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KR-102962653-B1 - Polypetide, photoresist composition including the same and method of forming pattern using the same

KR102962653B1KR 102962653 B1KR102962653 B1KR 102962653B1KR-102962653-B1

Abstract

A polypeptide, a photoresist composition containing the same, and a method for forming a pattern using the same are disclosed.

Inventors

  • 정순천
  • 김기남
  • 김지은
  • 김진하
  • 박준성

Assignees

  • 삼성전자주식회사

Dates

Publication Date
20260508
Application Date
20210708
Priority Date
20210520

Claims (20)

  1. Includes area A and area B, The above A region has an alanine content of 20% or more and comprises one or more first repeating units comprising 4 to 10 consecutive amino acid residues, and The above B region has a tyrosine content of 10% or more and includes one or more second repeating units comprising 4 to 10 consecutive amino acid residues, and The above first repeating unit is represented by the following chemical formula 1, and The above second repeating unit is represented by the following chemical formula 2, and The molecular weight is 10,000 or less, and (Ala-Gly) 7 -Tyr-Gly-(Ala-Gly) 7 , (Ala-Gly) 12 -Tyr-Gly-(Ala-Gly) 2 , (Ala-Gly) 7 -Ser-Gly-(Ala-Gly) 4 -Tyr-Gly-(Ala-Gly) 2 , Gly-(Ala-Gly) 2 -Ser-Gly-Ala-Ala-(Ser-Gly-Ala-Gly-Ala-Gly) 6 -Tyr-Gly, (Ala-Gly-Ser-Gly-Ala-Gly) 4 -Ala-Gly-Tyr-Gly-Ala-Gly, or (Ala-Gly-Ser-Gly-Ala-Gly) 2 -Ala-Gly-Tyr-Gly-Ala-Gly-Tyr-Gly-(Ala-Gly) Polypeptides that are not 3- Tyr-Gly-Ala-Gly: <Chemical Formula 1> X 11 -(Ala-X 12 ) n11 -X 13 <Chemical Formula 2> X 21 -(X 22 -X 23 ) n21 -Tyr Among the above chemical formulas 1 and 2, X 11 and X 12 are independently Gly or Ala, and X 13 is Ser or Ala, and n11 is an integer from 1 to 4, and X 21 and X 23 are independently Gly or Ala, and X 22 is Gly, Ala, or Val, and n21 is an integer from 1 to 4.
  2. In paragraph 1, A polypeptide in which the number of repetitions of the first repetition unit versus the number of repetitions of the second repetition unit is 1:1 to 1:x, and x is a real number greater than 1.
  3. In paragraph 1, A polypeptide in which the number of repetitions of the first repetition unit versus the number of repetitions of the second repetition unit is 1:1 to 1:4.
  4. delete
  5. In paragraph 1, A polypeptide in which X 11 and X 12 are Gly, X 13 is Ser, and n11 is 1 or 2.
  6. In paragraph 1, A polypeptide in which X 21 and X 23 are Gly, X 22 is Gly, Ala, or Val, and n21 is 1, 2, or 3.
  7. In paragraph 1, The above first repetition unit is Gly-Ala-Gly-Ala-Gly-Ser, and The above second repeating unit is a polypeptide in which the second repeating unit is Gly-Ala-Gly-Ala-Gly-Tyr, Gly-Ala-Gly-Val-Gly-Ala-Gly-Tyr, Gly-Ala-Gly-Tyr, or Gly-Ala-Gly-Ala-Gly-Ala-Gly-Tyr.
  8. In paragraph 1, Polypeptide further comprising an H region containing Gly-Ala-Ala-Ser.
  9. In paragraph 8, The above H region is a polypeptide represented by the following chemical formula 3: <Chemical Formula 3> X 31 -(Ala-X 32 ) n31 -X 33 -Gly-Ala-Ala-Ser Among the above chemical formula 3, X 31 and X 32 are independently Gly or Ala, and X 33 is Ser or Ala, and n31 is 1 or 2.
  10. In paragraph 8, The above H region is a polypeptide in which Gly-Ala-Gly-Ala-Gly-Ser-Gly-Ala-Ala-Ser.
  11. In paragraph 1, A polypeptide having a polydipersity index of 2 or less.
  12. delete
  13. In paragraph 1, A photoresist composition comprising a polypeptide of any one of claims 1 to 3 and claims 5 to 11; and water.
  14. In Paragraph 13, A photoresist composition having a polypeptide concentration of 0.1 w/v% to 20 w/v%.
  15. A step of applying the photoresist composition of claim 13 onto a substrate and heating to form a photoresist film; A step of exposing at least a portion of the photoresist film with a high-energy beam; and A pattern forming method comprising the step of developing a photoresist film exposed using a developer.
  16. In paragraph 15, A pattern forming method in which the heating is performed at 50°C to 95°C.
  17. In paragraph 15, A pattern forming method in which the above high-energy line has a wavelength of 200 nm or less.
  18. In paragraph 15, A pattern forming method in which the high-energy line is an ArF excimer laser having a wavelength of 193 nm.
  19. In paragraph 15, A pattern forming method in which the above-mentioned developer consists of water.
  20. In paragraph 15, A pattern forming method in which the exposed portion is water-soluble and the unexposed portion is water-insoluble.

Description

Polypeptide, photoresist composition including the same and method of forming pattern using the same Embodiments of the present invention relate to a polypeptide, a photoresist composition containing the same, and a method for forming a pattern using the same. As semiconductor devices become more highly integrated, finer and more precise patterning is required. Commonly used photoresist materials are chemically amplified, but these materials have limitations in realizing fine patterns due to acid diffusion issues. Furthermore, the substances used to develop the photoresist can also be harmful to the human body and the environment. Accordingly, there is a demand for eco-friendly photoresist materials that are suitable for implementing fine patterns and do not emit chemicals harmful to the human body and the environment. FIG. 1 is a flowchart illustrating a pattern formation method according to one embodiment of the present invention. FIG. 2 is a side cross-sectional view showing a pattern forming method according to one embodiment of the present invention. Figures 3a to 3c show CD, DT, and LWR data according to the exposure amount of Example 3-1. The present invention is capable of various modifications and may have various embodiments; specific embodiments are illustrated in the drawings and described in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, and it should be understood that it includes all modifications, equivalents, and substitutions that fall within the spirit and scope of the present invention. In describing the present invention, detailed descriptions of related prior art are omitted if it is determined that such detailed descriptions may obscure the essence of the present invention. Terms such as "first," "second," and "third" may be used to describe various components, but they are used solely for the purpose of distinguishing one component from another, and the order or types of the components are not limited. In this specification, when a part of a layer, film, region, plate, etc. is described as being "upper" or "above" another part, it may include not only being directly above, below, to the left, or to the right in contact, but also being above, below, to the left, or to the right in non-contact. A singular expression includes a plural expression unless the context clearly indicates otherwise. Unless specifically stated otherwise, terms such as "include" or "have" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, components, materials, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, components, materials, or combinations thereof. Whenever a range of values is enumerated, the range includes all values corresponding within that range as explicitly recorded, and additionally includes the boundaries of the range. Thus, the range "X to Y" includes all values between X and Y, and also includes X and Y. Hereinafter, embodiments according to the present invention will be described in detail with reference to the drawings. In describing with reference to the drawings, substantially identical or corresponding components are given the same reference numerals, and redundant descriptions thereof will be omitted. In the drawings, thicknesses are shown enlarged to clearly represent various layers and regions. Additionally, in the drawings, the thickness of some layers and regions is exaggerated for convenience of explanation. Meanwhile, the embodiments described below are merely illustrative, and various modifications are possible from these embodiments. Polypeptide As used herein, the term “repeat unit” refers to four or more consecutive amino acid residues within a continuous stretch of a polypeptide, and refers to a subsequence that is repeated within a larger sequence. In this case, the repeat units do not need to be exactly the same sequence repeated. The repeat units may include variable components, and due to said variable components, each repeat unit may vary randomly within the same region. As used in this specification, the term “region” means four or more consecutive amino acid residues within a continuous stretch in a polypeptide, and means including one or more repeating units. A polypeptide according to exemplary embodiments may comprise a region A and a region B, wherein the region A has an alanine content of 20% or more and comprises one or more first repeating units comprising 4 to 10 consecutive amino acid residues, and the region B has a tyrosine content of 10% or more and comprises one or more second repeating units comprising 4 to 10 consecutive amino acid residues. In one embodiment, the polypeptide may have regions A and B arranged consecutively. That is, the polypeptide may not have any other sequence betwe