KR-102961875-B1 - BUILT-IN REDUNDANCY SYSTEM FOR CHEMICAL SUPPLY DEVICES FOR SEMICONDUCTOR PROCESSES

Abstract

The present invention relates to an embedded redundancy system for a chemical supply device for semiconductor processes, and more specifically, to a control system for supplying chemicals through another chemical supply device in the event that a problem occurs in one chemical supply device.

Inventors

• 김준길
• 이승권
• 윤종현
• 최범준

Assignees

• 플러스이엔지 주식회사

Dates

Publication Date

20260507

Application Date

20251126

Claims (3)

1. A control box for supplying chemicals for a first semiconductor process for controlling a chemical supply line for a first semiconductor process; A control box for supplying chemicals for a second semiconductor process for controlling a chemical supply line for a second semiconductor process; and A redundancy valve box connected adjacently to the above-mentioned control box for supplying chemicals for the first semiconductor process and the control box for supplying chemicals for the second semiconductor process; Includes, The above-mentioned first semiconductor process chemical supply line and second semiconductor process chemical supply line each exist independently, and The above redundancy valve box is connected to a POU (Point of Use) system, and The above-mentioned POU (Point of Use) system is a single system in which each supply line is connected to a single POU (Point of Use) system, and If a problem occurs in either of the first semiconductor process chemical supply line or the second semiconductor process chemical supply line, the POU system performs control to supply chemicals to the supply line where the problem occurred through the other line. The above-mentioned first chemical supply line for a semiconductor process and second chemical supply line for a semiconductor process are each connected to a chemical process device for a semiconductor process, and The chemical prepared through the above-mentioned chemical process apparatus for the semiconductor process is supplied to the CMP process through the above-mentioned first chemical supply line for the semiconductor process and the second chemical supply line for the semiconductor process, and The above-described chemical process apparatus for semiconductor processes includes a storage tank (ST-TK), a pre-filter (PRE FILTER), a mixing tank (MIX-TK), a supply tank (SU-TK), and a final filter (FINAL FILTER) connected in sequence. The chemical supplied from the above supply tank (SU-TK) to the final filter (FINAL FILTER) is supplied to the final CMP process, and An embedded redundancy system in which the POU system automatically determines and performs control when the chemical process device for the first semiconductor process or the chemical process device for the second semiconductor process goes down, or when an abnormality occurs in the pump installed in the chemical line discharged from the final filter of the chemical process device for the first semiconductor process or the chemical process device for the second semiconductor process.
2. In paragraph 1, The above-mentioned first semiconductor process chemical supply line and second semiconductor process chemical supply line each have one supply line for independently supplying chemicals to each other's lines, and An integrated redundancy system in which a valve is installed in each supply line.
3. In paragraph 1, An embedded redundancy system in which the first chemical supply line for a semiconductor process and the second chemical supply line for a semiconductor process each have an internal circulation bypass line independently.

Description

Built-in Redundancy System for Chemical Supply Devices for Semiconductor Processes The present invention relates to an embedded redundancy system for a chemical supply device for semiconductor processes, and more specifically, to a control system for supplying chemicals through another chemical supply device when a problem occurs in one chemical supply device. In the process for manufacturing semiconductor devices, a predetermined film is generally deposited on a semiconductor substrate, and processes such as exposure, development, etching, and deposition are repeatedly performed. Additionally, a Chemical Mechanical Polishing (hereinafter CMP) process is carried out to flatten desired areas in order to form insulating films, metal wiring, isolation, and trench structures. The CMP process is performed by a combination of the chemical action of a slurry composed of a chemical solution and abrasive particles and the mechanical action of a polishing machine. For the CMP process, a slurry supply device that mixes and dilutes multiple chemical solutions and provides them (Korean Registered Patent Publication No. 10-1858201, May 9, 2018, Registered) is required. Specifically, the slurry supply device mixes multiple chemical solutions at a predetermined ratio and dilutes them with water for the CMP process. Meanwhile, the above-mentioned slurry supply device may generally be used in multiple units to increase the supply volume, and each supply device may supply slurry to the assigned CMP process. However, in this case, if a problem occurs in any of the above supply devices, a problem may arise in which the slurry supply to the CMP process connected to the supply device with the problem is interrupted. Accordingly, while researching to solve the above-mentioned problem, the inventors developed an embedded redundancy system for a chemical supply device for semiconductor processes. They discovered that if the system is used, slurry can be supplied to the CMP process connected thereto even if a problem occurs in any one of the chemical supply devices, thereby completing the present invention. In this regard, Korean registered patent No. 10-1327696 discloses a quantitative supply device for chemical solutions for semiconductor processes. FIG. 1 is a schematic diagram showing a chemical supply line for a semiconductor process and an embedded redundancy system according to one embodiment of the present invention. FIGS. 2a and 2b are a perspective view and a front view, respectively, of an embedded redundancy system according to one embodiment of the present invention. FIG. 3 is a schematic diagram showing an embedded redundancy valve box according to one embodiment of the present invention. FIG. 4 is a process diagram showing an embedded redundancy system according to one embodiment of the present invention. FIGS. 5a to 5c are each flow charts of a redundancy system according to an embodiment of the present invention. FIGS. 6a and 6b are screens showing a redundancy system in a normal state according to one embodiment of the present invention. FIGS. 7a and 7b are screens showing a redundancy system in automatic mode when a problem occurs, according to one embodiment of the present invention. FIGS. 8a and 8b are screens showing a redundancy system in manual mode when a problem occurs, according to one embodiment of the present invention. The present invention will be described in more detail below. However, the present invention may be implemented in various different forms and is not limited by the embodiments described herein, and is defined only by the claims set forth below. Additionally, the terms used in this invention are used merely to describe specific embodiments and are not intended to limit the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. Throughout the specification of this invention, the term 'comprising' any component means that, unless specifically stated otherwise, it does not exclude other components but may include additional components. The present invention is, The present invention provides an embedded redundancy system comprising: a control box for supplying chemicals for a first semiconductor process for controlling a chemical supply line for a first semiconductor process; a control box for supplying chemicals for a second semiconductor process for controlling a chemical supply line for a second semiconductor process; and a redundancy valve box connected adjacently to the control box for supplying chemicals for a first semiconductor process and the control box for supplying chemicals for a second semiconductor process; wherein the chemical supply line for a first semiconductor process and the chemical supply line for a second semiconductor process each exist independently, the redundancy valve box is connected to a Point of Use (POU) system, the Point of Use (POU) system is singular such that each supply line is connected to a single Poin