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KR-102961717-B1 - Return device, material transfer method, return method, and method for manufacturing a semiconductor device

KR102961717B1KR 102961717 B1KR102961717 B1KR 102961717B1KR-102961717-B1

Abstract

The conveying device according to the present embodiment is a conveying device (600) for conveying a substrate (100) in order to irradiate a line-shaped laser beam (15) onto a substrate (100), and comprises a receiving area into which the substrate (100) is received, a lifting unit (10) that lifts the substrate from its upper surface, a first holding mechanism that holds the substrate on the lifting unit, a first moving mechanism that moves the first holding mechanism in a first conveying direction inclined from the line direction of the laser beam, a plurality of pusher pins (501) that are installed to be vertically movable to receive the substrate from a transfer device that transfers the substrate and are disposed in the receiving area of the lifting unit, and a rotating mechanism (68) disposed between the plurality of pusher pins in the receiving area of the lifting unit to rotate the substrate.

Inventors

  • 후지 타카히로
  • 시미즈 료
  • 사토우 미츠히로

Assignees

  • 제이에스더블유 악티나 시스템 가부시키가이샤

Dates

Publication Date
20260508
Application Date
20220414

Claims (20)

  1. A conveying device for conveying said substrate in order to irradiate a line-shaped laser beam onto the substrate, A levitation unit having a receiving area into which a substrate is received and levitating the substrate on the upper surface of the levitation unit, and A first holding mechanism for holding the substrate on the above-mentioned buoyancy unit, and A first moving mechanism that moves the first holding mechanism in a first conveying direction inclined from the line direction of the laser light when viewed from the top surface, so as to change the irradiation position of the laser light on the substrate, and A plurality of pusher pins positioned in the receiving area of the above-mentioned lifting unit and installed to be vertically movable to receive the substrate from a transfer device that transfers the substrate, and A rotating mechanism for rotating the substrate, which is disposed between the plurality of pusher pins in the receiving area of the above-mentioned lifting unit, is provided. The above-mentioned levitation unit is equipped with a plurality of levitation unit cells, and In the gap between adjacent above-mentioned levitation unit cells, a nozzle unit is installed to eject gas upward toward the end of the substrate, and The above plurality of floating unit cells, when viewed from the top surface, A first buoyancy unit cell with the first direction as the longitudinal direction, and It is equipped with a second levitation unit cell having a second direction orthogonal to the first direction as the longitudinal direction, and A conveying device in which the nozzle unit is disposed in the gap between the first levitation unit cell and the second levitation unit cell.
  2. In paragraph 1, An end lifting unit disposed on the transfer side of the above lifting unit and lifting the end of the substrate from the upper surface of the end lifting unit, and A pusher bar that moves up and down in conjunction with the pusher pin to receive the substrate from the above-mentioned material transfer device, and extends along the material transfer direction of the above-mentioned material transfer device, and A second holding mechanism disposed between the above-mentioned lifting unit and the above-mentioned end lifting unit and holding the substrate, and A conveying device having a second moving mechanism that moves the second holding mechanism in a second conveying direction so that the second holding mechanism moves between the lifting unit and the end lifting unit.
  3. A conveying device for conveying the substrate in order to irradiate the substrate with a line-shaped laser beam, A levitation unit having an intake area into which a substrate is introduced, and levitating the substrate from the upper surface of the levitation unit, and A first holding mechanism for holding the substrate on the above-mentioned buoyancy unit, and A first moving mechanism that moves the first holding mechanism in a first conveying direction inclined from the line direction of the laser light when viewed from the top surface, so as to change the irradiation position of the laser light on the substrate, and A plurality of pusher pins positioned in the receiving area of the above-mentioned lifting unit and installed to be vertically movable to receive the substrate from a transfer device that transfers the substrate, and An end lifting unit disposed on the transfer side of the above lifting unit and lifting the end of the substrate from the upper surface of the end lifting unit, and A pusher bar that moves up and down in conjunction with the pusher pin to receive the substrate from the above-mentioned material transfer device, and extends along the material transfer direction of the above-mentioned material transfer device, and A second holding mechanism disposed between the above-mentioned lifting unit and the above-mentioned end lifting unit and holding the substrate, and A second moving mechanism for moving the second holding mechanism in a second conveying direction so that the second holding mechanism moves between the levitation unit and the end levitation unit, and The above-mentioned levitation unit is equipped with a plurality of levitation unit cells, and In the gap between adjacent above-mentioned levitation unit cells, a nozzle unit is installed to eject gas upward toward the end of the substrate, and The above plurality of floating unit cells, when viewed from the top surface, A first buoyancy unit cell with the first direction as the longitudinal direction, and It is equipped with a second levitation unit cell having a second direction orthogonal to the first direction as the longitudinal direction, and A conveying device in which the nozzle unit is disposed in the gap between the first levitation unit cell and the second levitation unit cell.
  4. In paragraph 2 or 3, A conveying device in which the above pusher bar is installed at the end of the above end lifting unit on the material-side.
  5. In paragraph 2 or 3, A conveying device in which the above pusher bar is installed at the end of the above lifting unit on the material transfer side.
  6. In paragraph 2 or 3, A conveying device in which the upper surface of the above-mentioned end lifting unit is lower than the upper surface of the above-mentioned lifting unit.
  7. delete
  8. In paragraph 3, The above-mentioned levitation unit has a base that fixes a plurality of the above-mentioned levitation unit cells, and A conveying device having a through hole installed in the above-mentioned base that reaches the gap between the above-mentioned floating unit cells.
  9. A conveying device for conveying the substrate in order to irradiate the substrate with a line-shaped laser beam, A levitation unit having a plurality of levitation unit cells and levitating a substrate on the upper surface of the levitation unit, and A holding mechanism for holding the substrate on the above-mentioned buoyancy unit, and A moving mechanism that moves the holding mechanism in a tilted conveying direction from the line direction of the laser light, as viewed from the top surface, so as to change the irradiation position of the laser light on the substrate, and A nozzle unit installed in the gap between adjacent floating unit cells and ejecting gas toward the end of the substrate, and The above plurality of floating unit cells, when viewed from the top surface, A first buoyancy unit cell with the first direction as the longitudinal direction, and It is equipped with a second levitation unit cell having a second direction orthogonal to the first direction as the longitudinal direction, and A conveying device in which the nozzle unit is disposed in the gap between the first levitation unit cell and the second levitation unit cell.
  10. In Paragraph 3 or Paragraph 9, A conveying device in which the ejection of gas from the nozzle unit is controlled according to the conveying position of the substrate.
  11. In Paragraph 3 or Paragraph 9, A conveying device in which the nozzle unit ejects gas toward the corner of the rotating substrate.
  12. delete
  13. In Paragraph 3 or Paragraph 9, The substrate is conveyed in a tilted conveying direction from a direction orthogonal to the line direction of the laser light, and A conveying device in which the nozzle unit is disposed in the gap parallel to the conveying direction.
  14. A transfer method for transferring a substrate to a transfer device that transfers the substrate in order to irradiate a line-shaped laser beam onto the substrate, The above-mentioned return device is, A levitation unit having a receiving area into which a substrate is received, and levitating the substrate from the upper surface of the levitation unit, and A first holding mechanism for holding the substrate on the above-mentioned buoyancy unit, and A first moving mechanism that moves the first holding mechanism in a first conveying direction inclined from the line direction of the laser light when viewed from the top surface, so as to change the irradiation position of the laser light on the substrate, and A plurality of pusher pins positioned in the receiving area of the above-mentioned lifting unit and installed to be vertically movable to receive the substrate from a transfer device that transfers the substrate, and A rotating mechanism is provided for rotating the substrate, which is disposed between the plurality of pusher pins in the receiving area of the above-mentioned lifting unit. The method for this is, (A1) A step of receiving a substrate brought into the receiving area by the transfer device by raising the plurality of pusher pins, and (A2) A step of moving the above material transfer device to a waiting position outside the above receiving area, and (A3) The step of lowering the substrate to the levitation height of the levitation unit by lowering the plurality of pusher pins, and The above-mentioned levitation unit is equipped with a plurality of levitation unit cells, and In the gap between adjacent above-mentioned levitation unit cells, a nozzle unit is installed to eject gas upward toward the end of the substrate, and The above plurality of floating unit cells, when viewed from the top surface, A first buoyancy unit cell with the first direction as the longitudinal direction, and It is equipped with a second levitation unit cell having a second direction orthogonal to the first direction as the longitudinal direction, and A method of transferring materials in which the nozzle unit is positioned in the gap between the first buoyancy unit cell and the second buoyancy unit cell.
  15. In Paragraph 14, The above-mentioned return device is, An end lifting unit disposed on the transfer side of the above lifting unit and lifting the end of the substrate from the upper surface of the end lifting unit, and A pusher bar that moves up and down in conjunction with the pusher pin to receive the substrate from the above-mentioned material transfer device, and extends along the material transfer direction of the above-mentioned material transfer device, and A second holding mechanism disposed between the above-mentioned lifting unit and the above-mentioned end lifting unit and holding the substrate, and A second moving mechanism for moving the second holding mechanism in a second conveying direction so that the second holding mechanism moves between the levitation unit and the end levitation unit, and In the steps (A1) and (A3) above, the method of raising and lowering the pusher bar in conjunction with the pusher pin.
  16. A transfer method for transferring a substrate to a transfer device that transports the substrate in order to irradiate a line-shaped laser beam onto the substrate, The above-mentioned return device is, A levitation unit having a receiving area into which a substrate is received, and levitating the substrate from the upper surface of the levitation unit, and A first holding mechanism for holding the substrate on the above-mentioned buoyancy unit, and A first moving mechanism that moves the first holding mechanism in a first conveying direction inclined from the line direction of the laser light when viewed from the top surface, so as to change the irradiation position of the laser light on the substrate, and A plurality of pusher pins positioned in the receiving area of the above-mentioned lifting unit and installed to be vertically movable to receive the substrate from a transfer device that transfers the substrate, and An end lifting unit disposed on the transfer side of the above lifting unit and lifting the end of the substrate from the upper surface of the end lifting unit, and A pusher bar that moves up and down in conjunction with the pusher pin to receive the substrate from the above-mentioned material transfer device, and extends along the material transfer direction of the above-mentioned material transfer device, and A second holding mechanism disposed between the above-mentioned lifting unit and the above-mentioned end lifting unit and holding the substrate, and The second moving mechanism for moving the second holding mechanism in a second conveying direction so that the second holding mechanism moves between the lifting unit and the end lifting unit, is provided. The method for this is, (B1) A step of receiving a substrate brought into the receiving area by the transfer device by raising the plurality of pusher pins and pusher bars, and (B2) A step of moving the above material transfer device to a waiting position outside the above receiving area, and (B3) The step of lowering the substrate to the levitation height of the levitation unit by lowering the plurality of pusher pins and pusher bars, and The above-mentioned levitation unit is equipped with a plurality of levitation unit cells, and In the gap between adjacent above-mentioned levitation unit cells, a nozzle unit is installed to eject gas upward toward the end of the substrate, and The above plurality of floating unit cells, when viewed from the top surface, A first buoyancy unit cell with the first direction as the longitudinal direction, and It is equipped with a second levitation unit cell having a second direction orthogonal to the first direction as the longitudinal direction, and A method of transferring materials in which the nozzle unit is positioned in the gap between the first buoyancy unit cell and the second buoyancy unit cell.
  17. In paragraph 15 or 16, A transfer method in which the above-mentioned pusher bar is installed at the end of the transfer device side of the above-mentioned end lifting unit.
  18. In paragraph 15 or 16, A method of transferring materials in which the above-mentioned pusher bar is installed at the end of the above-mentioned material transfer unit on the material transfer side.
  19. In paragraph 15 or 16, A method of transferring materials in which the upper surface of the above-mentioned end-lifting unit is lower than the upper surface of the above-mentioned lifting unit.
  20. delete

Description

Return device, material transfer method, return method, and method for manufacturing a semiconductor device The present invention relates to a conveying device, a transfer method, a conveying method, and a method for manufacturing a semiconductor device. Patent Document 1 discloses a laser annealing apparatus for forming a polycrystalline silicon thin film. In Patent Document 1, a projection lens focuses laser light onto a substrate so that the laser light forms a line-shaped irradiation area. Accordingly, an amorphous silicon film crystallizes to become a polysilicon film. In Patent Document 1, while the levitation unit is in a state where the substrate is levitating, the transport unit transports the substrate. In addition, in the levitation unit, the receiving position and the receiving position of the substrate are common. The transport unit transports the substrate along each side of the levitation unit. Then, as the substrate circulates over the levitation unit twice, a laser light is irradiated onto almost the entire surface of the substrate. FIG. 1 is a top view schematically showing the configuration of a transport device used in a laser irradiation device, and FIG. 2 is a side cross-sectional view schematically showing a laser irradiation device, and FIG. 3 is a top view schematically showing the detailed configuration of a conveying device, and FIG. 4 is a top view for explaining the return process in a return device, and FIG. 5 is a top view illustrating a conveying process in a conveying device, and FIG. 6 is a top view illustrating a conveying process in a conveying device, and FIG. 7 is a top view illustrating a conveying process in a conveying device, and FIG. 8 is a top view for explaining the conveying process in a conveying device, and FIG. 9 is a top view for explaining the return process in a return device, and FIG. 10 is a top view illustrating a conveying process in a conveying device, and FIG. 11 is a top view illustrating a conveying process in a conveying device, and FIG. 12 is a side cross-sectional view showing the arrangement of the nozzle unit of the conveying device, and FIG. 13 is a drawing showing the configuration of a nozzle unit, and FIG. 14 is a drawing showing the configuration of a nozzle unit related to a modified example, and FIG. 15 is a top view showing an example of the arrangement of a nozzle unit, and FIG. 16 is a top view showing Example 3 of the arrangement of a nozzle unit, and FIG. 17 is a drawing showing the difference in height between the end lifting unit and the lifting unit, and FIG. 18 is a drawing showing an example of a deformation of an end-wound unit, and FIG. 19 is a top view schematically showing a base having a release hole, and FIG. 20 is a side view schematically showing a base having an emission hole, and FIG. 21 is a top view illustrating the loading operation of a substrate, and FIG. 22 is a top view illustrating the loading operation of a substrate, and FIG. 23 is a top view illustrating the loading operation of a substrate, and FIG. 24 is a side view illustrating the lifting and lowering motion of a pusher pin, and FIG. 25 is a top view schematically showing a configuration using a pusher bar, and FIG. 26 is a side view illustrating the lifting and lowering motion of a pusher bar, and FIG. 27 is a top view schematically illustrating a modified example of a configuration using a pusher bar, and FIG. 28 is a cross-sectional view showing a simplified configuration of an organic EL display, and FIG. 29 is a process cross-sectional view illustrating a method for manufacturing a semiconductor device according to the present embodiment, and FIG. 30 is a cross-sectional view of a process showing a method for manufacturing a semiconductor device according to the present embodiment. The conveying device according to the present embodiment is used in a laser irradiation device such as a laser annealing device. The laser annealing device is, for example, an excimer laser annealing (ELA) device for forming a low-temperature polysilicon (LTPS) film. Hereinafter, the conveying device, laser irradiation device, method, and manufacturing method according to the present embodiment will be described with reference to the drawings. Embodiment 1. Using FIGS. 1 and 2, the basic configuration of the conveying device and the laser irradiation device according to the present embodiment will be described. FIG. 1 is a top view schematically showing the basic configuration of the laser irradiation device (1). FIG. 2 is a side cross-sectional view schematically showing the configuration of the laser irradiation device (1). Additionally, FIGS. 1 and 2 are conceptual diagrams showing only the basic configurations of the transport device and the laser irradiation device, and some configurations are omitted. For example, in FIG. 1, the transport device (600) is shown in a simplified manner. Specifically, in FIG. 1, the laser irradiation unit (14), the precision levitatio