KR-102962524-B1 - Apparatus and Method for Data Distribution for Plasma Control

KR102962524B1KR 102962524 B1KR102962524 B1KR 102962524B1KR-102962524-B1

Abstract

The present invention relates to a data distribution device and method for plasma control, comprising a receiving module for receiving necessary data, at least one distribution module for setting at least one tag on the necessary data, at least one message queue for loading necessary data received from at least one distribution module based on the tag, and at least one destination module for receiving necessary data loaded in at least one message queue based on the tag and performing the corresponding function, and may be applied to other embodiments.

Inventors

송중호
조기환

Assignees

한국핵융합에너지연구원

Dates

Publication Date: 20260507
Application Date: 20240826

Claims (14)

A receiving module that receives necessary data in real time; At least one distribution module that sets at least one tag on the above-mentioned necessary data; At least one message queue that loads necessary data received from at least one distribution module based on the tag; At least one destination module that receives necessary data loaded into at least one message queue based on the above tag and performs the corresponding function; and A verification module that performs verification by comparing the process results generated in real time in the above destination module with the actual process results of the plasma equipment in real time; Includes, An electronic device characterized in that the above-mentioned at least one destination module includes at least one processing module that predicts a plasma state or process state in real time by an artificial intelligence algorithm.
In paragraph 1, The above-mentioned at least one destination module is, An electronic device characterized by including a control module for controlling plasma equipment and at least one transmission module for transmitting the necessary data to at least one simulator.
In paragraph 2, The above at least one message queue is, An electronic device characterized by being formed to be less than or equal to the number of at least one destination module.
In paragraph 3, The above distribution module is, An electronic device characterized by grouping the necessary data based on at least one necessary data required in at least one destination module and setting the tag for each group.
In paragraph 4, The above required data is, An electronic device characterized by including sensing data related to plasma generated inside the plasma equipment and equipment data regarding the plasma equipment.
In paragraph 5, The above required data is, Derived data derived from at least one destination module among the plurality of destination modules above; An electronic device characterized by further including
In paragraph 6, The above required data is, Simulation derived data derived from the simulation result in at least one of the above simulators; An electronic device characterized by further including
In paragraph 1, The above at least one distribution module is, An electronic device characterized by being formed in a hierarchical structure and including an upper distribution module and at least one lower distribution module.
In paragraph 8, The above at least one message queue is, An electronic device characterized by loading necessary data received from the upper distribution module and the lower distribution module based on the above tag.
A step in which an electronic device receives at least one required data in real time; The step of the electronic device setting at least one tag on the required data; The electronic device loads the necessary data into at least one message queue based on the set tag; The electronic device transmits necessary data loaded in the message queue to at least one destination module so that at least one destination module performs the corresponding function; and A step of performing verification by comparing the process result generated in real time in the above destination module with the actual process result of the plasma equipment in real time; Includes, A data distribution method characterized in that the above-mentioned at least one destination module includes at least one processing module that predicts a plasma state or process state in real time by an artificial intelligence algorithm.
In Paragraph 10, The step of transmitting to at least one destination module is, A data distribution method characterized by the step of transmitting the necessary data to at least one processing module that predicts the plasma state or process state by an artificial intelligence algorithm.
In Paragraph 11, The step of transmitting to at least one destination module is, A data distribution method characterized by the step of transmitting the necessary data to a control module that controls plasma equipment.
In Paragraph 12, The step of transmitting to at least one destination module is, A data distribution method characterized by the step of transmitting the necessary data to at least one transmission module that transmits the necessary data to at least one simulator.
In Paragraph 10, The step of setting at least one tag mentioned above is, A data distribution method characterized by the step of grouping the necessary data based on at least one necessary data required in at least one destination module and setting the tag for each group.

Description

Apparatus and Method for Data Distribution for Plasma Control The present invention relates to a data distribution device and method for plasma control. Plasma generated by high-frequency power is widely used in the etching and deposition processes of wafers and display panel substrates. However, as the demand for high performance in recent products increases, the amount of material to be etched or deposited is decreasing. To etch or deposit such small amounts of material, it is necessary to accurately determine changes in the plasma state and control the plasma state according to the changed amount. Generally, in order to determine changes in the plasma state during product production, it is necessary to measure the state by directly contacting the plasma, so there is a possibility that the plasma state may change during the measurement. Therefore, currently, various sensors are attached to plasma equipment to collect sensing data regarding the state of the plasma equipment, the plasma state generated inside the plasma equipment, the process state, and the results. Currently, there is a problem in that it is difficult to predict the plasma state and process state in real time because plasma state and process state predictions are performed by accumulating collected sensing data for a certain period of time, or by checking the plasma state and process state at the end of a unit process. In addition, since the plasma state and process state must be predicted and the plasma equipment must be controlled using the predicted results, a problem arises in that prediction and control must be performed sequentially. FIG. 1 is a diagram showing the main configuration of a system for performing data distribution for plasma control according to an embodiment of the present invention. FIG. 2 is a diagram showing the main configuration of an electronic device that performs data distribution using a message queue according to an embodiment of the present invention. FIG. 3 is a flowchart illustrating a method for performing data distribution for plasma control according to an embodiment of the present invention. FIG. 4 is a diagram illustrating the grouping of necessary data according to a destination module according to an embodiment of the present invention. FIG. 5 is a diagram showing the main configuration of an electronic device that performs data distribution using a message queue according to another embodiment of the present invention. Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings. The detailed description disclosed below, together with the accompanying drawings, is intended to describe exemplary embodiments of the present invention and is not intended to represent the only embodiment in which the present invention can be practiced. In order to clearly explain the present invention in the drawings, parts unrelated to the description may be omitted, and the same reference numerals may be used for identical or similar components throughout the specification. FIG. 1 is a diagram showing the main configuration of a system for performing data distribution for plasma control according to an embodiment of the present invention. Referring to FIG. 1, the system (10) according to the present invention may include plasma equipment (100), an electronic device (200), and a simulator (300). The plasma equipment (100) is equipment that generates plasma through high-frequency power to perform etching and deposition processes on wafers and display panel substrates. The plasma device (100) may be equipped with a plurality of sensors (e.g., OES sensor, first VI sensor, second VI sensor, etc.) for acquiring sensing data such as spectrum data and electrical characteristic data related to light generated during the plasma process. The plurality of sensors may communicate with the electronic device (200) in a 1:1 manner or communicate by connecting in an N:1 manner via a LAN method to transmit sensing data to the electronic device (200). Additionally, the plasma equipment (100) can transmit equipment data related to the pressure, temperature, electrical characteristics, motor speed, etc. of the plasma equipment to an electronic device (200). To this end, the plasma equipment (100) can perform wireless or wired communication with the electronic device (200). The electronic device (200) distributes necessary data, including sensing data and equipment data received from the plasma equipment (100) and derived data including electron density, electron temperature, etching rate and etching profile, to at least one destination module to perform plasma state prediction and control, and to perform verification of the control. At this time, the main operation of the electronic device (200) will be explained in more detail using Figure 2 below. The simulator (300) may be a plasma simulator that simulates plasma equipment. Such a simulator (300) is equipp