KR-102961687-B1 - Electrostatic chuck comprising seramic spacer

Abstract

The disclosed electrostatic chuck including a ceramic spacer comprises a chuck body, a ceramic surface material, an adhesive layer, and a ceramic spacer. As such, a thermosetting silicone, which is an adhesive material forming the adhesive layer for bonding the ceramic surface material onto the chuck body so that the ceramic surface material can be placed on the chuck body in a horizontally aligned position, can be uniformly applied to the upper surface of the chuck body. Consequently, the thickness of the adhesive layer becomes uniform, thereby enabling uniform heat transfer in the electrostatic chuck including the ceramic spacer and preventing static electricity between the chuck body and the ceramic surface material. Furthermore, due to the ceramic properties, the internal pores contained in the ceramic spacer provide excellent resilience when the temperature drops after thermal expansion.

Inventors

• 신종순
• 이경민
• 이현택
• 이현빈

Assignees

• 주식회사 제스코

Dates

Publication Date

20260507

Application Date

20250630

Claims (4)

1. Chuck body; A ceramic surface material positioned above the above-mentioned chuck body; An adhesive layer interposed between the chuck body and the ceramic surface material to bond the chuck body and the ceramic surface material; and An electrostatic chuck comprising a ceramic spacer, wherein the ceramic spacer is interposed between the bottom surface of the ceramic surface material and the top surface of the chuck body together with the adhesive layer, and maintains the gap between the bottom surface of the ceramic surface material and the top surface of the chuck body at a required gap. The electrostatic chuck including the ceramic spacer above A gas flow path member formed to penetrate the chuck body, the adhesive layer, and the ceramic surface material, and configured to allow gas supplied from the outside to the chuck body for cooling a wafer placed on the upper side of the ceramic surface material to flow through the chuck body and the adhesive layer to the upper surface of the ceramic surface material; and A porous filter member disposed in the gas flow path member and blocking the plasma from flowing into the interior of the gas flow path member when plasma is generated above the electrostatic chuck containing the ceramic spacer; further comprising The above gas flow path member A gas supply channel formed to penetrate the interior of the above-mentioned chuck body and into which gas supplied from an external gas supply means flows, and It includes a gas discharge channel that extends through the adhesive layer and the ceramic surface material at the end of the gas supply channel and communicates with the gas supply channel to discharge gas flowing into and into the gas supply channel to the upper surface of the ceramic surface material. The above porous filter member is A porous filter body having a plurality of holes formed therein, disposed at the portion where the above gas supply path and the above gas discharge path are connected, and A side coating portion coated in a manner that surrounds the side of the above-mentioned porous filter body, and A filter body recess groove that is recessed to a certain depth on the side of the above-mentioned porous filter body, and It includes a side coating penetration hole that penetrates the side coating portion and communicates with the recessed groove of the filter body, and The electrostatic chuck including the ceramic spacer above It further includes a foreign substance inflow blocking member inserted into the recessed groove of the filter body and blocking, together with the side coating portion, the foreign substance that may be generated in the adhesive layer from flowing into the porous filter body. The above foreign substance inflow blocking member is A foreign matter inflow blocking case that is inserted into the recessed groove of the filter body and is formed in a box shape having a certain length in the width direction with the front portion facing the adhesive layer open, thereby forming an empty space inside; An air flow unit formed as a pair and installed respectively in the ceiling and floor portions of the interior of the foreign substance inflow blocking case to flow the internal air of the foreign substance inflow blocking case toward the adhesive layer, A pressure panel formed in the shape of a plate with a certain area, wherein both upper and lower ends are respectively in contact with a pair of air flow sections, and is arranged to slide along the recessed groove of the filter body, thereby compressing the internal air of the foreign matter inflow blocking case by pushing it toward the inner wall of the foreign matter inflow blocking case so that the internal air of the foreign matter inflow blocking case can be discharged through the air flow sections; A panel elastic body connected between the pressure panel and the inner wall of the foreign matter inflow blocking case to provide elastic force to the pressure panel, and It includes a foreign matter inflow blocking cover portion that covers the space between a pair of air flow portions among the open inlet portions of the above foreign matter inflow blocking case, and The above foreign substance ingress blocking cover A cover body formed with both ends respectively connected to the outer surface of a pair of air flow sections and having a through-hole interior, and A crushing cover that is detachably connected to the above-mentioned cover body and blocks the penetrating internal space of the above-mentioned cover body, and A locking projection protruding from each of the two ends of the above-mentioned crushing cover and engaging with the inner surface of the cover body when the above-mentioned crushing cover is connected to the cover body, and It includes a concave cover front that forms the front surface of the crushed cover and is formed concavely toward the adhesive layer such that the thickness of the crushed cover gradually decreases from the edge portion to the center portion of the crushed cover. The inner surface of the cover body is formed in a tapered shape that gradually widens from the front to the rear, and the outer surface of the cover to be crushed is formed to correspond to the inner surface of the cover body so that the cover to be crushed can be separated only toward the rear of the cover body. An electrostatic chuck including a ceramic spacer, characterized in that when the crushing cover is pushed from the rear side to the front side of the cover body, the locking projection contacts the inner surface of the cover body and the crushing cover is forcibly fitted onto the cover body.
2. In Article 1, An electrostatic chuck comprising a ceramic spacer characterized in that the ceramic spacer is made of ceramic.
3. In Article 2, An electrostatic chuck comprising a ceramic spacer characterized in that the ceramic spacer comprises at least one of aluminum oxide ( Al₂O₃ ) and yttria ( Y₂O₃ ).
4. delete

Description

Electrostatic chuck comprising a ceramic spacer The present invention relates to an electrostatic chuck including a ceramic spacer. An electrostatic chuck is a device that fixes objects, such as wafers and display panels, using electrostatic force; an example of such an electrostatic chuck is that of the patent document presented below. The electrostatic chuck described above includes a chuck body made of aluminum, a ceramic surface material placed on the chuck body, and an adhesive layer that bonds the chuck body and the ceramic surface material. However, conventionally, there was a problem in that the adhesive material forming the adhesive layer that bonds the chuck body and the ceramic surface material could not be uniformly applied to the upper surface of the chuck body, and thus the ceramic surface material could not be placed on the chuck body in a horizontal, upright position. FIG. 1 is a cross-sectional view of an electrostatic chuck including a ceramic spacer according to one embodiment of the present invention. FIG. 2 is an enlarged view of part A shown in FIG. 1. FIG. 3 is a cross-sectional view showing an electrostatic chuck manufacturing device using thermosetting silicon for manufacturing an electrostatic chuck including a ceramic spacer according to one embodiment of the present invention positioned above the chuck body. FIG. 4 is a cross-sectional view showing the electrostatic chuck manufacturing device using thermosetting silicone shown in FIG. 3 in contact with the upper surface of the chuck body. FIG. 5 is a cross-sectional view showing the thermosetting silicon being supplied onto the upper surface of the chuck body through the electrostatic chuck manufacturing device using the thermosetting silicon shown in FIG. 4. FIG. 6 is an enlarged view of a portion of an electrostatic chuck including a ceramic spacer according to one embodiment of the present invention. FIG. 7 is a cross-sectional view showing a foreign substance inflow blocking member constituting an electrostatic chuck including a ceramic spacer according to another embodiment of the present invention. FIG. 8 is an enlarged view of a portion of the foreign substance inflow blocking member of FIG. 7. Hereinafter, an electrostatic chuck including a ceramic spacer according to embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view of an electrostatic chuck including a ceramic spacer according to an embodiment of the present invention, FIG. 2 is an enlarged view of part A shown in FIG. 1, FIG. 3 is a cross-sectional view showing an electrostatic chuck manufacturing device using thermosetting silicon for manufacturing an electrostatic chuck including a ceramic spacer according to an embodiment of the present invention positioned above the chuck body, FIG. 4 is a cross-sectional view showing the electrostatic chuck manufacturing device using thermosetting silicon shown in FIG. 3 in contact with the upper surface of the chuck body, FIG. 5 is a cross-sectional view showing thermosetting silicon supplied onto the upper surface of the chuck body through the electrostatic chuck manufacturing device using thermosetting silicon shown in FIG. 4, and FIG. 6 is an enlarged view of a part of an electrostatic chuck including a ceramic spacer according to an embodiment of the present invention. Referring together to FIGS. 1 to 6, the electrostatic chuck (150) including a ceramic spacer according to the present embodiment includes a chuck body (151), a ceramic surface material (170), an adhesive layer (160), and a ceramic spacer (155). Additionally, the electrostatic chuck (150) including the ceramic spacer further includes a gas flow path member (185) and a porous filter member (180). The above chuck body (151) may be made of aluminum, with an internal electrode (not shown) that forms an electrostatic force inserted inside. The upper part of the above chuck body (151) can be formed in the shape of a circular plate. The ceramic surface material (170) is made of ceramic and is positioned above the chuck body (151), forming the outer surface of the electrostatic chuck (150) containing the ceramic spacer. The adhesive layer (160) is interposed between the chuck body (151) and the ceramic surface material (170) to bond the chuck body (151) and the ceramic surface material (170), and may be made of thermosetting silicone. In this embodiment, the liquid thermosetting silicone can be uniformly applied to the upper surface of the chuck body (151) to form the adhesive layer (160), and an electrostatic chuck manufacturing device (100) using thermosetting silicone, which will be described later, can be used to uniformly apply the liquid thermosetting silicone to the chuck body (151). The ceramic spacer (155) is interposed between the bottom surface of the ceramic surface material (170) and the top surface of the chuck body (151) together with the adhesive layer (160), thereby maintaining the ga