KR-102962821-B1 - Rail cleaning device

KR102962821B1KR 102962821 B1KR102962821 B1KR 102962821B1KR-102962821-B1

Abstract

A rail cleaning device is provided that avoids interference with structures by applying a vertically movable suction structure. The rail cleaning device comprises a driving unit that travels along a rail extended in a first direction, a cable support installed on one side of the rail for fixing a cable to provide power to the driving unit, and a cleaning unit installed on the driving unit for removing foreign matter generated from the cable support. The cleaning unit comprises a suction part that sucks in the foreign matter and a height control part connected to the suction part to move the position of the suction part in a second direction different from the first direction.

Inventors

김수현
하지현
백경담
조태현
정지윤
전효주
박민수
장민구
신두현
정연부
이승준

Assignees

세메스 주식회사
삼성전자주식회사

Dates

Publication Date: 20260508
Application Date: 20210422

Claims (9)

A driving unit that travels along a rail extended in a first direction; A cable support installed on one side of the above rail and for securing a cable for providing power to the driving unit; and It includes a cleaning unit installed in the above-mentioned driving unit and for removing foreign substances generated in the above-mentioned cable support, and The above cleaning unit is, A suction part that sucks in the above foreign substance, and It includes a height control unit connected to the suction unit and moving the position of the suction unit in a second direction different from the first direction, and A rail cleaning device in which the suction part faces the upper surface of the cable support and moves along the upper surface of the cable support.
In Article 1, The above cleaning unit is, A rail cleaning device comprising an additional suction part facing the rail and sucking in foreign matter generated from the rail.
In Article 1, The above suction part is provided with at least one suction hole for sucking in foreign substances, and A rail cleaning device comprising a cleaning unit positioned toward the cable support on the suction part and further including a brush installed to surround at least a portion of the periphery of the at least one suction hole.
In Article 1, In non-cleaning mode, the suction surface of the suction part and the upper surface of the cable support are separated by a first distance, and A rail cleaning device in which, in cleaning mode, the suction surface of the suction part and the upper surface of the cable support are spaced apart by a second distance closer than the first distance.
In Paragraph 4, The above cleaning unit further includes a brush positioned on the suction part toward the cable support, and In the above cleaning mode, the brush is a rail cleaning device that contacts the cable support.
In Article 1, The height control unit above is, A driving unit that moves a piston connected to the suction unit in the second direction, and A bracket installed on the upper surface of the suction part and including a through hole installed to allow the piston to pass through, and A rail cleaning device comprising a guide member connected to the upper surface of the above bracket and moving along a guide rail to guide the movement path of the suction member.
In Article 6, The above guide rail is a rail cleaning device installed on one side of the above drive unit.
In Article 7, The above guide portion includes a first surface extended in the second direction and a second surface bent from the first surface, and A rail cleaning device in which the second surface above contacts the upper surface of the bracket.
A rail assembly having a rail support member installed on the ceiling of an indoor space where a manufacturing line for manufacturing semiconductor devices is installed, and a pair of rails supported by the rail support member; and It includes a rail cleaning device that travels along the above rail, and The above rail cleaning device is, A driving unit that travels along a rail extended in the first direction, and A cable support installed on one side of the above rail and for securing a cable to provide power to the above driving unit, and It includes a cleaning unit installed in the above-mentioned driving unit and for removing foreign substances generated in the above-mentioned cable support, and The above cleaning unit is, A suction part that sucks in the above foreign substance, and It includes a height control unit connected to the suction unit and moving the position of the suction unit in a second direction different from the first direction, and A rail cleaning system in which the suction part faces the upper surface of the cable support and moves along the upper surface of the cable support.

Description

Rail cleaning device The present invention relates to a rail cleaning device. Generally, semiconductor or display devices can be manufactured by repeatedly performing a series of manufacturing processes on a substrate, such as a silicon wafer or a glass substrate. For example, manufacturing processes such as deposition, photoetching, oxidation, ion implantation, and cleaning may be performed selectively and/or repeatedly to form circuit patterns on the substrate. These manufacturing processes can be performed within a cleanroom where contamination control is implemented. Substrate transfer between these manufacturing processes is accomplished by using a carrier containing multiple substrates, such as a Front Opening Unified Pod (FOUP) or Front Opening Shipping Box (FOSB), to supply substrates to the processing equipment or to retrieve them from the processing equipment. Such carriers can generally be transported by an Overhead Hoist Transport (OHT). However, as the OHT travels on rails, foreign matter may accumulate on the rails. To ensure the smooth transport of the objects, the rails must be cleaned. Generally, a separate rail cleaning device may be used to remove foreign substances on the rail. The rail cleaning device is an auxiliary maintenance system that cleans foreign substances, such as particles, on the rails on which the logistics transfer device travels. The rail cleaning device moves along rails installed on the ceiling within a semiconductor cleanroom and can clean foreign substances on the rails. FIGS. 1 and FIGS. 2 are exemplary drawings for illustrating a rail cleaning device according to some embodiments of the present invention. FIGS. 3 to 6 are exemplary drawings for explaining the operation of the cleaning unit of a rail cleaning device by enlarging A of FIG. 2. FIG. 7 is a drawing for explaining a rail cleaning device according to some embodiments of the present invention. FIG. 8 is a drawing for explaining a cleaning unit of a rail cleaning device according to some embodiments of the present invention. FIGS. 9 and FIGS. 10 are exemplary drawings for explaining the operation of a cleaning unit of a rail cleaning device according to some embodiments of the present invention. Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The advantages and features of the present invention, and the methods for achieving them, will become clear by referring to the embodiments described below in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below but can be implemented in various different forms. These embodiments are provided merely to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention, and the present invention is defined only by the scope of the claims. Throughout the specification, the same reference numerals refer to the same components. When elements or a layer are referred to as being "on" or "on" another element or layer, it includes not only being directly on top of the other element or layer but also cases where another layer or element is interposed in between. On the other hand, when an element is referred to as being "directly on" or "directly on," it indicates that no other element or layer is interposed in between. Spatially relative terms such as "below," "beneath," "lower," "above," and "upper" may be used to facilitate the description of the relationship between one element or component and another, as illustrated in the drawings. Spatially relative terms should be understood as encompassing different orientations of the element during use or operation, in addition to the orientations illustrated in the drawings. For example, if an element illustrated in the drawings is flipped, the element described as "below" or "beneath" of another element may be placed "above" of that other element. Therefore, the exemplary term "below" may encompass both the lower and upper directions. Elements may also be oriented in other directions, and accordingly, spatially relative terms may be interpreted according to the orientation. Although terms such as "first," "second," etc. are used to describe various elements, components, and/or sections, it goes without saying that these elements, components, and/or sections are not limited by these terms. These terms are used merely to distinguish one element, component, or section from another. Accordingly, it goes without saying that the first element, first component, or first section mentioned below may be a second element, second component, or second section within the technical scope of the present invention. The terms used herein are for describing the embodiments and are not intended to limit the invention. In this specification, the singular form includes the plural form unless specifically stated otherwise in