged facing each other with an insulating sheet in between, and The above-mentioned high-frequency power transmission antenna has a feed line connected to an inner conductor of a coaxial line that transmits high-frequency power, and A wiring pattern is formed in the above microstrip line for electrically connecting a voltage application circuit for applying a DC voltage to the high-frequency power transmission antenna and a plasma generation antenna connected to the inner conductor of the coaxial line. DC block.
  5. A plasma generation chamber, which is a vessel for generating plasma by discharge using high-frequency power and also accelerating the generated plasma by high-voltage direct current power, and A DC block is provided for being disposed on a transmission line for transmitting the high-frequency power to the above plasma generation chamber, and transmits only the high-frequency power and blocks the DC power. The above DC block has the configuration described in claim 4, Plasma generator.
  6. In paragraph 5, A plasma generator equipped with a DC power source as the above-mentioned voltage application circuit.
  7. In paragraph 5, A plasma generator having a resistor connected to a DC power source of the plasma generator as a voltage application circuit.
  8. In paragraph 1, The above-mentioned high-frequency power transmission antenna has a feed line connected to an inner conductor of a coaxial line that transmits high-frequency power, and A DC block having a wiring pattern formed in the microstrip line for electrically connecting a voltage application circuit for applying a DC voltage to the high-frequency power transmission antenna and a plasma generation antenna connected to the inner conductor of the coaxial line.
  9. In paragraph 2, The above-mentioned high-frequency power transmission antenna has a feed line connected to an inner conductor of a coaxial line that transmits high-frequency power, and A DC block having a wiring pattern formed in the microstrip line for electrically connecting a voltage application circuit for applying a DC voltage to the high-frequency power transmission antenna and a plasma generation antenna connected to the inner conductor of the coaxial line.
  10. In paragraph 3, The above-mentioned high-frequency power transmission antenna has a feed line connected to an inner conductor of a coaxial line that transmits high-frequency power, and A DC block having a wiring pattern formed in the microstrip line for electrically connecting a voltage application circuit for applying a DC voltage to the high-frequency power transmission antenna and a plasma generation antenna connected to the inner conductor of the coaxial line.
  11. A plasma generation chamber, which is a vessel for generating plasma by discharge using high-frequency power and also accelerating the generated plasma by high-voltage direct current power, and A DC block is provided for being disposed on a transmission line for transmitting the high-frequency power to the above plasma generation chamber, and transmits only the high-frequency power and blocks the DC power. The above DC block has the configuration described in claim 1, Plasma generator.
  12. A plasma generation chamber, which is a vessel for generating plasma by discharge using high-frequency power and also accelerating the generated plasma by high-voltage direct current power, and A DC block is provided for being disposed on a transmission line for transmitting the high-frequency power to the above plasma generation chamber, and transmits only the high-frequency power and blocks the DC power. The above DC block has the configuration described in paragraph 2, Plasma generator.
  13. A plasma generation chamber, which is a vessel for generating plasma by discharge using high-frequency power and also accelerating the generated plasma by high-voltage direct current power, and A DC block is provided for being disposed on a transmission line for transmitting the high-frequency power to the above plasma generation chamber, and transmits only the high-frequency power and blocks the DC power. The above DC block has the configuration described in paragraph 3, Plasma generator.
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Description

DC block and plasma generator using it The present invention relates to a DC block that transmits high-frequency power and cuts direct current power, and a plasma generation device using the same. Conventionally, DC blocks have been known as devices to prevent direct current (DC) from flowing through high-frequency signals and are utilized in various technical fields. An example of this is their application in spacecraft engines. Among spacecraft engines, there are types that expel propellant using electricity and are called electric propulsion rockets. Representative electric propulsion rockets possess a discharge mechanism to ionize the propellant to generate plasma and an acceleration mechanism to accelerate this plasma. Here, regarding the plasma generation chamber, which is a vessel for generating plasma, it is necessary to transmit high-frequency power used in the high-frequency discharge during plasma generation, as well as high-voltage DC power required for accelerating the generated plasma. A DC block is a device that blocks interference between this high-frequency power and DC power; it is placed on the transmission line for high-frequency power to transmit only the high-frequency power while blocking the DC power. In other words, a DC block is utilized as a device to separate the high-frequency power for plasma generation from the high-voltage DC power for plasma acceleration. In addition, it is known that the acceleration performance of the plasma can be improved by applying a DC voltage to a plurality of walls in contact with the plasma inside the plasma generation chamber (see, for example, Non-Patent Literature 1). Non-Patent Literature 1 discloses that a particularly significant performance improvement is caused by applying a voltage to an antenna for oscillating high-frequency power inside the plasma generation chamber. As a method for applying voltage to the antenna, a T-shaped location is installed in the microwave transmission path, and a method is disclosed in which only the core wire is exposed to apply voltage. In addition, a high-frequency signal device is known in which two open-ring type resonators formed on different planes are arranged facing each other to enable the transmission of DC power or low-frequency signals, and also to enable the transmission of high-frequency signals by electromagnetically coupling the resonators to each other (see, for example, Patent Document 1). Patent Document 1 also discloses that two resonators are arranged facing each other with a spacer plate made of an insulator in between. FIG. 1 is a diagram showing an example of the configuration of a plasma generation device applying a DC block according to the present embodiment. FIG. 2 is a drawing showing an example of the configuration of a DC block according to the present embodiment. FIG. 3 is a drawing showing an example of the shape of a high-frequency power transmission antenna according to the present embodiment. FIG. 4 is a drawing showing an example of the configuration of the DC block and its surrounding members of the present embodiment. FIG. 5 is a diagram showing an example of the configuration of a plasma generation device according to the first modified example. FIG. 6 is a diagram showing an example of the configuration of a first microstrip line according to a first modified example. FIG. 7 is a diagram showing an example of the configuration of a plasma generation device according to a second modified example. FIG. 8 is a drawing showing another example of the shape of a high-frequency power transmission antenna according to the present embodiment. Hereinafter, an embodiment of the present invention will be described based on the drawings. FIG. 1 is a drawing showing an example of the configuration of a plasma generation device applying a DC block according to the present embodiment. As shown in FIG. 1, the plasma generation device of the present embodiment is configured to include a plasma generation chamber (1), a high-frequency power source (2), a high-voltage DC power source (3), and a DC block (4). The plasma generation chamber (1) is a vessel for generating plasma by a discharge using high-frequency power and for accelerating the generated plasma by high-voltage direct current power. The plasma generation chamber (1) is equipped with a plasma generation antenna (11), a plurality of magnets (12) arranged on a wall (13), and an acceleration grid (14). In the plasma generation chamber (1), a magnetic field is formed by the plurality of magnets (12), and a plasma discharge is performed by introducing high-frequency waves, such as microwaves, from the plasma generation antenna (11) therein. The generated plasma is accelerated by a plasma discharge screen grid and an acceleration grid (14) installed on a surface opposite to the acceleration grid on the wall (13). The high-frequency power source (2) supplies high-frequency power for plasma generation to the plasma generation chamber (1)